DICHLOROSILANE supplier | CasNO.4109-96-0

Name
Dichlorosilane
EINECS 223-888-3
CAS No. 4109-96-0
Article Data52
CAS DataBase
Density 1,22 g/cm3
Solubility decomposes
Melting Point -122 °C(lit.)
Formula Cl₂H₂Si
Boiling Point 8.3 °C at 760 mmHg
Molecular Weight 101.007
Flash Point -37°C
Transport Information UN 2189
Appearance colourless gas
Safety 26-36/37/39-45
Risk Codes 12-14-23-34
Molecular Structure
Hazard Symbols F+,T
Synonyms Siliconchloridehydride;
PSA 0.00000
LogP 0.46280

Synthetic route

: 7647-01-0
hydrogenchloride

: 7440-21-3
monosilane

: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) reaction at 100 °C for a longer period of time;;	79%
In neat (no solvent) reaction at 100 °C for a longer period of time;;	79%

: 931-70-4
(4-methylphenyl)silane

A: 13272-80-5
HSiCl2-p-CH3C6H4

B: 4109-96-0
Dichlorosilane

C: monochloro(p-tolyl)silane

Conditions

Conditions	Yield
With hydrogenchloride In diethyl ether at 60℃; for 19h; Temperature;	A 5% B 17% C 76%
With hydrogenchloride; diethyl ether In benzene-d6 at 80℃; Reagent/catalyst; Schlenk technique; Inert atmosphere;	A 16 %Spectr. B 36 %Spectr. C 40 %Spectr.

...Expand

: 7647-01-0
hydrogenchloride

: 7440-21-3
monosilane

A: 13966-57-9
chlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In diethyl ether at 60℃; for 20h;	A 73% B 27%
In diethyl ether at 80℃; for 42h;	A 34% B 66%

...Expand

: 120578-34-9
(2,4,6-trimethylphenyl)silane

A: 13966-57-9
chlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With hydrogenchloride In diethyl ether at 80℃; for 15h; Solvent; Temperature;	A 64% B 36%
With hydrogenchloride; diethyl ether In benzene-d6 at 80℃; for 15h; Reagent/catalyst; Schlenk technique; Inert atmosphere;	A 64 %Spectr. B 36 %Spectr.

: 18191-59-8
allylsilane

A: 13966-57-9
chlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With hydrogenchloride In diethyl ether at 60℃; for 20h;	A 42% B 13%
With hydrogenchloride In diethyl ether at 80℃; for 42h;	A 20% B 33%
With hydrogenchloride; diethyl ether In benzene-d6 at 60℃; for 20h; Reagent/catalyst; Schlenk technique; Inert atmosphere;	A 42 %Spectr. B 13 %Spectr.
With hydrogenchloride; diethyl ether In benzene-d6 at 80℃; Reagent/catalyst; Schlenk technique; Inert atmosphere;	A 20 %Spectr. B 33 %Spectr.

: 10025-78-2
trichlorosilane

: 1333-74-0
hydrogen

A: 13966-57-9
chlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With aluminium In neat (no solvent) passing a mixture of SiHCl3 and H2 (1:2) over Al at 350 °C;; separation by fractionated distillation;;	A 1-2 B 15%
With Al In neat (no solvent) passing a mixture of SiHCl3 and H2 (1:2) over Al at 350 °C;; separation by fractionated distillation;;	A 1-2 B 15%

...Expand

: 10025-78-2
trichlorosilane

A: 13966-57-9
chlorosilane

B: 4109-96-0
Dichlorosilane

: 80-10-4
diphenylsilyl dichloride

A: 4109-96-0
Dichlorosilane

B: 98-13-5
Phenyltrichlorosilane

Conditions

Conditions	Yield
With hydrogenchloride; trichlorosilane; aluminium chloride
With trichlorosilane; aluminium chloride
With trichlorosilane; aluminium chloride

: 82146-27-8
dibromochlorosilane

: 1631-73-8
trimethylstannane

A: 13768-94-0
dibromosilane

B: 13966-57-9
chlorosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) condensing of equimolar amts. of tinhydride and SiClHBr2 (trace of SiCl2HBr present) into cold finger, reaction at room temp. (30 min); further products; not isolated; IR spectroscopy;	A 0% B n/a C 0%

...Expand

: 10025-78-2
trichlorosilane

: 1631-73-8
trimethylstannane

A: 1066-45-1
trimethyltin(IV)chloride

B: 7440-21-3
monosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 12 h; not isolated; IR spectroscopy (identified 41% SiCl2H2 and 15% SiH4 in product mixt.);

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1631-73-8
trimethylstannane

A: 10025-78-2
trichlorosilane

B: 1066-45-1
trimethyltin(IV)chloride

C: 7440-21-3
monosilane

D: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 36 h; not isolated; IR spectroscopy (identified 25-30% SiCl3H, 15% SiCl2H2 and 10% SiH4 in product mixt.);

...Expand

: 7789-78-8
calcium hydride

: 10026-04-7, 53609-55-5
tetrachlorosilane

A: 10025-78-2
trichlorosilane

B: 13966-57-9
chlorosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) byproducts: H2, HCl; passing SiCl4 vapor over CaH2 below red heat;;	A n/a B 0% C 0%
In neat (no solvent) byproducts: H2, HCl; passing SiCl4 vapor over CaH2 below red heat;;	A n/a B 0% C 0%

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 7440-21-3
monosilane

A: 10025-78-2
trichlorosilane

B: 13966-57-9
chlorosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In gas reactor temp.: 250 - 500°C; detn. by gas chromy.;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

A: 7446-70-0
aluminium trichloride

B: 10025-78-2
trichlorosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With aluminium In neat (no solvent) byproducts: SiCl4; reaction by passing SiCl4 vapor with H2 (1:1) over Al at 400 °C;; distn.;;
With Al In neat (no solvent) byproducts: SiCl4; reaction by passing SiCl4 vapor with H2 (1:1) over Al at 400 °C;; distn.;;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

A: 10025-78-2
trichlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With co-catalyst: pyrimidine or P(OPh)3; tri-n-butyl-tin hydride In toluene absence of air; H2-stream; further alternate co-catalysts: PCy3 or PBu3 or N-methylimidazole or pyridine or chinoline; gas chromy.;
tri-n-butyl-tin hydride In acetonitrile absence of air; H2-stream; gas chromy.;
With Al or Mg or Zn In neat (no solvent, gas phase) passing SiCl4 vapor and H2 over granulated Al, Mg or Zn at 350-450 °C;; condensation of the gaseous reaction product by dry ice, separation of the mixture by fractionation;;
With Al or Mg or Zn In gas passing SiCl4 vapor and H2 over granulated Al, Mg or Zn at 350-450 °C;; condensation of the gaseous reaction product by dry ice, separation of the mixture by fractionation;;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

A: 10025-78-2
trichlorosilane

B: 7440-21-3
monosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With co-catalyst: P(O(i)Pr)3 or PMe2Ph or PPh3; tri-n-butyl-tin hydride In toluene absence of air; H2-stream; further alternate co-catalysts: PCy3 or PBu3 or N-methylimidazole or pyridine or chinoline; gas chromy.;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

A: 10025-78-2
trichlorosilane

B: 13966-57-9
chlorosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With co-catalyst: P(OMe)3; tri-n-butyl-tin hydride In toluene absence of air; H2-stream; further alternate co-catalysts: PCy3 or PBu3 or N-methylimidazole or pyridine or chinoline; gas chromy.;

...Expand

: 7646-78-8
tin(IV) chloride

: 7440-21-3
monosilane

A: 13966-57-9
chlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In not given chlorination with SnCl4 leads to SiH3Cl at room temp.; no SnH2Cl2 formed;;	A n/a B 0%

...Expand

: 7647-01-0
hydrogenchloride

: 7440-21-3
monosilane

A: disilane

B: 10025-78-2
trichlorosilane

C: 13966-57-9
chlorosilane

D: 1333-74-0
hydrogen

E: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In gas Kinetics; Irradiation (UV/VIS); infrared laser irrdn. of SiH4-HCl mixt. in pressure range of 28-60 torrand in temp. range of 295-414 K; analyzed by mass spectrometry;

...Expand

: 75-54-7
Dichloromethylsilane

A: 10025-78-2
trichlorosilane

B: 13966-57-9
chlorosilane

C: 7440-21-3
monosilane

D: 4109-96-0
Dichlorosilane

E: 75-78-5
dimethylsilicon dichloride

Conditions

Conditions	Yield
With AlCl3 In neat (no solvent) (CH3)SiHCl2 and AlCl3 at 325°C under pressure; further products;;
With AlCl3 In neat (no solvent) (CH3)SiHCl2 and AlCl3 at 325°C under pressure; further products;;

...Expand

: 7647-01-0
hydrogenchloride

: 7440-21-3
silicon

A: 13966-57-9
chlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) reaction at rather low temperature;;
In neat (no solvent) heating of amorphous Si with HCl;;
In neat (no solvent) reaction at rather low temperature;;
In neat (no solvent) heating of amorphous Si with HCl;;

...Expand

: 115-10-6
Dimethyl ether

: 7440-21-3
silicon

A: 75-79-6
Methyltrichlorosilane

B: 10026-04-7, 53609-55-5
tetrachlorosilane

C: 10025-78-2
trichlorosilane

D: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With hydrogenchloride; copper In neat (no solvent) Si-Cu (9:1) and a mixt. of CH3OCH3 and HCl (2:1) at 325°C;;

...Expand

: 7789-78-8
calcium hydride

: 10026-04-7, 53609-55-5
tetrachlorosilane

A: 13966-57-9
chlorosilane

B: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent) passing SiCl4 vapor over heated CaH2;;	A 0% B 0%
In neat (no solvent) passing SiCl4 vapor over heated CaH2;;	A 0% B 0%

...Expand

: 10025-78-2
trichlorosilane

: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With catalyst: anion exchange resin In gas Kinetics; byproducts: SiCl4; mixt. of Ar and SiHCl3 is passed over the catalyst (anion exchange resins AV17-12P with active group -N(+)Me3, AV27-10P with active group -N(+)Me2C2H5O, AN18-12P with active group -N(+)HMe2) at 388 K; react. is monitored by chromy.;

: 10025-78-2
trichlorosilane

A: 13966-57-9
chlorosilane

B: 7440-21-3
monosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With hydrogen; aluminium In neat (no solvent) byproducts: AlCl3; passing a mixture of SiHCl3 and H2 (1:2) over Al at 350 °C;;

...Expand

: 10025-78-2
trichlorosilane

: 1333-74-0
hydrogen

A: 13966-57-9
chlorosilane

B: 7440-21-3
monosilane

C: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In neat (no solvent, gas phase)
In gas

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: magnesium hydride

A: 10025-78-2
trichlorosilane

B: 13966-57-9
chlorosilane

C: 7440-21-3
monosilane

D: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In tetrahydrofuran-d8 MgH2 and clorosilane (1.10:0.66 molar ratio) sealed under Ar; stored for 3 d at room temp., NMR;

...Expand

: 10026-04-7, 53609-55-5
tetrachlorosilane

: 1333-74-0
hydrogen

: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
With aluminium In neat (no solvent) passing a mixture of SiCl4 and H2 over Al at 400 °C;;	3-5
With Al In neat (no solvent) passing a mixture of SiCl4 and H2 over Al at 400 °C;;	3-5

: 7782-50-5
chlorine

: 7440-21-3
silacarbene

: 4109-96-0
Dichlorosilane

Conditions

Conditions	Yield
In gas Kinetics; helium buffer gas (total pressure 5 Torr), ambient temp.; high-resolution transient absorption spectroscopy (SiH2);

: 4109-96-0
Dichlorosilane

: 7440-21-3
silicon

Conditions

Conditions	Yield
Prepd. by laser chemical vapor pptn. at atmospheric pressure.;	100%
In neat (no solvent) chemical vapor deposition with a mixt. of SiH2Cl2 and H2;
With hydrogen chemical vapor deposition (hot-wall reactor, basic pressure 10 or 76 Torr, 1223 K);

: 7664-41-7
ammonia

: 4109-96-0
Dichlorosilane

: silicon nitride

Conditions

Conditions	Yield
Prepd. by laser chemical vapor pptn. at atmospheric pressure.;	100%
In neat (no solvent) Kinetics; under Ar, in a low-pressure flow reactor at various condns.;
low pressure chemical vapor deposition at 820 °C;

: chloroplatinic acid

: 4109-96-0
Dichlorosilane

: 3710-30-3
1,7-Octadiene

A: bis(octenyl)dichlorosilane

B: bis(8-trimethylsilyloctyl)dimethylsilane

Conditions

Conditions	Yield
In isopropyl alcohol	A 90% B n/a

...Expand

: 4109-96-0
Dichlorosilane

: tris(trimethylsilyl)silyl potassium

: 134648-78-5
C9H29ClSi5

Conditions

Conditions	Yield
In toluene at -78℃; for 23h; Inert atmosphere;	90%

: 927-77-5
n-propylmagnesium bromide

: 4109-96-0
Dichlorosilane

: 871-77-2
dipropylsilane

Conditions

Conditions	Yield
In diethyl ether H2SiCl2 and n-C3H7MgBr in ether; acidic hydrolysis;;	88%
In diethyl ether H2SiCl2 and n-C3H7MgBr in ether; acidic hydrolysis;;	88%

: 90413-24-4
Cp(PMe3)2RuH

: 4109-96-0
Dichlorosilane

A: 222175-87-3
RuCp(PMe3)SiH2Cl

B: 160158-78-1
[Cp(PMe3)2RuH2]Cl

Conditions

Conditions	Yield
In diethyl ether Ar-atmosphere; -78°C; filtering, evapn.; elem. anal.;	A 81% B n/a

...Expand

: 7783-56-4
antimony(III) fluoride

: 4109-96-0
Dichlorosilane

A: 13824-36-7
difluorosilane

B: 13465-71-9
trifluorosilane

C: 7783-61-1
silicon tetrafluoride

Conditions

Conditions	Yield
In neat (no solvent) byproducts: H2; reaction in presence of SbCl5 at room temperature;;	A 80% B n/a C 10%

...Expand

: 7783-56-4
antimony(III) fluoride

: 4109-96-0
Dichlorosilane

A: 13824-36-7
difluorosilane

B: 1333-74-0
hydrogen

C: 13465-71-9
trifluorosilane

D: 7783-61-1
silicon tetrafluoride

Conditions

Conditions	Yield
In neat (no solvent) fluorination of SiH2Cl2 with SbF3 at room temp. for a longer period of time;;	A 80% B n/a C n/a D n/a

...Expand

: 4109-96-0
Dichlorosilane

: 931-50-0
cyclohexylmagnesium bromide

: 15493-30-8
dicyclohexylsilane

Conditions

Conditions	Yield
In not given	79%
In not given	79%

: 4109-96-0
Dichlorosilane

: 775-12-2
diphenylsilane

Conditions

Conditions	Yield
With C6H5MgBr In not given	77%
With C6H5MgBr In not given	77%

: 4109-96-0
Dichlorosilane

: lithium iodide

: 13760-02-6
diiodosilane

Conditions

Conditions	Yield
In pentane at -70 - 35℃; for 16h; Temperature; Solvent; Inert atmosphere; Large scale;	77%
at 40℃; under 1277.21 - 2311.54 Torr; for 0.08h; Temperature;	45.3 g

: 4109-96-0
Dichlorosilane

: 80-70-6
N,N,N',N'-tetramethylguanidine

: C12H30N6Si

Conditions

Conditions	Yield
In hexane at -78 - 20℃; Inert atmosphere;	76%

: 592-41-6
1-hexene

: 4109-96-0
Dichlorosilane

: 871-64-7
1,1-dichloro-1-silaheptane

Conditions

Conditions	Yield
chloroplatinic acid	72%

: 4109-96-0
Dichlorosilane

: silicon nitride

Conditions

Conditions	Yield
With ammonia In dichloromethane byproducts: NH4Cl, H2; the silazane product formed in react. of SiH2Cl2 and gaseous NH3 in solvent, the product heated to 200°C for 1h under Ar then pyrolized at 1150°C for 12 under N2, Si formed only in traces;	70%

: 7664-41-7
ammonia

: 4109-96-0
Dichlorosilane

: silicon nitride

Conditions

Conditions	Yield
In diethyl ether byproducts: NH4Cl, H2; the silazane product formed in react. of SiH2Cl2 and gaseous NH3 in solvent, the product heated to 200°C for 1h under Ar then pyrolized at 1150°C for 12 under N2, Si formed only in traces;	70%

: Na2[nido-dodecahydrodecaborate(2-)]

: 4109-96-0
Dichlorosilane

: Na(7-H-7-SiB10H12)

Conditions

Conditions	Yield
In diethyl ether byproducts: NaCl, B10H14; condensation of Et2O into borane at -196°C, then condensation of excess of Si-compd. at -196°C, stirring and warming to room temp.overnight; solvent removal (vac.), washing (i-Pr2O), extn. into THF, filtration, evapn. (vac.);	70%

: 4109-96-0
Dichlorosilane

: 504-03-0
2.6-dimethylpiperidine

: 1427523-48-5
2,6-dimethylpiperidinochlorosilane

Conditions

Conditions	Yield
With triethylamine In hexane at -20℃;	66%

: 28227-42-1, 30834-74-3
1,4-di-tert-butyl-1,4-diazabutadiene

: 4109-96-0
Dichlorosilane

: 1,3-Di-tert-butyl-2,3-dihydro-1H-[1,3,2]diazasilole

Conditions

Conditions	Yield
Stage #1: 1,4-di-tert-butyl-1,4-diazabutadiene With lithium In tetrahydrofuran at 0 - 20℃; for 4h; Stage #2: Dichlorosilane In tetrahydrofuran; toluene at -20 - 20℃; for 6h;	65%

: 112-41-4
1-dodecene

: 4109-96-0
Dichlorosilane

: 18768-06-4
di-n-dodecyldichlorosilane

Conditions

Conditions	Yield
Stage #1: 1-dodecene; Dichlorosilane at -78 - 0℃; Inert atmosphere; Stage #2: dihydrogen hexachloroplatinate(IV) hexahydrate In isopropyl alcohol at 0 - 20℃; Inert atmosphere;	62.5%

: 920-39-8
isopropylmagnesium bromide

: 4109-96-0
Dichlorosilane

: 18209-66-0
di-isopropylsilane

Conditions

Conditions	Yield
In diethyl ether H2SiCl2 and i-C3H7MgBr in ether; acidic hydrolysis;;	60%
In diethyl ether H2SiCl2 and i-C3H7MgBr in ether; acidic hydrolysis;;	60%

: Na(1+)*{((CH3)3Si)(CH3)C2B4H5}(1-)=Na{((CH3)3Si)(CH3)C2B4H5}

: 4109-96-0
Dichlorosilane

A: 109065-43-2
{((CH3)3Si)(CH3)C2B4H4}Si

B: 109122-66-9
{((CH3)3Si)(CH3)C2H4B4}SiHCl

Conditions

Conditions	Yield
With n-butyllithium In tetrahydrofuran addn. of a THF-soln. of 10.08mmol carborane to a soln. of 10.50mmol n-BuLi in THF in vac., react. with SiCl2H2 at -23°C for 2h, removal of THF in vac. at 0°C;; distn. at 0°C; elem. anal.; detn. by MS, IR, (1)H-, (11)B-, (13)C-, (29)Si-NMR;;	A n/a B 58%

...Expand

: 4109-96-0
Dichlorosilane

: 743369-26-8
zinc(II) carbonate

: 295-01-2
1,1,3,3,5,5,7,7,9,9,11,11-dodecahydro-cyclohexasiloxane

Conditions

Conditions	Yield
In hexane Cooling;	57.6%

: 135814-32-3, 158513-30-5
fac-(CO)3(2,2'-bipyridine)W(NCEt)

: 4109-96-0
Dichlorosilane

: 135848-51-0
fac-(CO)3(2,2'-bipyridine)W(H)(Cl)

Conditions

Conditions	Yield
In dichloromethane N2; 1 equivalent; 10 min;; concd.; filtered; washed with cold CH2Cl2; recrystd. from acetone; elem. anal.;;	54%

: 4109-96-0
Dichlorosilane

: Cl2H32O15Si16

Conditions

Conditions	Yield
In water at -40 - 20℃; for 1.5h; Inert atmosphere;	51%

: 612-12-4
o-Xylylene dichloride

: 4109-96-0
Dichlorosilane

: 36147-65-6
1-chloromethyl-2-(trichlorosilylmethyl)benzene

Conditions

Conditions	Yield
triphenylphosphine In benzene	50%

: 18162-82-8
(chloromethyl)triisopropoxysilane

: 4109-96-0
Dichlorosilane

: 1469432-28-7
1,1,1,5,5,5-hexaisopropoxy-1,3,5-trisilapentane

Conditions

Conditions	Yield
Stage #1: (chloromethyl)triisopropoxysilane With magnesium; ethylene dibromide In tetrahydrofuran at 25 - 35℃; for 8.5h; Stage #2: Dichlorosilane In tetrahydrofuran; n-heptane at 40 - 50℃; for 7h;	50%

DICHLOROSILANE Chemical Properties

Product Name: Dichlorosilane (CAS NO.4109-96-0)

Molecular Formula: C_l2H₂Si
Molecular Weight: 101.01g/mol
Mol File: 4109-96-0.mol
Einecs: 223-888-3
Melting Point: -122 °C(lit.)
Boiling point: 8.3 °C at 760 mmHg
Flash Point: -37°C
Density: 1,22 g/cm³
Water Solubility: Decomposes
Stability: Stable. Extremely flammable; note very wide explosion limits. Reacts violently with water, alcohols, strong oxidizing agents, bases.
Enthalpy of Vaporization: 25 kJ/mol
Vapour Pressure: 1360 mmHg at 25°C
Product Categories: Chemical Synthesis; Compressed and Liquefied GasesMicro/Nanoelectronics; Electronic Chemicals; Gases; Synthetic Reagents

DICHLOROSILANE Uses

Dichlorosilane (CAS NO.4109-96-0) is used in semiconductor manufacturing, especially the epitaxy process as the silicon source.It is also used in the electronics industry in the poly-silicon epitaxial growth, as well as chemical vapor deposition silicon dioxide and silicon nitride.

DICHLOROSILANE Toxicity Data With Reference

TOXIC; may be fatal if inhaled or absorbed through skin. Contact with gas or liquefied gas may cause burns, severe injury and/or frostbite. Fire will produce irritating, corrosive and/or toxic gases. Runoff from fire control may cause pollution.

Organism	Test Type	Route	Reported Dose (Normalized Dose)	Effect	Source
mouse	LC50	inhalation	144ppm/4H (144ppm)		Archives of Toxicology. Vol. 70, Pg. 218, 1996.
rat	LC50	inhalation	215ppm (215ppm)	SENSE ORGANS AND SPECIAL SENSES: LACRIMATION: EYE LUNGS, THORAX, OR RESPIRATION: ACUTE PULMONARY EDEMA LUNGS, THORAX, OR RESPIRATION: DYSPNEA	Journal of Toxicological Sciences. Vol. 18, Pg. 394, 1993.

DICHLOROSILANE Consensus Reports

Reported in EPA TSCA Inventory.

DICHLOROSILANE Safety Profile

Flammable; may be ignited by heat, sparks or flames. May form explosive mixtures with air. Vapors from liquefied gas are initially heavier than air and spread along ground. Vapors may travel to source of ignition and flash back. Some of these materials may react violently with water. Cylinders exposed to fire may vent and release toxic and flammable gas through pressure relief devices. Containers may explode when heated. Ruptured cylinders may rocket. Runoff may create fire or explosion hazard.
Safety Information of Dichlorosilane (CAS NO.4109-96-0):
Hazard Codes: F+,T
Risk Statements: 12-14-23-34
12: Extremely Flammable
14: Reacts violently with water
23: Toxic by inhalation
34: Causes burns
Safety Statements: 26-36/37/39-45
26: In case of contact with eyes, rinse immediately with plenty of water and seek medical advice
36: Wear suitable protective clothing
37: Wear suitable gloves
39: Wear eye/face protection
45: In case of accident or if you feel unwell, seek medical advice immediately (show label where possible)

DICHLOROSILANE Specification

Dichlorosilane ,its CAS NO. is 4109-96-0,the synonyms is Dichloro-silan ; Siliconchloridehydride .

Product Name

Dichlorosilane

Synthetic route

DICHLOROSILANE Chemical Properties

DICHLOROSILANE Uses

DICHLOROSILANE Toxicity Data With Reference

DICHLOROSILANE Consensus Reports

DICHLOROSILANE Safety Profile

DICHLOROSILANE Specification

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