Hexafluoroethane supplier

Name
Hexafluoroethane
EINECS 200-939-8
CAS No. 76-16-4
Article Data349
CAS DataBase
Density 1.463 g/cm³
Solubility
Melting Point -100 °C(lit.)
Formula C₂F₆
Boiling Point -78 °C(lit.)
Molecular Weight 138.012
Flash Point
Transport Information UN 2193 2.2
Appearance colourless gas
Safety 38
Risk Codes
Molecular Structure
Hazard Symbols Xi
Synonyms Ethane,hexafluoro- (8CI,9CI);Ethyl hexafluoride;F 116;F 116 (fluorocarbon);FC 116;FC 1160;Freon 116;HFC 116;Hexafluoroethane;PFC 116;Perfluorocarbon 116;Perfluoroethane;R 116;
PSA 0.00000
LogP 2.11100

Synthetic route

: 811-97-2
1,1,1,2-tetrafluoroethane

A: 354-33-6
1,1,1,2,2-pentafluoroethane

B: 75-10-5
Difluoromethane

C: 75-46-7
trifluoromethan

D: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
With fluorine at 200 - 250℃; Product distribution; Further Variations:; Reagents;	A 1.1% B 0.9% C 0.4% D 97.6%

...Expand

: 3802-95-7
Perfluoromethyl azide

A: 75-73-0
carbon tetrafluoride

B: 76-16-4
Hexafluoroethane

C: 335-01-3
difluoramino trifluoromethane

Conditions

Conditions	Yield
With fluorine at 70℃; for 48h;	A 6% B 2% C 92%

...Expand

: 116-14-3
polytetrafluoroethylene

: 12536-35-5
Te4(2+)*2AsF6(1-)=Te4(AsF6)2

A: 76-16-4
Hexafluoroethane

B: 41055-97-4
bis(pentafluoroethyl)tellurium

C: 41055-98-5
bis(pentafluoroethyl) ditelluride

D: 55620-41-2
pentafluoroethyl(nonafluorobutyl)tellurium

E: 7784-35-2
arsenic(III) fluoride

Conditions

Conditions	Yield
at 100°C for 11 d, at 15 atm in a Monel reactor;	A n/a B 87% C 12.2% D 0.5% E n/a
at 100°C for 11 d, at 15 atm in a Monel reactor;	A n/a B 87% C 12.2% D 0.5% E n/a
at 100°C for 11 d, at 15 atm in a Monel reactor;	A n/a B 87% C 12.2% D 0.5% E n/a

...Expand

: (Rh(CO)(P(C6H5)3)2)2*2C4H8O

: 2314-97-8
iodotrifluoromethane

A: 21006-49-5, 15094-66-3, 87584-88-1
rhodium iodo carbonyl (triphenylphosphine)2 complex

B: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
In tetrahydrofuran a suspn. of Rh complex in THF and CF3I in 1:2 molar ratio sealed in vacuo in a Pyrex reaction tube was either stirred or shaken for 4 h at 20°C; volatiles were removed under vac., trapped at -196°C and analyzed by GLC, residue was chromd. using hexane followed by benzene or CHCl3 as eluent, and recrystd. from a mixt. of either CHCl3 and EtOH or benzene and MeOH;	A 44% B 79%
In tetrahydrofuran a suspn. of Rh complex in THF and CF3I in 1:1 molar ratio sealed in vacuo in a Pyrex reaction tube was either stirred or shaken for 50 h at 20°C; 43% of the starting solvate was recovered; volatiles were removed under vac., trapped at -196°C and analyzed by GLC, residue was chromd. using hexane followed by benzene or CHCl3 as eluent, and recrystd. from a mixt. of either CHCl3 and EtOH or benzene and MeOH;	A 26% B 46%

Yield

In tetrahydrofuran a suspn. of Rh complex in THF and CF3I in 1:2 molar ratio sealed in vacuo in a Pyrex reaction tube was either stirred or shaken for 4 h at 20°C; volatiles were removed under vac., trapped at -196°C and analyzed by GLC, residue was chromd. using hexane followed by benzene or CHCl3 as eluent, and recrystd. from a mixt. of either CHCl3 and EtOH or benzene and MeOH;

A 44%
B 79%

In tetrahydrofuran a suspn. of Rh complex in THF and CF3I in 1:1 molar ratio sealed in vacuo in a Pyrex reaction tube was either stirred or shaken for 50 h at 20°C; 43% of the starting solvate was recovered; volatiles were removed under vac., trapped at -196°C and analyzed by GLC, residue was chromd. using hexane followed by benzene or CHCl3 as eluent, and recrystd. from a mixt. of either CHCl3 and EtOH or benzene and MeOH;

A 26%
B 46%

...Expand

: 76-13-1
1,1,2-Trichloro-1,2,2-trifluoroethane

A: 76-16-4
Hexafluoroethane

B: 76-15-3
Chloropentafluoroethane

C: 76-14-2
1,2-dichloro-1,1,2,2-tetrafluoroethane

Conditions

Conditions	Yield
With chromium fluoride; magnesium fluoride; hydrogen fluoride at 250 - 500℃; Product distribution;	A 3% B 78% C 19%

...Expand

: 10036-47-2
tetrafluorohydrazine

: 354-67-6
pentafluoro(1,1,2,2,2-pentafluoroethyl)-λ6-sulfane

A: 75-73-0
carbon tetrafluoride

B: 76-16-4
Hexafluoroethane

C: 354-80-3
Perfluoroethylamine

D: 7783-60-0
sulfur tetrafluoride

E: 2551-62-4
sulphur hexafluoride

Conditions

Conditions	Yield
NF3 formed too;	A n/a B n/a C 70% D n/a E n/a
NF3 formed too;	A n/a B n/a C 70% D n/a E n/a

...Expand

: 1630-78-0
(E)-1,2-difluoroethene

: 684-16-2
Hexafluoroacetone

A: 76-16-4
Hexafluoroethane

B: 75995-72-1
1,1,1,2,3,4,4,4-octafluorobutane

: 74960-13-7, 74960-20-6
cis-2,2-bis(trifluoromethyl)-3,4-difluoro-oxetan

: 74960-13-7, 74960-20-6
trans-2,2-bis(trifluoromethyl)-3,4-difluoro-oxetan

Conditions

Conditions	Yield
for 144h; Irradiation;	A 7 mg B 0.3% C 26% D 69%

...Expand

: 1520-70-3
Ethanesulfonamide

A: 76-16-4
Hexafluoroethane

B: 754-03-0
ethanesulfonyl fluoride

C: 335-05-7
Trifluoromethanesulfonyl fluoride

D: 354-87-0
pentafluoroethanesulfonyl fluoride

Conditions

Conditions	Yield
With hydrogen fluoride current: 4.5 to 5.5 V; 0.3 to 0.6 Adm-2; Further byproducts given;	A 2.1% B 3.1% C n/a D 54.9%

...Expand

: 2314-97-8
iodotrifluoromethane

A: 76-16-4
Hexafluoroethane

B: 74228-31-2
(13)C-trifluoroiodomethane

Conditions

Conditions	Yield
With silver for 1h; Product distribution; Irradiation; further metal; addition of NO; investigation of isotopic selectivity;	A n/a B 54%

: 76293-22-6
cis-2,3-difluoro-5,6-bis(trifluoromethyl)-2,3-dihydro-p-dioxin

A: 76-16-4
Hexafluoroethane

B: 1630-77-9
(Z)-1,2-difluoro-ethene

C: 1630-78-0
(E)-1,2-difluoroethene

D: 685-24-5
1,1,1,4,4,4-hexafluoro-2,3-butanedione

Conditions

Conditions	Yield
at 610℃; Product distribution; various reaction conditions;	A 31% B 46% C 34% D 18%

...Expand

: 13821-49-3
perfluoro(N,N-dimethyl trifluorovinylamine)

A: 75-46-7
trifluoromethan

B: 75-38-7
Vinylidene fluoride

C: 76-16-4
Hexafluoroethane

D: 460-49-1
trifluoromethyl isocyanate

E: 559-93-3
perfluoro(2-aza-1-hexene)

Conditions

Conditions	Yield
With toluene pyrolysis 610°C, contact time 0.66 sec, further product;	A n/a B n/a C n/a D n/a E 46%
With toluene pyrolysis 610°C, contact time 0.66 sec, further product;	A n/a B n/a C n/a D n/a E 46%

...Expand

: 359-64-8
iodo-bis-trifluoromethyl-phosphine

A: 2314-97-8
iodotrifluoromethane

B: 76-16-4
Hexafluoroethane

C: 421-59-0
trifluoromethyldiiodophosphine

D: 432-04-2
tris(trifluoromethyl)phosphine

E: 13455-01-1
phosphorous triiodide

Conditions

Conditions	Yield
205°C (48 h);	A 2% B 8% C 2% D 45% E n/a

...Expand

: 24243-71-8
propane-1-sulfonamide

A: 76-19-7
freon-218

B: 76-16-4
Hexafluoroethane

C: 754-03-0
ethanesulfonyl fluoride

D: 423-40-5
1-perfluoropropanesulfonyl fluoride

Conditions

Conditions	Yield
With hydrogen fluoride current: 4.5 to 5.5 V; 0.3 to 0.6 Adm-2; Further byproducts given;	A 2.8% B 3.1% C 4.3% D 40%

...Expand

: 1630-77-9
(Z)-1,2-difluoro-ethene

: 684-16-2
Hexafluoroacetone

A: 76-16-4
Hexafluoroethane

B: 75995-72-1
1,1,1,2,3,4,4,4-octafluorobutane

: 74960-13-7, 74960-20-6
cis-2,2-bis(trifluoromethyl)-3,4-difluoro-oxetan

: 74960-13-7, 74960-20-6
trans-2,2-bis(trifluoromethyl)-3,4-difluoro-oxetan

Conditions

Conditions	Yield
for 144h; Irradiation;	A 8 mg B 6% C 38% D 37%

...Expand

: 116-14-3
polytetrafluoroethylene

: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
With nickel(II) fluoride; fluorine at 100℃;	35%
With antimony pentafluoride at 25 - 98℃; under 50 - 760 Torr;

: 432-02-0
tris(trifluoromethyl)arsine

: 74-88-4
methyl iodide

A: 2314-97-8
iodotrifluoromethane

B: 76-16-4
Hexafluoroethane

C: 431-76-5
methylbistrifluoromethylarsine

Conditions

Conditions	Yield
Irradiation (UV/VIS); with UV-light;	A 18% B 15% C n/a

...Expand

: 75-46-7
trifluoromethan

A: 116-14-3
polytetrafluoroethylene

B: 75-73-0
carbon tetrafluoride

C: 76-19-7
freon-218

D: 116-15-4
perfluoropropylene

E: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
With activated carbon supported potassium at 799.84℃; under 750.075 Torr; Pyrolysis; Inert atmosphere;	A 16.1% B n/a C n/a D 14.4% E n/a

...Expand

: 432-02-0
tris(trifluoromethyl)arsine

A: 75-46-7
trifluoromethan

B: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
Irradiation (UV/VIS); photochemical hydrogenation at 50°C, 16 h;	A n/a B 14%
Irradiation (UV/VIS); photochemical hydrogenation at 20°C, 19 h;

: 811-97-2
1,1,1,2-tetrafluoroethane

A: 354-33-6
1,1,1,2,2-pentafluoroethane

B: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
With cobalt (III) fluoride at 220℃; for 0.000277778h; Product distribution; var. fluorinating agents and temp.;	A 12.4% B 2%
Product distribution;

: 75-73-0
carbon tetrafluoride

A: 76-19-7
freon-218

B: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
im Kohlelichtbogen;
In neat (no solvent) other Radiation; decomposition of CF4 by (60)Co-γ-rays, formation of C2F6 and C3F8;; determination by ESR;;

: 75-73-0
carbon tetrafluoride

A: 116-14-3
polytetrafluoroethylene

B: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
im Kohlelichtbogen;
Zersetzung im elektrischen Lichtbogen;
In neat (no solvent) Electric Arc; formation of C2F4 and C2F6 in electric arc between coal electrodes;;

: 75-73-0
carbon tetrafluoride

: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
bei wiederholtem Leiten durch einen Kohlelichtbogen unter vermindertem Druck;

: 2264-21-3
trifluoromethyl radical

: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
at 127℃;
at 626.9 - 826.9℃; Kinetics;
In neat (no solvent) Kinetics; reaction is carried out by photolysis of CF3COCF3 in Ar at various conditions;;

: 359-64-8
iodo-bis-trifluoromethyl-phosphine

A: 2314-97-8
iodotrifluoromethane

B: 76-16-4
Hexafluoroethane

C: 421-59-0
trifluoromethyldiiodophosphine

D: 432-04-2
tris(trifluoromethyl)phosphine

Conditions

Conditions	Yield
at 205℃;

...Expand

: 690-27-7
2H-pentafluoropropene

: 2314-97-8
iodotrifluoromethane

A: 382-25-2
1,1,1,3,3-pentafluoro-3-iodo-2-trifluoromethyl-propane

B: 75-46-7
trifluoromethan

C: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
UV-Licht.Irradiation;

...Expand

: 359-46-6
tetrafluoroacetic acid

A: 75-73-0
carbon tetrafluoride

B: 353-50-4
Carbonyl fluoride

C: 76-16-4
Hexafluoroethane

D: 15719-64-9, 15719-76-3, 97762-63-5
methylammonium carbonate

Conditions

Conditions	Yield
at 30 - 80℃; under 1 - 3 Torr; Kinetics; Thermolyse;

...Expand

: 426-47-1
pentafluoro-propionyl hypofluorite

A: 76-16-4
Hexafluoroethane

B: 15719-64-9, 15719-76-3, 97762-63-5
methylammonium carbonate

Conditions

Conditions	Yield
at -40 - 25℃; Zersetzung unter vermindertem Druck;

: 74-84-0
ethane

: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
With copper; fluorine
With fluorine at 64℃;
With chlorine trifluoride und Leiten des Reaktionsgemisches ueber Aluminiumfluorid bei 360grad;

: 507-25-5
carbon tetraiodide

: 76-16-4
Hexafluoroethane

Conditions

Conditions	Yield
With iodine pentafluoride anfangs in Kaeltemischung, zuletzt bei 80-90grad;

: 116-14-3
polytetrafluoroethylene

A: 116-15-4
perfluoropropylene

B: 76-16-4
Hexafluoroethane

C: 382-21-8
perfluoroisobutylene

D: 115-25-3
Octafluorocyclobutane

Conditions

Conditions	Yield
at 600℃; Dimerisierung.Pyrolysis;
at 650℃; Dimerisierung.Pyrolysis;

...Expand

: 76-16-4
Hexafluoroethane

: 116-14-3
polytetrafluoroethylene

Conditions

Conditions	Yield
With hydrogen at 336.84 - 736.84℃; Product distribution / selectivity; Gas phase; Inert atmosphere;	100%

: 76-16-4
Hexafluoroethane

: tin(IV) iodide

: 41268-44-4
tetrakis-(trifluoro methyl) stannane

Conditions

Conditions	Yield
Sonication; electric discharge, low pressure;	90%
Sonication; electric discharge, low pressure;	90%

: 76-16-4
Hexafluoroethane

: 10031-27-3
tellurium(IV) tetrabromide

A: 1718-20-3
bis(trifluoromethyl) ditelluride

B: 55642-42-7
bis(trifluoromethyl)tellurium

Conditions

Conditions	Yield
other Radiation; at 20°C (46 h); distn.;	A 20% B 33%
other Radiation; at 20°C (46 h); distn.;	A 20% B 33%
other Radiation; at 20°C (46 h); distn.;	A 20% B 33%
other Radiation; at 20°C (46 h); distn.;	A 20% B 33%

...Expand

: 76-16-4
Hexafluoroethane

: 7787-64-6
bismuth(III) iodide

: 5863-80-9
tris(trifluoromethyl)bismuth

Conditions

Conditions	Yield
other Radiation; converting BiI3 by radio frequency at 1 Torr into plasma then C2F3 adding continuously, reacting time 100 h; collecting of -78°C and -196°C traps, distn. at -55°C;	32%

: thallium

: 76-16-4
Hexafluoroethane

: 95244-28-3
C3F9Tl

Conditions

Conditions	Yield
In solid matrix other Radiation; in special constructed rotating cold finger reactor; with W basket filled with Tl reactor evacuated, cold finger is cooled by liquid N2 and CF3CF3 added at rate 1-2 mmol/min, radio frequency power is set approx. 50 W and metal slowly evapd. during 3 h; condensed CH2Cl2, matrix dropped into bottom by warming with air, CF3CF3 distd. in vac. at -131 °C, pressurized with 500 mm of N2 and warmed to room temp. with stirring, soln. of Tl(CF3)3 siphonded into flask;	25%

Yield

In solid matrix other Radiation; in special constructed rotating cold finger reactor; with W basket filled with Tl reactor evacuated, cold finger is cooled by liquid N2 and CF3CF3 added at rate 1-2 mmol/min, radio frequency power is set approx. 50 W and metal slowly evapd. during 3 h; condensed CH2Cl2, matrix dropped into bottom by warming with air, CF3CF3 distd. in vac. at -131 °C, pressurized with 500 mm of N2 and warmed to room temp. with stirring, soln. of Tl(CF3)3 siphonded into flask;

25%

: 76-16-4
Hexafluoroethane

: 2314-97-8
iodotrifluoromethane

Conditions

Conditions	Yield
With dihydrogen peroxide; iodine monofluoride; bis(acetylacetonate)oxovanadium In water Product distribution / selectivity; Heating / reflux;	15%
With iodine monofluoride; palladium on activated carbon; copper on carbon; platinum on activated charcoal at 250 - 550℃; Product distribution / selectivity; Vapor phase;

: 110-71-4
1,2-dimethoxyethane

: 76-16-4
Hexafluoroethane

: 7440-43-9
cadmium

: 76256-47-8
bis(trifluoromethyl)cadmium * dimethoxyethane

Conditions

Conditions	Yield
In diethyl ether Cd was vaporized and condensed with CF3 radicals on a liquid N2 cooled surface, after 3 h reactor was warmed to -78°C to pump off the excess C2F6, ether and glyme were condensed into reactor; evapn. of volatiles, extn. of residue with Et2O (inert atmosphere); IR,NMR;	11%

...Expand

: 7440-74-6
indium

: 76-16-4
Hexafluoroethane

: 594-09-2
trimethylphosphane

: 112761-03-2
tris(trifluoromethyl)indium(trimethylphosphine)

Conditions

Conditions	Yield
In neat (no solvent) other Radiation; In was vaporized from a tungsten basket and condensed with CF3 radicals, generated from C2F6 by radio frequency glow discharge, at -196°C for 3 h; removal of C2F6 in vac. at -78°C; ether and P(CH3)3 were added by condensation; room temp.;; the volatiles were pumped off; extraction with ether; recrystn. from hexane; performed in an argon dry box;;	9%

...Expand

: 76-16-4
Hexafluoroethane

: 7440-66-6
zinc

: bis(pyridine)bis(trifluoromethyl)zinc

Conditions

Conditions	Yield
With pyridine In diethyl ether Zn was vaporized and condensed with CF3 radicals on a liquid N2 cooled surface, after 3 h reactor was warmed to -78°C to pump off the excess C2F6, ether and pyridine were condensed into reactor; warmed to room temp., extd. with CH2Cl2 and recrystd. from hexane; NMR;	8%

: 76-16-4
Hexafluoroethane

: 593-91-9
trimethylbismuthine

A: 677-31-6
Dimethyl-trifluormethyl-wismut

B: 684-13-9
Methyl-bis-trifluormethyl-wismut

Conditions

Conditions	Yield
In gas other Radiation; radio frequency radiation of mixt. of educts in a special pyrex reactor,ratio of educts: C2F6/alkyl metal = 25/1, 2h, condensation of product on a liquid N2 filled cold finger, excess C2F6 removed by vac. distn. at -100°C; sepn. by gas chromy. (10% SE-30 on Chromosorb P);	A 5.1% B 0.9%

...Expand

: 76-16-4
Hexafluoroethane

: 593-74-8
dimethylmercury

A: 371-76-6
bis(trifluoromethyl)mercury

B: 33327-63-8
methyl(trifluoromethyl)mercury

Conditions

Conditions	Yield
In gas other Radiation; radio frequency radiation of mixt. of educts in a special pyrex reactor,ratio of educts: C2F6/alkyl metal = 25/1, 2h, condensation of product on a liquid N2 filled cold finger, excess C2F6 removed by vac. distn. at -100°C; sepn. by gas chromy. (10% SE-30 on Chromosorb P);	A 4.9% B 3.4%

...Expand

Hexafluoroethane Consensus Reports

Reported in EPA TSCA Inventory.

Hexafluoroethane Specification

The Hexafluoroethane ,its cas register number is 76-16-4.It also can be called as Perfluoroethane and the IUPAC name about this chemicals is 1,1,1,2,2,2-Hexafluoroethane .It belongs to the refrigerants and organics.Following are the chemical properties about this chemicals: (1)Index of Refraction: 1.202 ; (2)Molar Refractivity: 12.22 cm³ ; (3)Molar Volume: 94.3 cm³ ; (4)Surface Tension: 8 dyne/cm ; (5)Enthalpy of Vaporization: 16.15 kJ/mol ; (6)Vapour Pressure: 23700 mmHg at 25°C .It is chemically inert in many situations, but can react violently with strong reducing agents such as the very active metals and the active metals. Can react with strong oxidizing agents or weaker oxidizing agents under extremes of temperature.

The Hexafluoroethane is used as a versatile etchant in semiconductor manufacturing. It can be used for selective etching of metal silicides and oxides versus their metal substrates and also for etching of silicon dioxide over silicon. In the using process, you need to wear suitable respiratory equipment in case of insufficient ventilation. Except these safty informations, there are also exist other data like WGK Germany is 3,RTECS is KI4110000,Hazard Note is Irritant and TSCA is T ,also HazardClass about it is 2.2.

The Hexafluoroethane is a colorless, odorless gas and is relatively inert. The mixture is nonflammable and nontoxic, though asphyxiation may occur because of displacement of oxygen. Under prolonged exposure to fire or intense heat the containers may rupture violently and rocket. This chemicals is chemically inert in many situations, but can react violently with strong reducing agents such as the very active metals and the active metals. It also can react with strong oxidizing agents or weaker oxidizing agents under extremes of temperature.

This chemicals can be described computed from structure:
(1)Canonical SMILES: C(C(F)(F)F)(F)(F)F
(2)InChI: InChI=1S/C2F6/c3-1(4,5)2(6,7)8
(3)InChIKey: WMIYKQLTONQJES-UHFFFAOYSA-

The most important thing about Hexafluoroethane is the toxicity, following is the form:

Organism	Test Type	Route	Reported Dose (Normalized Dose)	Effect	Source
rat	LC	inhalation	> 20pph/2H (200000ppm)		Journal of Occupational Medicine. Vol. 4, Pg. 262, 1962.

Product Name

Hexafluoroethane

Synthetic route

Hexafluoroethane Consensus Reports

Hexafluoroethane Specification

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