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Commodity Hexafluoroethane Molecular Formula R116 CAS No. 76-16-4 UN No. 2193
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inquiryHEXAFLUOROETHANE Basic information Product Name: HEXAFLUOROETHANE
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inquiry99.9%~99.99% Hexafluoroaethane,C2F6 Purity : 99.999% Guaranteed Specification: Oxygen ≤ 2ppmv Nitrogen ≤ 8ppmv Carbo… Package:44L/47L cylinder
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Good Price, prompt shipment Application:Catalytic agent; Petrochemical additive; Used in organic synthesis
Purity Grade customized Formula C2F6 Application Hexafluoroethane is used as a versatile etchant in semiconductor manufacturing. It can be …
Supply top quality products with a reasonable price Application:api
1,1,1,2-tetrafluoroethane
A
1,1,1,2,2-pentafluoroethane
B
Difluoromethane
C
trifluoromethan
D
Hexafluoroethane
Conditions | Yield |
---|---|
With fluorine at 200 - 250℃; Product distribution; Further Variations:; Reagents; | A 1.1% B 0.9% C 0.4% D 97.6% |
Perfluoromethyl azide
A
carbon tetrafluoride
B
Hexafluoroethane
C
difluoramino trifluoromethane
Conditions | Yield |
---|---|
With fluorine at 70℃; for 48h; | A 6% B 2% C 92% |
polytetrafluoroethylene
Te4(2+)*2AsF6(1-)=Te4(AsF6)2
A
Hexafluoroethane
B
bis(pentafluoroethyl)tellurium
C
bis(pentafluoroethyl) ditelluride
D
pentafluoroethyl(nonafluorobutyl)tellurium
E
arsenic(III) fluoride
Conditions | Yield |
---|---|
at 100°C for 11 d, at 15 atm in a Monel reactor; | A n/a B 87% C 12.2% D 0.5% E n/a |
at 100°C for 11 d, at 15 atm in a Monel reactor; | A n/a B 87% C 12.2% D 0.5% E n/a |
at 100°C for 11 d, at 15 atm in a Monel reactor; | A n/a B 87% C 12.2% D 0.5% E n/a |
iodotrifluoromethane
A
rhodium iodo carbonyl (triphenylphosphine)2 complex
B
Hexafluoroethane
Conditions | Yield |
---|---|
In tetrahydrofuran a suspn. of Rh complex in THF and CF3I in 1:2 molar ratio sealed in vacuo in a Pyrex reaction tube was either stirred or shaken for 4 h at 20°C; volatiles were removed under vac., trapped at -196°C and analyzed by GLC, residue was chromd. using hexane followed by benzene or CHCl3 as eluent, and recrystd. from a mixt. of either CHCl3 and EtOH or benzene and MeOH; | A 44% B 79% |
In tetrahydrofuran a suspn. of Rh complex in THF and CF3I in 1:1 molar ratio sealed in vacuo in a Pyrex reaction tube was either stirred or shaken for 50 h at 20°C; 43% of the starting solvate was recovered; volatiles were removed under vac., trapped at -196°C and analyzed by GLC, residue was chromd. using hexane followed by benzene or CHCl3 as eluent, and recrystd. from a mixt. of either CHCl3 and EtOH or benzene and MeOH; | A 26% B 46% |
1,1,2-Trichloro-1,2,2-trifluoroethane
A
Hexafluoroethane
B
Chloropentafluoroethane
C
1,2-dichloro-1,1,2,2-tetrafluoroethane
Conditions | Yield |
---|---|
With chromium fluoride; magnesium fluoride; hydrogen fluoride at 250 - 500℃; Product distribution; | A 3% B 78% C 19% |
tetrafluorohydrazine
pentafluoro(1,1,2,2,2-pentafluoroethyl)-λ6-sulfane
A
carbon tetrafluoride
B
Hexafluoroethane
C
Perfluoroethylamine
D
sulfur tetrafluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
NF3 formed too; | A n/a B n/a C 70% D n/a E n/a |
NF3 formed too; | A n/a B n/a C 70% D n/a E n/a |
(E)-1,2-difluoroethene
Hexafluoroacetone
A
Hexafluoroethane
B
1,1,1,2,3,4,4,4-octafluorobutane
cis-2,2-bis(trifluoromethyl)-3,4-difluoro-oxetan
trans-2,2-bis(trifluoromethyl)-3,4-difluoro-oxetan
Conditions | Yield |
---|---|
for 144h; Irradiation; | A 7 mg B 0.3% C 26% D 69% |
Ethanesulfonamide
A
Hexafluoroethane
B
ethanesulfonyl fluoride
C
Trifluoromethanesulfonyl fluoride
D
pentafluoroethanesulfonyl fluoride
Conditions | Yield |
---|---|
With hydrogen fluoride current: 4.5 to 5.5 V; 0.3 to 0.6 Adm-2; Further byproducts given; | A 2.1% B 3.1% C n/a D 54.9% |
Conditions | Yield |
---|---|
With silver for 1h; Product distribution; Irradiation; further metal; addition of NO; investigation of isotopic selectivity; | A n/a B 54% |
cis-2,3-difluoro-5,6-bis(trifluoromethyl)-2,3-dihydro-p-dioxin
A
Hexafluoroethane
B
(Z)-1,2-difluoro-ethene
C
(E)-1,2-difluoroethene
D
1,1,1,4,4,4-hexafluoro-2,3-butanedione
Conditions | Yield |
---|---|
at 610℃; Product distribution; various reaction conditions; | A 31% B 46% C 34% D 18% |
perfluoro(N,N-dimethyl trifluorovinylamine)
A
trifluoromethan
B
Vinylidene fluoride
C
Hexafluoroethane
D
trifluoromethyl isocyanate
E
perfluoro(2-aza-1-hexene)
Conditions | Yield |
---|---|
With toluene pyrolysis 610°C, contact time 0.66 sec, further product; | A n/a B n/a C n/a D n/a E 46% |
With toluene pyrolysis 610°C, contact time 0.66 sec, further product; | A n/a B n/a C n/a D n/a E 46% |
iodo-bis-trifluoromethyl-phosphine
A
iodotrifluoromethane
B
Hexafluoroethane
C
trifluoromethyldiiodophosphine
D
tris(trifluoromethyl)phosphine
E
phosphorous triiodide
Conditions | Yield |
---|---|
205°C (48 h); | A 2% B 8% C 2% D 45% E n/a |
propane-1-sulfonamide
A
freon-218
B
Hexafluoroethane
C
ethanesulfonyl fluoride
D
1-perfluoropropanesulfonyl fluoride
Conditions | Yield |
---|---|
With hydrogen fluoride current: 4.5 to 5.5 V; 0.3 to 0.6 Adm-2; Further byproducts given; | A 2.8% B 3.1% C 4.3% D 40% |
(Z)-1,2-difluoro-ethene
Hexafluoroacetone
A
Hexafluoroethane
B
1,1,1,2,3,4,4,4-octafluorobutane
cis-2,2-bis(trifluoromethyl)-3,4-difluoro-oxetan
trans-2,2-bis(trifluoromethyl)-3,4-difluoro-oxetan
Conditions | Yield |
---|---|
for 144h; Irradiation; | A 8 mg B 6% C 38% D 37% |
Conditions | Yield |
---|---|
With nickel(II) fluoride; fluorine at 100℃; | 35% |
With antimony pentafluoride at 25 - 98℃; under 50 - 760 Torr; |
tris(trifluoromethyl)arsine
methyl iodide
A
iodotrifluoromethane
B
Hexafluoroethane
C
methylbistrifluoromethylarsine
Conditions | Yield |
---|---|
Irradiation (UV/VIS); with UV-light; | A 18% B 15% C n/a |
trifluoromethan
A
polytetrafluoroethylene
B
carbon tetrafluoride
C
freon-218
D
perfluoropropylene
E
Hexafluoroethane
Conditions | Yield |
---|---|
With activated carbon supported potassium at 799.84℃; under 750.075 Torr; Pyrolysis; Inert atmosphere; | A 16.1% B n/a C n/a D 14.4% E n/a |
Conditions | Yield |
---|---|
Irradiation (UV/VIS); photochemical hydrogenation at 50°C, 16 h; | A n/a B 14% |
Irradiation (UV/VIS); photochemical hydrogenation at 20°C, 19 h; |
1,1,1,2-tetrafluoroethane
A
1,1,1,2,2-pentafluoroethane
B
Hexafluoroethane
Conditions | Yield |
---|---|
With cobalt (III) fluoride at 220℃; for 0.000277778h; Product distribution; var. fluorinating agents and temp.; | A 12.4% B 2% |
Product distribution; |
Conditions | Yield |
---|---|
im Kohlelichtbogen; | |
In neat (no solvent) other Radiation; decomposition of CF4 by (60)Co-γ-rays, formation of C2F6 and C3F8;; determination by ESR;; |
Conditions | Yield |
---|---|
im Kohlelichtbogen; | |
Zersetzung im elektrischen Lichtbogen; | |
In neat (no solvent) Electric Arc; formation of C2F4 and C2F6 in electric arc between coal electrodes;; |
Conditions | Yield |
---|---|
bei wiederholtem Leiten durch einen Kohlelichtbogen unter vermindertem Druck; |
Conditions | Yield |
---|---|
at 127℃; | |
at 626.9 - 826.9℃; Kinetics; | |
In neat (no solvent) Kinetics; reaction is carried out by photolysis of CF3COCF3 in Ar at various conditions;; |
iodo-bis-trifluoromethyl-phosphine
A
iodotrifluoromethane
B
Hexafluoroethane
C
trifluoromethyldiiodophosphine
D
tris(trifluoromethyl)phosphine
Conditions | Yield |
---|---|
at 205℃; |
2H-pentafluoropropene
iodotrifluoromethane
A
1,1,1,3,3-pentafluoro-3-iodo-2-trifluoromethyl-propane
B
trifluoromethan
C
Hexafluoroethane
Conditions | Yield |
---|---|
UV-Licht.Irradiation; |
tetrafluoroacetic acid
A
carbon tetrafluoride
B
Carbonyl fluoride
C
Hexafluoroethane
D
methylammonium carbonate
Conditions | Yield |
---|---|
at 30 - 80℃; under 1 - 3 Torr; Kinetics; Thermolyse; |
pentafluoro-propionyl hypofluorite
A
Hexafluoroethane
B
methylammonium carbonate
Conditions | Yield |
---|---|
at -40 - 25℃; Zersetzung unter vermindertem Druck; |
Conditions | Yield |
---|---|
With copper; fluorine | |
With fluorine at 64℃; | |
With chlorine trifluoride und Leiten des Reaktionsgemisches ueber Aluminiumfluorid bei 360grad; |
Conditions | Yield |
---|---|
With iodine pentafluoride anfangs in Kaeltemischung, zuletzt bei 80-90grad; |
polytetrafluoroethylene
A
perfluoropropylene
B
Hexafluoroethane
C
perfluoroisobutylene
D
Octafluorocyclobutane
Conditions | Yield |
---|---|
at 600℃; Dimerisierung.Pyrolysis; | |
at 650℃; Dimerisierung.Pyrolysis; |
Conditions | Yield |
---|---|
With hydrogen at 336.84 - 736.84℃; Product distribution / selectivity; Gas phase; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
Sonication; electric discharge, low pressure; | 90% |
Sonication; electric discharge, low pressure; | 90% |
Hexafluoroethane
tellurium(IV) tetrabromide
A
bis(trifluoromethyl) ditelluride
B
bis(trifluoromethyl)tellurium
Conditions | Yield |
---|---|
other Radiation; at 20°C (46 h); distn.; | A 20% B 33% |
other Radiation; at 20°C (46 h); distn.; | A 20% B 33% |
other Radiation; at 20°C (46 h); distn.; | A 20% B 33% |
other Radiation; at 20°C (46 h); distn.; | A 20% B 33% |
Conditions | Yield |
---|---|
other Radiation; converting BiI3 by radio frequency at 1 Torr into plasma then C2F3 adding continuously, reacting time 100 h; collecting of -78°C and -196°C traps, distn. at -55°C; | 32% |
Conditions | Yield |
---|---|
In solid matrix other Radiation; in special constructed rotating cold finger reactor; with W basket filled with Tl reactor evacuated, cold finger is cooled by liquid N2 and CF3CF3 added at rate 1-2 mmol/min, radio frequency power is set approx. 50 W and metal slowly evapd. during 3 h; condensed CH2Cl2, matrix dropped into bottom by warming with air, CF3CF3 distd. in vac. at -131 °C, pressurized with 500 mm of N2 and warmed to room temp. with stirring, soln. of Tl(CF3)3 siphonded into flask; | 25% |
Conditions | Yield |
---|---|
With dihydrogen peroxide; iodine monofluoride; bis(acetylacetonate)oxovanadium In water Product distribution / selectivity; Heating / reflux; | 15% |
With iodine monofluoride; palladium on activated carbon; copper on carbon; platinum on activated charcoal at 250 - 550℃; Product distribution / selectivity; Vapor phase; |
1,2-dimethoxyethane
Hexafluoroethane
cadmium
bis(trifluoromethyl)cadmium * dimethoxyethane
Conditions | Yield |
---|---|
In diethyl ether Cd was vaporized and condensed with CF3 radicals on a liquid N2 cooled surface, after 3 h reactor was warmed to -78°C to pump off the excess C2F6, ether and glyme were condensed into reactor; evapn. of volatiles, extn. of residue with Et2O (inert atmosphere); IR,NMR; | 11% |
indium
Hexafluoroethane
trimethylphosphane
tris(trifluoromethyl)indium(trimethylphosphine)
Conditions | Yield |
---|---|
In neat (no solvent) other Radiation; In was vaporized from a tungsten basket and condensed with CF3 radicals, generated from C2F6 by radio frequency glow discharge, at -196°C for 3 h; removal of C2F6 in vac. at -78°C; ether and P(CH3)3 were added by condensation; room temp.;; the volatiles were pumped off; extraction with ether; recrystn. from hexane; performed in an argon dry box;; | 9% |
Conditions | Yield |
---|---|
With pyridine In diethyl ether Zn was vaporized and condensed with CF3 radicals on a liquid N2 cooled surface, after 3 h reactor was warmed to -78°C to pump off the excess C2F6, ether and pyridine were condensed into reactor; warmed to room temp., extd. with CH2Cl2 and recrystd. from hexane; NMR; | 8% |
Hexafluoroethane
trimethylbismuthine
A
Dimethyl-trifluormethyl-wismut
B
Methyl-bis-trifluormethyl-wismut
Conditions | Yield |
---|---|
In gas other Radiation; radio frequency radiation of mixt. of educts in a special pyrex reactor,ratio of educts: C2F6/alkyl metal = 25/1, 2h, condensation of product on a liquid N2 filled cold finger, excess C2F6 removed by vac. distn. at -100°C; sepn. by gas chromy. (10% SE-30 on Chromosorb P); | A 5.1% B 0.9% |
Hexafluoroethane
dimethylmercury
A
bis(trifluoromethyl)mercury
B
methyl(trifluoromethyl)mercury
Conditions | Yield |
---|---|
In gas other Radiation; radio frequency radiation of mixt. of educts in a special pyrex reactor,ratio of educts: C2F6/alkyl metal = 25/1, 2h, condensation of product on a liquid N2 filled cold finger, excess C2F6 removed by vac. distn. at -100°C; sepn. by gas chromy. (10% SE-30 on Chromosorb P); | A 4.9% B 3.4% |
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