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Cas:7632-51-1
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inquiryThe above product is Ality Chemical's strong item with best price, good quality and fast supply. Ality Chemical has been focusing on the research and production of this field for over 14 years. At the same time, we are always committed to providi
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Cas:7632-51-1
Min.Order:10 Gram
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inquiryZibo Hangyu Biotechnology Development Co., Ltd is a leading manufacturer and supplier of chemicals in China. We develop produce and distribute high quality pharmaceuticals, intermediates, special chemicals and OLED intermediates and other fine chemi
Cas:7632-51-1
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inquiryOcean inorganic department is a professional supplier and exporter engaging in inorganic chemical materials and metal organic compounds. Over the past years, our company is committed to improving the product quality and developing new products, in
Cas:7632-51-1
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inquiry1.Our services:A.Supply sampleB.The packing also can be according the customers` requirmentC.Any inquiries will be replied within 24 hoursD.we provide Commerical Invoice, Packing List, Bill of loading, COA , Health certificate and Origin certificate.
Cas:7632-51-1
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inquiryProduct Description Description & Specification Category Pharmaceutical Raw Materials, Fine Chemicals, Bulk drug Standard Medical standard
Cas:7632-51-1
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inquiryAnsciep Chemical is a professional enterprise manufacturing and distributing fine chemicals and speciality chemicals. We have been dedicated to heterocycle compounds and phenyl rings for tens of years. This is our mature product for export. Our quali
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inquiryHuBei ipure is a diversified product production and operation enterprise, with API, pharma intermediates, and other fine chemicals as well as R&D and pigments development and sales as one of the large enterprises, with more than 130 acres of pl
Cas:7632-51-1
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inquirysub/micron to mesh powders (near/spheres, whiskers, flake, fiber, porous) and grain/ball, thin/ thick metal / alloys pieces / parts, thin and thick (particle) film materials /target, and custom-made crystals, substrates/parts. In the industries and a
At Share Chemical Company, we scrupulously abide by our policy of “Excellent Quality at a Reasonable Price”. We strive to satisfy all of our customers by providing the finest quality products supported by the finest in customer servi
Cas:7632-51-1
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inquiryUnited Scientific Company Located in Shanghai of China , is a competitive player in the global specialty and fine chemical market. Fenghua has both the expertise and flexibility to produce a wide range of chemicals. Focusing on developing the innovat
Cas:7632-51-1
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inquiryVanadium chloride(VCl4), (T-4)- Storage:Store in dry and cool condition Package:25kg or according to cutomer's demand Application:Chemical research/Pharmaceutical intermediates Transportation:By Sea,by Air,By courier like DHL or Fedx. Port:Shanghai/S
Adequate stocks available,prompt shipment,Strictly control on quality,Timely after-sales Application:API
Cas:7632-51-1
Min.Order:0
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inquirySupply top quality products with a reasonable price Application:api
CFTC?PharmaChem?is?a?service?based?company?in?China,?a?pharmachem?division?of?Changzhou?Foreign?Trade?Corp.,supplying?raw?materials,?intermediates,?APIs?and?fine?chemicals?for?the?pharmaceutical?and?specialty?chemical?industries?worldwide. Applicatio
Molecular Formula: VCl4 Molecular Weight: 192.75 Melting: -28°C Boiling Point: 148-153°C Flash Point: 148.5°C/755mmAppearance:red to brown liquid Transportation:UN2444, Class 8, PG I
Conditions | Yield |
---|---|
In neat (no solvent) heating 97% V and Cl2 at 200 - 250°C; reaction time: 6 - 8 h;; | 95% |
In neat (no solvent) heating 97% V and Cl2 at 200 - 250°C; reaction time: 6 - 8 h;; | 95% |
In neat (no solvent) react. of V powder with gaseous Cl2 at ambient temp., faster on heating;; |
vanadiumtetrachloride
Conditions | Yield |
---|---|
With magnesium chloride In neat (no solvent) reaction by roasting of descloizite with MgCl2*H2O;; | 43% |
vanadiumtetrachloride
Conditions | Yield |
---|---|
With magnesium chloride In neat (no solvent) reaction by roasting of vanadinite with MgCl2*H2O;; | 43% |
Conditions | Yield |
---|---|
In neat (no solvent) heating under back flow, 800°C;; | |
In tetrachloromethane heating at 800°C;; |
Conditions | Yield |
---|---|
In neat (no solvent) Electrolysis; crumbling of V-anode;; leakage of VCl4;; | |
In neat (no solvent) Electrolysis; crumbling of V-anode;; leakage of VCl4;; |
chlorine
sulfur
A
disulfur dichloride
B
sulfur dichloride
C
vanadiumtetrachloride
D
vanadium(V) oxychloride
Conditions | Yield |
---|---|
In neat (no solvent) heating;; |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: S2, SO2; react. of V-powder with streaming SOCl2 at 600 to 700°C;; gaseous VCl4 besides gaseous S2 and SO2 obtained;; | |
In neat (no solvent) |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: S2, CO; react. of V-powder with streaming SOCl2 and COCl2 at 600 to 700°C;; gaseous VCl4 besides gaseous S2 and CO obtained;; |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: S2, SO2; react. of V-powder with streaming S2Cl2 at 600 to 700°C;; gaseous VCl4 besides gaseous S2 and SO2 obtained;; | |
In neat (no solvent) |
Conditions | Yield |
---|---|
In neat (no solvent) heating under back flow, 600°C;; | |
In tetrachloromethane heating at 600°C;; |
vanadium
chlorine
A
vanadiumtetrachloride
B
vanadium(V) oxychloride
Conditions | Yield |
---|---|
With oxygen In neat (no solvent) react. of V powder with gaseous Cl2 in presence of O2 at ambient temp., faster on heating;; VCl4 contaminated with VOCl3 obtained;; | |
With O2 In neat (no solvent) react. of V powder with gaseous Cl2 in presence of O2 at ambient temp., faster on heating;; VCl4 contaminated with VOCl3 obtained;; |
Conditions | Yield |
---|---|
In neat (no solvent) Electrolysis; crumbling of V-anode;; leakage of VCl4;; | |
In neat (no solvent) Electrolysis; crumbling of V-anode;; leakage of VCl4;; |
Conditions | Yield |
---|---|
In not given heating under reflux;; | |
In not given heating under reflux;; |
disulfur dichloride
A
vanadium(III) chloride
B
vanadiumtetrachloride
C
vanadium(V) oxychloride
Conditions | Yield |
---|---|
In not given heating;; |
Conditions | Yield |
---|---|
In neat (no solvent) red heat;; | |
In neat (no solvent) red heat;; |
disulfur dichloride
chlorine
A
vanadiumtetrachloride
B
vanadium(V) oxychloride
Conditions | Yield |
---|---|
In neat (no solvent) passing Cl2 stream with S2Cl2 over V2O5 at ambient temp., slow heating;; |
Conditions | Yield |
---|---|
In neat (no solvent) at 400°C in bomb tube;; | |
In neat (no solvent) passing steam of CCl4 over V2O5 at 490 °C;; | |
In neat (no solvent) excess of CCl4; at 400°C;; | |
In neat (no solvent) at 400°C in bomb tube;; | |
In neat (no solvent) excess of CCl4; at 400°C;; |
Conditions | Yield |
---|---|
In neat (no solvent) at 200 - 300°C;; | |
In neat (no solvent) at 200 - 300°C;; |
Conditions | Yield |
---|---|
With sulfur In neat (no solvent) passing Cl2 stream over V2O5-S mixture; acceleration of formation of VOCl3 at low temp.;; | |
In neat (no solvent) destillation of mixture at 550°C;; | |
In neat (no solvent) |
chlorine
A
disulfur dichloride
B
vanadium(III) chloride
C
vanadiumtetrachloride
Conditions | Yield |
---|---|
In neat (no solvent) at higher temp.;; | |
In neat (no solvent) at higher temp.;; |
Conditions | Yield |
---|---|
In neat (no solvent) in N2-stream at red heat;; | |
In neat (no solvent) reaction started in inert gas stream at 425°C;; | |
In neat (no solvent) reaction started under Ar at 605°C;; |
Conditions | Yield |
---|---|
With chlorine In neat (no solvent) chemical transport reaction (300 to 250°C);; | |
With Cl2 |
Conditions | Yield |
---|---|
In neat (no solvent) | |
In neat (no solvent) heating under exclusion of O2 and H2O at 600°C;; | >99 |
In neat (no solvent) distn. at 180°C;; |
vanadium(V) oxychloride
B
vanadium(III) chloride
C
vanadiumtetrachloride
Conditions | Yield |
---|---|
With hydrogen In neat (no solvent) at 500 - 850°C;; | |
With H2 In neat (no solvent) at 500 - 850°C;; |
Conditions | Yield |
---|---|
With sugar coal In neat (no solvent) | |
With sugar coal In neat (no solvent) |
Conditions | Yield |
---|---|
With hydrogen In neat (no solvent) byproducts: V-oxide chlorides; | |
With H2 In neat (no solvent) byproducts: V-oxide chlorides; |
Conditions | Yield |
---|---|
With hydrogen; pyrographite In neat (no solvent) byproducts: V-oxide chlorides; | |
With H2; charcoal In neat (no solvent) byproducts: V-oxide chlorides; |
Conditions | Yield |
---|---|
With sugar coal In neat (no solvent) | >99 |
With pyrographite In neat (no solvent) above 148°C;; | |
With disulfur dichloride In neat (no solvent) heating at dark red heat;; |
Conditions | Yield |
---|---|
In neat (no solvent) CCl4 in excess;; | |
In neat (no solvent) at 500 - 600°C;; | |
In neat (no solvent) at 500 - 600°C;; |
Conditions | Yield |
---|---|
In neat (no solvent) at 400 - 500°C under exclusion of air;; |
Conditions | Yield |
---|---|
In tetrachloromethane inert atm.; equimolar ratio, stirring (-25°C); pptn., washing (CCl4), drying (vac.); | 100% |
Conditions | Yield |
---|---|
In benzene | 99% |
In benzene | 99% |
hydrogen bromide
vanadiumtetrachloride
vanadium(III) bromide
Conditions | Yield |
---|---|
In n-heptane cooling VCl4 in heptane (100ml) at ca -35°C; connecting to a vac. line and to a cylinder of HBr; introduction of HBr (color change from orange-brown to bright violet); repeating several times vac./HBr procedure, 5h; room temp., stirring, 15h;; filtration of formed ppt.; washing with heptane; drying in vac.; elem. anal.;; | 99% |
In n-heptane byproducts: HCl; cooling VCl4 in heptane, ca -35°C; connecting to a vac. line and to a cylinder of HBr; introduction of HBr (change from orange-brown to bright violet; molar HBr:V=4.02:1); repeating several times vac./HBr procedure, 5h; room temp., stirring, 15h;; filtration of formed ppt.; washing with heptane; drying in vac.; IR-spectrum of soln. (dissolved in HCl);; | 89% |
vanadiumtetrachloride
benzene
A
4,4'-bis[P-(chlorogold(I))diphenylphosphino]biphenyl
Conditions | Yield |
---|---|
In benzene under N2; soln. of Au complex in benzene added to neat VCl4; stirred overnight; cetrifuged; decanted; concd. in vac.; residue crystd. from benzene-pentane; elem. anal.; | A 99% B 82% |
Conditions | Yield |
---|---|
With hydrogen sulfide In benzene treatment with H2S about 20 min at ambiente temp.;; washing pptn. with CCl4 and drying in vacuum at 2 torr and 150°C;; | 98% |
With HI In n-heptane treating a heptane soln. of VCl4 with dry HI; stirring, room temp., 15 h;; filtration; washing solid with heptane; heating, 50°C, 0.05mmHg, 4h; elem. anal.;; | 97% |
In neat (no solvent) decompn. about 50 h;; purifn. in vac.;; | 90% |
Conditions | Yield |
---|---|
With (CH3)2NH In water High Pressure; a mixt. of VCl4, As2O5, NH4Cl, and H2O in mole ratio 1:2.5:6:139 was heated in a teflon-lined Parr acid digestion bomb at 150°C for 72 h; addn. of (CH3)2NH and further heating at 150°C for 72 h;; | A 95% B 5% |
N-(2,6-dimethylphenyl)-N'-hydroxy-N'-methylbenzamidine
vanadiumtetrachloride
trichloro[N-(2,6-dimethylphenyl)-N'-methyl-N'-oxybenzamidinato]vanadium(IV)
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran; pentane byproducts: LiCl; Ar, to a soln. of amidino compd. (THF) added a soln. of Li compd. (pentane) at -80°C, stirred for 1 h, VCl4 (1.2 equiv.) added, stirred without cooling overnight; volatiles removed (vac.), residue dissolved (CH2Cl2), filtered, solvent removed (vac.), triturated (hexane), solvent removed, ppt. dried (vac.);elem. anal.; | 95% |
Conditions | Yield |
---|---|
In pentane pentane soln. of VCl4 was slowly added at -78 °C under stirring to pentane soln. of MeOCH2CH2OMe, mixt. was stirred for 1 h at -60 and 2h at 20 °C, resp.,; ppt. was filtered, washed thoroughly with pentane, dried in vac., elem.anal.; | 94% |
ortho-phenylenebis(dimethylarsine)
vanadiumtetrachloride
tetrachloro bis-(o-phenylene bis-dimethylarsine) vanadium (IV)
Conditions | Yield |
---|---|
In tetrachloromethane (under N2, Schlenk); ligand dissolved in CCl4, VCl4 added dropwise, stirred for 1 h; filtered, rinsed with CCl4, dried in vacuo; elem. anal.; | 92% |
In tetrachloromethane addition of an excess of the arsine compound to a solution of VCl4 in CCl4 under N2;; precipitation; washing with CCl4;; |
tetrahydrofuran
vanadiumtetrachloride
mer-VCl3(tetrahydrofuran)3
Conditions | Yield |
---|---|
With triethylboron In dichloromethane under Ar or N2; THF was cooled in an ice bath, VCl4 in CH2Cl2 was added, BEt3 was added, warmed to 90°C (oil bath) for 1 h; cooling, filtn., washing, drying in a glovebox; | 90% |
Conditions | Yield |
---|---|
With CH2Cl2 In dichloromethane exclosure of moisture; condensation of VCl4 to a soln. of PPh4Cl in CH2Cl2 at -196°C, mixture is allowed to thaw slowly, stirring; pptn. by addn. of CCl4, filtration, washing with some CH2Cl2/CCl4 (1:1), drying in vac. for a short time; elem. anal.; | 90% |
ethane-1,2-diphosphonic acid
vanadiumtetrachloride
ethylenediamine
H3NCH2CH2NH3(2+)*VO(2+)*O3PCH2CH2PO3(4-)=(H3NCH2CH2NH3)[(VO)(O3PCH2CH2PO3)]
Conditions | Yield |
---|---|
In water 200°C (autoclave, 96 h); elem. anal.; | 90% |
Conditions | Yield |
---|---|
Stage #1: N-Ethylmethylamine With n-butyllithium In hexane; cyclohexane at -60 - 0℃; for 10h; Inert atmosphere; Autoclave; Stage #2: vanadiumtetrachloride In hexane; cyclohexane at -60℃; for 10h; Solvent; Reflux; | 89.2% |
2,5-diselenahexane
vanadiumtetrachloride
tetrachloro bis-(1,2-bis-methylseleno ethane) vanadium (IV)
Conditions | Yield |
---|---|
In dichloromethane (N2, Schlenk) selenoether in CH2Cl2 was slowly added to the soln. of VCl4 in CH2Cl2; concd. in vac., filtered, ppt. was dried in vac.; elem. anal.; | 88% |
In not given reaction in organic solvents;; | |
In not given reaction in organic solvents;; |
triethylsilane
vanadiumtetrachloride
A
triethylsilyl chloride
B
vanadium(III) chloride
Conditions | Yield |
---|---|
In neat (no solvent) in heating triethylsilane in 5 min;; | A 87% B n/a C n/a |
In neat (no solvent) in heating triethylsilane in 5 min;; | A 87% B n/a C n/a |
Conditions | Yield |
---|---|
In water VCl4 dropwise addn. to ice-cold water (stirring), H2O and NaOH addn., hydothermal treatment (autogeneous pressure, 96 h, 200°C); | 87% |
tetrahydrofuran
vanadiumtetrachloride
vanadium tetrachloride * 2(tetrahydrofuran)
Conditions | Yield |
---|---|
In dichloromethane at 0℃; for 0.5h; Inert atmosphere; Schlenk technique; | 86% |
Conditions | Yield |
---|---|
In neat (no solvent) heating at reflux;; | A 85% B n/a |
1,3-bis(methylselanyl)propane
vanadiumtetrachloride
tetrachloro bis-(1,3-bis-methylseleno propane) vanadium (IV)
Conditions | Yield |
---|---|
In dichloromethane (N2, Schlenk) selenoether in CH2Cl2 was slowly added to the soln. of VCl4 in CH2Cl2; concd. in vac., filtered, ppt. was dried in vac.; elem. anal.; | 85% |
In not given reaction in organic solvents;; | |
In not given reaction in organic solvents;; |
1,4-diaza-bicyclo[2.2.2]octane
phosphoric acid
vanadiumtetrachloride
Conditions | Yield |
---|---|
With H2O In water in Parr bomb; molar ratio V:P:DABCO:H2O = 1:8.0:4.0:1375, heating (200°C, 72 h); | A 85% B n/a |
With H2O In water Parr acid digestion bomb; molar ratio V:P:DABCO:H2O = 1:6.0:4.0:2268, heating (200°C, 48 h); cooling; | A 25% B 75% |
1,3-bis(methylthio)propane
vanadiumtetrachloride
Conditions | Yield |
---|---|
In dichloromethane N2, equimol., to a soln. of V compd. added a soln. of S compd.; concd. (vac.), ppt. filtered, dried (vac.); elem. anal.; | 85% |
Conditions | Yield |
---|---|
In dichloromethane N2, equimol., to a soln. of V compd. added a soln. of S compd.; concd. (vac.), ppt. filtered, dried (vac.); elem. anal.; | 85% |
Conditions | Yield |
---|---|
In tetrahydrofuran under N2; soln. of lithium dimethylamide in THF slowly added to soln. ofvanadium(IV) chloride in THF at -78°C, soln. slowly warmed to ro om temp., stirred for 1 d; evapn. under vac., residue extd. with hexane, extract evapd. under vac.,semi-solid residue distd. at 55-60°C and 1E-2 mmHg; elem. anal.; | 85% |
Conditions | Yield |
---|---|
In diethyl ether; pentane C3H5MgCl in ether, -78°C under stirring, addn. of VCl4 dissolved in pentane; evapn. in high vac. at -60°C, filtration, recrystn. from pentane, drying in vac. at -60°C; | 81.8% |
In diethyl ether; pentane C3H5MgCl in ether, -78°C under stirring, addn. of VCl4 dissolved in pentane; evapn. in high vac. at -60°C, filtration, recrystn. from pentane, drying in vac. at -60°C; | 81.8% |
pyridine
vanadiumtetrachloride
bis(pyridine)-oxovanadium(IV)-dichloride
Conditions | Yield |
---|---|
In tetrahydrofuran; toluene byproducts: (Ph2SiO)3; (N2); stirring (overnight); evapn. (vac.), extracting (toluene), evapn., pyridine addn., crystn. (room temp.); elem. anal.; | 81.7% |
(nBu)SeCH2CH2Se(nBu)
vanadiumtetrachloride
VCl4(C4H9SeCH2CH2SeC4H9)
Conditions | Yield |
---|---|
In dichloromethane (N2, Schlenk) selenoether in CH2Cl2 was slowly added to the soln. of VCl4 in CH2Cl2; concd. in vac., filtered, ppt. was dried in vac.; elem. anal.; | 81% |
Conditions | Yield |
---|---|
In dichloromethane (N2, Schlenk) selenoether in CH2Cl2 was slowly added to the soln. of VCl4 in CH2Cl2, the soln. was stirred under gentle reflux for 1 h; concd. in vac., filtered , dried in vac.; elem. anal.; | 81% |
1,4-diaza-bicyclo[2.2.2]octane
phosphoric acid
vanadiumtetrachloride
Conditions | Yield |
---|---|
With H2O In water sealed borosilicate tube; molar ratio V:P:DABCO:H2O = 1:6.0:4.0:2268, heating (0.5°C/min, 25-200°C, then 200°C, 36 h); | 80% |
piperazine
Methylenediphosphonic acid
vanadiumtetrachloride
C4H8N2H4(2+)*VO(O3PCH2PO3)(2-)=[C4H8N2H4][VO(O3PCH2PO3)]
Conditions | Yield |
---|---|
In water 200°C (autoclave, 50 h); elem. anal.; | 80% |
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