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inquiryfluorine
sulfur
A
disulfur decafluoride
B
disulfur difluoride
C
sulfur tetrafluoride
D
hydrogen fluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: OF2; introduction of F2 into steel chamber, sulfur in compartments; detailed description of apparatus and handling given;; first passing through Ni (or Monel) tube (400°C); second Cu column (H2O sprayed); passed into steel column (containing carbon/Fe shavings; aq. NaOH sprayed); dried in column (containing solid NaOH, BaO or P2O5);; | A n/a B n/a C n/a D n/a E 87% |
(1,2-dibromotrifluoroethyl)pentafluorosulfur(VI)
A
fluorosulfonyl fluoride
B
disulfur decafluoride
C
1,2,2-tribromo-1,1,2-trifluoroethane
D
silicon tetrafluoride
E
thionyl fluoride
Conditions | Yield |
---|---|
Irradiation (UV/VIS); irradiated (Hanovia S 500 lamp) in silica ampule, 20 h, further products; | A n/a B n/a C 49% D n/a E n/a |
pentafluorosulfanyl chloride
sulfur dioxide
A
sulfuryl dichloride
B
fluorosulfonyl fluoride
C
disulfur decafluoride
D
pentafluorosulfur fluorosulfonate
E
thionyl fluoride
Conditions | Yield |
---|---|
byproducts: SiF4; other Radiation; photochemical reaction with 253.7 nm radiation, 48 h, in glass vessel; | A n/a B n/a C <1 D n/a E n/a |
fluorine
sulfur
A
disulfur decafluoride
B
disulfur difluoride
C
sulfur tetrafluoride
D
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) F2 and burning sulfur;; | |
In neat (no solvent) F2 and burning sulfur;; |
disulfur decafluoride
Conditions | Yield |
---|---|
With chloroform-d1 In chloroform-d1 rapid decompn. to S2F10 and other products in CDCl3; the same decompn. takes place in other nonperhalogenated solvents; |
fluorine
sulfur
A
disulfur decafluoride
B
sulfur difluoride
C
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: silicium fluorides; passing F2 over sulfur in copper tube (atm. of dry nitrogen);; storage over concd. aq. KOH for some time (removal of SF2 and silicium fluorides); fractionate distillation (removal of main product SF6);; | |
In neat (no solvent) |
fluorine
sulfur
A
fluorosulfonyl fluoride
B
disulfur decafluoride
C
hydrogen fluoride
D
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: CF4; introduction of F2 (from electrolysis/graphite anode); abs. exclusion of air (N2 atm.); detailed description of apparatus and handling given;; condensed (liquid air); storage over aq. KOH (for weeks); repeated fractionating (and drying); passing over liquid mixture of metallic Na/K (removal of SO2F2;; | |
In neat (no solvent) byproducts: CF4; introduction of F2 (from electrolysis/graphite anode); abs. exclusion of air (N2 atm.); detailed description of apparatus and handling given;; condensed (liquid air); storage over aq. KOH (for weeks); repeated fractionating (and drying); passing over liquid mixture of metallic Na/K (removal of SO2F2;; |
fluorine
sulfur
A
disulfur decafluoride
B
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) combustion of S in F2 stream;; very small yield of S2F10; further sulfur fluorides formed;; | |
In neat (no solvent) combustion of S in F2 stream;; very small yield of S2F10; further sulfur fluorides formed;; | |
In neat (no solvent) |
Conditions | Yield |
---|---|
In not given | |
With nitrogen In neat (no solvent) | |
In neat (no solvent) | |
In not given |
A
disulfur decafluoride
B
thiocarbonyl fluoride
C
trifluoromethylsulfenyl fluoride
D
sulfur tetrafluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
Electric Arc; with sulphur-containing inorganic compounds or salts in presence of inert compounds as TiO2, ZrO2, SiO2, K2B2O4, B2O3, Na2B2O7, Al2O3, FeAl2O4, FeTiO3; 1500-3000°C; under inert atm.; further products; | |
Electric Arc; with sulphur-containing inorganic compounds or salts in presence of inert compounds as TiO2, ZrO2, SiO2, K2B2O4, B2O3, Na2B2O7, Al2O3, FeAl2O4, FeTiO3; 1500-3000°C; under inert atm.; further products; |
pentafluorosulfanyl chloride
disulfur decafluoride
Conditions | Yield |
---|---|
With hydrogen In neat (no solvent) other Radiation; photochemical reduction;; | |
In neat (no solvent) |
Conditions | Yield |
---|---|
In neat (no solvent) passing SF6 over superheated catalysts;; | 0% |
In neat (no solvent) |
fluorine
sulfur
A
disulfur decafluoride
C
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) passing F2 over sulfur;; cooled (liquid air); fractionated;; |
iodotrifluoromethane
(trifluoroethenyl)pentafluorosulfur(VI)
A
fluorosulfonyl fluoride
B
disulfur decafluoride
C
Hexafluoroethane
D
sulphur hexafluoride
Conditions | Yield |
---|---|
Irradiation (UV/VIS); preventing photolysis of liq. react. product, further products; |
(trifluoroethenyl)pentafluorosulfur(VI)
A
fluorosulfonyl fluoride
B
disulfur decafluoride
C
silicon tetrafluoride
D
thionyl fluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
Irradiation (UV/VIS); UV photolysis in silaca ampule for 500 h, unidentified fluorocarbons also formed; |
(trifluoroethenyl)pentafluorosulfur(VI)
A
fluorosulfonyl fluoride
B
disulfur decafluoride
C
silicon tetrafluoride
D
thionyl fluoride
Conditions | Yield |
---|---|
other Radiation; γ-radiolyis, 408 h; |
{1,2-difluoro-1,2-bis(trifluoromethyl)-1,2-ethanediyl}bis(pentafluorosulfur(VI))
A
disulfur decafluoride
B
octafluoro-2-butene
Conditions | Yield |
---|---|
50°C, 48 h, complete react at 100°C, 16 h; detected by 19F NMR spectr.; |
osmium hexafluoride
B
disulfur decafluoride
C
SF3(1+)*OsF6(1-)=[SF3][OsF6]
D
sulfur tetrafluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: BF3; 5% excess of OsF6 added at liquid-nitrogen temp. to B2S3, heated at 210°C for 4-6 h; volatiles determined by IR, solids did by X-ray powder diffraction; |
iridium hexafluoride
A
disulfur decafluoride
B
SF3(1+)*IrF6(1-)=[SF3][IrF6]
C
sulfur tetrafluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: BF3; 5% excess of IrF6 added at liquid-nitrogen temp. to B2S3, heated at 210°C for 4-6 h; volatiles determined by IR, solids did by X-ray powder diffraction; |
osmium hexafluoride
B
disulfur decafluoride
C
SF3(1+)*OsF6(1-)=[SF3][OsF6]
D
sulfur tetrafluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) 5% excess of OsF6 added at liquid-nitrogen temp. to ZnS, heated at 300°C for 7-11 h; volatiles determined by IR, solids did by X-ray powder diffraction; |
iridium hexafluoride
A
disulfur decafluoride
B
SF3(1+)*IrF6(1-)=[SF3][IrF6]
C
sulfur tetrafluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) 5% excess of IrF6 added at liquid-nitrogen temp. to ZnS, heated at 300°C for 7-11 h; volatiles determined by IR, solids did by X-ray powder diffraction; |
pentafluoronitrosulfane
A
disulfur decafluoride
thionyl tetrafluoride
C
Nitrogen dioxide
Conditions | Yield |
---|---|
In neat (no solvent, gas phase) Kinetics; byproducts: FNO; decompn. at room temp.; not isolated; |
pentafluorosulfanyl bromide
Nitrogen dioxide
A
disulfur decafluoride
B
pentafluoronitrosulfane
thionyl tetrafluoride
D
sulfur tetrafluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: Br2, FNO; Irradiation (UV/VIS); irradiated for 12 h with λmax = 420 nm; condensed into a cylinder held at -196°C, vac. transferred into another cylinder, condensed several times (trap-to-trap); obtained with apurity of ca 98%; |
Conditions | Yield |
---|---|
byproducts: SF6, SF4; 150°C, 16 h, procedure described by T. A. Kovacina, A. D. Berry,and W. B. Fox, J. Fluorine Chem., 7,430, (1976); trap-to-trap fractionation (-63°C, -116°C, -196°C), addn. of Hg to the trap at 0°C; | 85% |
In neat (no solvent) reaction; distn.; |
disulfur decafluoride
sulfur dioxide
A
fluorosulfonyl fluoride
B
pentafluorosulfur fluorosulfonate
C
sulfur trioxide
D
thionyl fluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, in glass vessel; |
disulfur decafluoride
trifluoronitrosomethane
cis-hexafluoroazomethane
Conditions | Yield |
---|---|
at 140-150°C (23 h); | |
at 140-150°C (23 h); |
Conditions | Yield |
---|---|
heating to 140-150°C 23 h; | |
heating to 140-150°C 23 h; |
Conditions | Yield |
---|---|
In neat (no solvent) Kinetics; byproducts: Na sulfide; in quartz ball; presence of Pt; combustion under inflammation;; | >99 |
In neat (no solvent) |
disulfur decafluoride
hydrogen
A
hydrogen fluoride
B
hydrogen sulfide
Conditions | Yield |
---|---|
In neat (no solvent, gas phase) Kinetics; Electrochem. Process; electric sparks in glass vessel (covered with KOH);; | |
In neat (no solvent, gas phase) |
Conditions | Yield |
---|---|
With quartz In neat (no solvent) byproducts: SiF4; decompn. at red heat; (in presence of S at lower temps.);; | |
In neat (no solvent) |
Conditions | Yield |
---|---|
With Hg In neat (no solvent) Kinetics; byproducts: Hg fluoride, Hg sulfide; red heat; in quartz ball;; | |
With Cu In neat (no solvent) Kinetics; byproducts: Cu fluoride, Cu sulfide; red heat; shavings in quartz ball;; | |
With Pt In neat (no solvent) Kinetics; byproducts: Pt fluoride; red heat; shavings in quartz ball;; | |
With grease In neat (no solvent) decompn. of stop cock grease (discoloration to black);; | |
In neat (no solvent) |
Conditions | Yield |
---|---|
With Ni or monel In neat (no solvent) Kinetics; decompn. on passing through Ni (or monel) tube at 160-180°C; mechanism discussed;; | |
With Ni or monel In neat (no solvent) decompn. on passing through Ni (or monel) tube at 400°C;; | |
In neat (no solvent) |
disulfur decafluoride
pentafluorosulfanyl chloride
Conditions | Yield |
---|---|
With chlorine In neat (no solvent) passing Cl2 and S2F10 through tube at 350°C;; | |
With chlorine In neat (no solvent) passing Cl2 and S2F10 through tube under reduced pressure;; | >99 |
disulfur decafluoride
sulfurpentafluoride
Conditions | Yield |
---|---|
In neat (no solvent) S2F10 mixed with Ne or Ar (1:1000); low-pressure flash thermolysis at 400°C; quenching in Ne matrix (at 6 K) or Ar matrix (at 16 K); |
polytetrafluoroethylene
disulfur decafluoride
1,2-diiodotetrafluoroethane
(2-iodotetrafluoroethyl)pentafluorosulfur(VI)
Conditions | Yield |
---|---|
equiv. mixt. of educts, 150 psi in Inocel autoclave, 150°, 4 h, good yield; 95% purity; | |
equiv. mixt. of educts, 150 psi in Inocel autoclave, 150°, 4 h, good yield; 95% purity; |
polytetrafluoroethylene
disulfur decafluoride
1,2-diiodotetrafluoroethane
A
(2-iodotetrafluoroethyl)pentafluorosulfur(VI)
B
(4-iodooctafluorobutyl)pentafluorosulfur(VI)
C
(6-iodododecafluorohexyl)pentafluorosulfur(VI)
Conditions | Yield |
---|---|
heating the mixt. to 150°C for 3.5 h with intermittent injection of CF2=CF2, further products; distn., I(CF2CF2)nSF5 n>=4 detected by MS; | |
heating the mixt. to 150°C for 3.5 h with intermittent injection of CF2=CF2, further products; distn., I(CF2CF2)nSF5 n>=4 detected by MS; |
polytetrafluoroethylene
disulfur decafluoride
1,2-diiodotetrafluoroethane
E
(2-iodotetrafluoroethyl)pentafluorosulfur(VI)
Conditions | Yield |
---|---|
heating the mixt. to 150°C for 3.5 h with intermittent injection of CF2=CF2, further products; distn. I(CF2CF2)nSF5 n>=4 detected by MS; | |
heating the mixt. to 150°C for 3.5 h with intermittent injection of CF2=CF2, further products; distn. I(CF2CF2)nSF5 n>=4 detected by MS; |
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