Hexamethylcyclotrisiloxane supplier

Name
Hexamethylcyclotrisiloxane
EINECS 208-765-4
CAS No. 541-05-9
Article Data84
CAS DataBase
Density 0.94 g/cm³
Solubility may decompose in water
Melting Point 50-64 °C(lit.)
Formula C₆H₁₈O₃Si₃
Boiling Point 131 °C at 760 mmHg
Molecular Weight 222.464
Flash Point 26.4 °C
Transport Information UN 1325 4.1/PG 2
Appearance white crystalline solid
Safety 26
Risk Codes 11-36/37/38
Molecular Structure
Hazard Symbols F,Xi
Synonyms Cyclotrisiloxane,hexamethyl- (6CI,8CI,9CI);Dimethylsiloxane cyclic trimer;LS 8120;SDK 10;
PSA 27.69000
LogP 2.15520

Synthetic route

: 556-67-2
octamethylcyclotetrasiloxane

: 541-05-9
Hexamethylcyclotrisiloxane

Conditions

Conditions	Yield
With aluminium(III) iodide at 140 - 170℃; for 5h;	99%

: 67-68-5
dimethyl sulfoxide

: 75-78-5
dimethylsilicon dichloride

A: 2373-51-5
chloro-methylsulfanyl-methane

B: 541-05-9
Hexamethylcyclotrisiloxane

C: 556-67-2
octamethylcyclotetrasiloxane

D: 541-02-6
decamethylcyclopentasiloxane

E: 540-97-6
dodecamethyl-cyclohexasiloxane

Conditions

Conditions	Yield
at 0℃; Mechanism; other diorganyldichlorosilanes; reactions in the presence of hexamethyldisiloxane, trimethylchlorosilane, tetramethoxysilane, tetraethoxysilane;	A 79% B 48% C 35% D 12% E 5%

...Expand

: 67-68-5
dimethyl sulfoxide

A: 2373-51-5
chloro-methylsulfanyl-methane

B: 541-05-9
Hexamethylcyclotrisiloxane

C: 556-67-2
octamethylcyclotetrasiloxane

D: 541-02-6
decamethylcyclopentasiloxane

Conditions

Conditions	Yield
With dimethylsilicon dichloride at 0℃; Further byproducts given;	A 79% B 48% C 35% D 5%

...Expand

: 1529-17-5
phenyltrimethylsilyl ether

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 3440-02-6
dimethyl-diphenoxy-silane

C: 18406-79-6
C13H26O3Si3

D: C11H20O2Si2

Conditions

Conditions	Yield
With gallium(III) iodide at 175 - 180℃; for 3h; Yield given; Further byproducts given. Title compound not separated from byproducts;	A n/a B 79% C n/a D n/a

...Expand

: 19061-00-8
bis(trimethylsilyl)ketene

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 1066-54-2
trimethylsilylacetylene

Conditions

Conditions	Yield
at 700℃; flash vacuum pyrolysis;	A 22% B 16% C 76%

...Expand

: 98991-82-3
(trimethylsilyl)(dimethylsilyl)ketene

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 1066-54-2
trimethylsilylacetylene

Conditions

Conditions	Yield
at 700℃;	A 22% B 16% C 76%

...Expand

: 87594-05-6
1-(1-Adamantyl)-2-diazo-2-(pentamethyldisilanyl)ethanone

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 82094-48-2
1-(trimethylsilylethynyl)adamantane

Conditions

Conditions	Yield
at 400℃;	A 21% B 20% C 73%

...Expand

: 52826-45-6
(benzylimino)triphenylphosphorane

: 65181-02-4
3,3-dimethyl-6-oxa-3-silabicyclo<3.1.0>hexane

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 113017-78-0
2,2,4,4-tetramethyl-6-vinyl-1,3-dioxa-2,4-disilacyclohexane

D: 106-99-0
buta-1,3-diene

Conditions

Conditions	Yield
at 130℃; for 1h;	A n/a B n/a C 70% D n/a
at 130℃; for 1h;

...Expand

: 75-78-5
dimethylsilicon dichloride

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

Conditions

Conditions	Yield
With water Autoclave;	A 63.7% B 27.2%
With water In toluene at 20℃; for 27h;	A 17 % Chromat. B 38%
With water Autoclave;	A 15.9% B 17.4%
With water In toluene at 20℃; for 27h;	A 4% B 44 % Chromat.
With tetrabutylammonium tetrafluoroborate; oxygen In tetrahydrofuran Product distribution; Further Variations:; Reagents; amount of electricity; type of electrolysis cell; Electrochemical reaction;

: 75-78-5
dimethylsilicon dichloride

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 541-02-6
decamethylcyclopentasiloxane

Conditions

Conditions	Yield
With pyridine; sodium hydrogencarbonate In ethyl acetate at 20℃; for 3h;	A 60% B 20% C 15%
With water Autoclave;	A 51.3% B 29.2% C 8%
With composite catalyst at 150℃; under 675.068 Torr; for 0.5h; Temperature; Pressure; Reagent/catalyst; Large scale;	A n/a B 43% C n/a

...Expand

: 75-78-5
dimethylsilicon dichloride

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 541-02-6
decamethylcyclopentasiloxane

D: 540-97-6
dodecamethyl-cyclohexasiloxane

Conditions

Conditions	Yield
With dimethyl sulfoxide at 0℃; Further byproducts given;	A 48% B 35% C 12% D 5%
With tetrahydrofuran; lithium at 40 - 45℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given;
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given;

...Expand

: 17306-11-5
(allyl)(cyclopentadienyl)dimethylsilane

: 100-52-7
benzaldehyde

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 7338-50-3
6-phenylfulvene

Conditions

Conditions	Yield
	A n/a B n/a C 47%

...Expand

: 75-78-5
dimethylsilicon dichloride

A: 107-50-6
tetradecamethylcycloheptasiloxane

B: 541-05-9
Hexamethylcyclotrisiloxane

C: 556-67-2
octamethylcyclotetrasiloxane

D: 541-02-6
decamethylcyclopentasiloxane

E: 540-97-6
dodecamethyl-cyclohexasiloxane

Conditions

Conditions	Yield
With H2O In water slow addn. of 4l (CH3)2SiCl2 to 12l H2O at 15-20°C withorous stirring; further products;; distn.;;	A n/a B 0.5% C 42% D 6.7% E 1.6%
With hydrogenchloride In toluene at 20℃; for 4h; Product distribution; diff. concentration of aq. HCl; diff. reaction time; other difunctional organochlorosilanes;
With H2O In diethyl ether; water addn. of (CH3)2SiCl2 to ether-H2O; further products;; distn.;;

...Expand

: 3262-89-3
triphenylboroxine

: 1009-93-4
2,2,4,4,6,6-hexamethylcyclotrisilazane

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 7418-21-5
2,2,4,4,6,6-hexamethyl-1,3-dioxa-5-aza-2,4,6-trisilacyclohexane

C: 976-28-3
2,4,6-triphenylborazine

Conditions

Conditions	Yield
In potassium hydroxide byproducts: CH4, C6H6; heating 0.01mol phenylboric anhydride and 0.01mol cyclotrisilazane and 0.05g (1%) KOH for 4h at 180-280°C; analysis of liquid and gaseous products by GLC; extractn. of residue with C6H6, removal of solvent, recrystn. of triphenylborazine from heptane, elem. anal.;	A n/a B n/a C 40%

...Expand

: 34485-82-0
2,3-dimethyl-3,4-epoxy-1-butene

: 4098-30-0
dodecamethylcyclohexasilane

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 2,2,4,5-tetramethyl-1-oxa-2-silacyclohex-4-ene

D: 513-81-5
2,3-dimethyl-buta-1,3-diene

Conditions

Conditions	Yield
at 0℃; Irradiation;	A 3% B 4% C 38% D 25%

...Expand

: 930-22-3
epoxybutene

: 4098-30-0
dodecamethylcyclohexasilane

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 2,2-dimethyl-1-oxa-2-silacyclohex-4-ene

D: 106-99-0
buta-1,3-diene

Conditions

Conditions	Yield
at 0℃; Irradiation;	A 3% B 6% C 15% D 35%

...Expand

: 78133-11-6
1-dimethylmethoxysilyl-1-trimethylsilylcyclopentadiene

: 541-05-9
Hexamethylcyclotrisiloxane

Conditions

Conditions	Yield
With benzaldehyde at 500℃;	29%

: 119-61-9
benzophenone

: 17306-11-5
(allyl)(cyclopentadienyl)dimethylsilane

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 2175-90-8
6,6-Diphenylfulvene

Conditions

Conditions	Yield
With quartz In benzene at 600℃;	A n/a B n/a C 28%

...Expand

: 1450-14-2
1,1,1,2,2,2-hexamethyldisilane

A: 75-76-3
tetramethylsilane

B: 107-46-0
Hexamethyldisiloxane

C: 107-51-7
Octamethyltrisiloxane

D: 541-05-9
Hexamethylcyclotrisiloxane

E: 141-62-8
decamethyltetrasiloxane

Conditions

Conditions	Yield
With carbon monoxide; nickel at 200℃; under 750.06 Torr; for 2h; Product distribution; various reagents and reaction conditions;	A n/a B 25.8% C n/a D n/a E n/a

...Expand

: 75-77-4
chloro-trimethyl-silane

: 75-78-5
dimethylsilicon dichloride

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 141-62-8
decamethyltetrasiloxane

C: 556-67-2
octamethylcyclotetrasiloxane

D: 141-63-9
dodecamethylpentasiloxane

Conditions

Conditions	Yield
With water In toluene at 20℃; for 27h; Further byproducts given;	A n/a B 22% C n/a D 10 % Chromat.
With water In toluene at 20℃; for 27h; Further byproducts given;	A n/a B 22 % Chromat. C n/a D 10%

...Expand

: 75-77-4
chloro-trimethyl-silane

: 75-78-5
dimethylsilicon dichloride

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 141-62-8
decamethyltetrasiloxane

C: 556-67-2
octamethylcyclotetrasiloxane

D: 107-52-8
tetradecamethylhexasiloxane

Conditions

Conditions	Yield
With water In toluene at 20℃; for 27h; Further byproducts given;	A n/a B 22% C n/a D 6 % Chromat.

...Expand

: 4098-30-0
dodecamethylcyclohexasilane

A: 541-05-9
Hexamethylcyclotrisiloxane

B: 556-67-2
octamethylcyclotetrasiloxane

C: 38041-04-2
octamethylcyclotetrasilane

D: 13452-92-1
decamethylcyclopentasilane

Conditions

Conditions	Yield
With sodium perchlorate In tetrahydrofuran Photolysis;	A 73 % Chromat. B 20% C n/a D n/a

...Expand

: 17306-11-5
(allyl)(cyclopentadienyl)dimethylsilane

: 541-05-9
Hexamethylcyclotrisiloxane

Conditions

Conditions	Yield
With benzaldehyde at 680℃;	17%

: 1-trimethylsilyl-μ3-S,S'-ethylenedithiolatohexacarbonyldiiron

A: 107-46-0
Hexamethyldisiloxane

B: 541-05-9
Hexamethylcyclotrisiloxane

C: 556-67-2
octamethylcyclotetrasiloxane

Conditions

Conditions	Yield
In decane byproducts: H2S; Ar atmosphere; decompn. (165°C, 13 h); GLC, chromato-mass spectroscopy;	A 15% B 15% C 15%

...Expand

: 3277-26-7
1,1,3,3-Tetramethyldisiloxane

A: 2441-21-6
iododimethylsilane

B: 541-05-9
Hexamethylcyclotrisiloxane

C: 556-67-2
octamethylcyclotetrasiloxane

Conditions

Conditions	Yield
With iodine In dichloromethane	A n/a B 4% C 11%

...Expand

: 78-62-6
diethoxy dimethylsilane

: 541-05-9
Hexamethylcyclotrisiloxane

Conditions

Conditions	Yield
With hydrogenchloride

: 5360-04-3
(1,1,3,3-tetramethyldisiloxane-1,3-diyl)bis(methylene)diacetate

A: 79-20-9
acetic acid methyl ester

B: 541-05-9
Hexamethylcyclotrisiloxane

Conditions

Conditions	Yield
With sodium hydroxide

: 115-10-6
Dimethyl ether

: 75-78-5
dimethylsilicon dichloride

: 541-05-9
Hexamethylcyclotrisiloxane

Conditions

Conditions	Yield
With aluminium trichloride at 200℃;

: 75-78-5
dimethylsilicon dichloride

: 67-64-1
acetone

: 541-05-9
Hexamethylcyclotrisiloxane

: 75-78-5
dimethylsilicon dichloride

: 541-05-9
Hexamethylcyclotrisiloxane

Conditions

Conditions	Yield
With water Erhitzen des Reaktionsprodukts an Al2O3 auf 500-550grad;
With water at 15 - 20℃; Erhitzen der gebildeten nicht destillierbaren Produkte mit NaOH auf 230-240grad unter 1 mm;
With water at 15 - 20℃;

: 541-05-9
Hexamethylcyclotrisiloxane

: bis(tetraphenylphosphonium) hexachloridodiberyllate

: 2(C6H5)4P(1+)*[Be4Cl6(OSi(CH3)2OSi(CH3)2O)2](2-)=((C6H5)4P)2[Be4Cl6(OSi(CH3)2OSi(CH3)2O)2]

Conditions

Conditions	Yield
In dichloromethane byproducts: (CH3)2SiCl2, ((C6H5)4P)Cl; all manipulations under dry N2 atm.; soln. of Be compd. in CH2Cl2 added to soln. of Si compd. in CH2Cl2, stored at 20°C for 2 d; evapd. under vac.;	99%

: 541-05-9
Hexamethylcyclotrisiloxane

: 594-19-4
tert.-butyl lithium

: 18173-64-3
tert-butyldimethylsilanol

Conditions

Conditions	Yield
In diethyl ether 1.) 0 deg C, 1 h, 2.) to 25 deg C, 1.5 h;	98%

: 541-05-9
Hexamethylcyclotrisiloxane

: 3585-33-9
lithium dimethylamide

: lithium (dimethylamino)dimethylsilanolate

Conditions

Conditions	Yield
In tetrahydrofuran for 4h;	98%

: C19H45N10P

: 541-05-9
Hexamethylcyclotrisiloxane

: C6H19O4Si3(1-)*C19H45N10P*H(1+)

Conditions

Conditions	Yield
In hexane; water	98%

: 541-05-9
Hexamethylcyclotrisiloxane

: 13041-70-8
(E)-4-bromostilbene

: 1123246-77-4
(E)-(4-(phenylethenyl)phenyl)dimethylsilanol

Conditions

Conditions	Yield
Stage #1: (E)-4-bromostilbene With tert.-butyl lithium In diethyl ether at -78 - -57℃; Inert atmosphere; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -57℃; Inert atmosphere;	95%

: 541-05-9
Hexamethylcyclotrisiloxane

: C40H99N13P4

: C6H20O4Si3*C40H99N13P4

Conditions

Conditions	Yield
With water In hexane at 20℃;	95%

: 541-05-9
Hexamethylcyclotrisiloxane

: C40H99N13P4

: C40H99N13P4*H(1+)*C6H19O4Si3(1-)

Conditions

Conditions	Yield
In hexane; water at 20℃;	95%

: 541-05-9
Hexamethylcyclotrisiloxane

: 616-38-6
carbonic acid dimethyl ester

: 1112-39-6
dimethyldimethoxysilan

Conditions

Conditions	Yield
With aluminum oxide; potassium fluoride at 400℃;	94%

: 541-05-9
Hexamethylcyclotrisiloxane

: 67963-68-2
t-butyldimethylsilyl-4-bromophenol

: 1123246-73-0
(4-(tert-butyldimethylsilyloxy)phenyl)dimethylsilanol

Conditions

Conditions	Yield
Stage #1: t-butyldimethylsilyl-4-bromophenol With tert.-butyl lithium In diethyl ether at -78 - -58℃; Inert atmosphere; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; Inert atmosphere;	93%

: 541-05-9
Hexamethylcyclotrisiloxane

: (((2,6-Me2NCH2)2C6H3)BiO)2

: cyclo-(C6H3-2,6-((CH2NMe2)2))Bi(OSiMe2)2O

Conditions

Conditions	Yield
In benzene at 60℃; for 120h; Inert atmosphere; Schlenk technique;	93%

: 541-05-9
Hexamethylcyclotrisiloxane

: 2-iodo-5-phenylpent-1-ene

: 311312-20-6
2-(dimethylsilanol)-5-phenylpent-1-ene

Conditions

Conditions	Yield
With tert.-butyl lithium In diethyl ether; hexane at -78 - 20℃;	92%

: 541-05-9
Hexamethylcyclotrisiloxane

: 1191-15-7
diisobutylaluminium hydride

: 254763-41-2
(i-Bu)2Al(μ-OSiMe2H)(μ-OSiMe2OSiMe2H)Al(i-Bu)2

Conditions

Conditions	Yield
In n-heptane stirring (3 d); evapn. (vac.); elem. anal.;	92%

: 541-05-9
Hexamethylcyclotrisiloxane

: 3663-50-1
1,1,3,3,5,5-Hexamethyltrisiloxane-1,5-diol

Conditions

Conditions	Yield
With Re/Ac; water; hydrogen In tetrahydrofuran at 25℃; under 760.051 Torr; for 7h; Reagent/catalyst;	91.3%

: 75-77-4
chloro-trimethyl-silane

: 13269-39-1
2,4,6-trimethylcyclotrisiloxane

: 541-05-9
Hexamethylcyclotrisiloxane

: 546-45-2
1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=2.69; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane: polymer, Mn=4300, Mw/Mn=2.69; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions

Conditions	Yield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane	91%

...Expand

: 75-77-4
chloro-trimethyl-silane

: 13269-39-1
2,4,6-trimethylcyclotrisiloxane

: 541-05-9
Hexamethylcyclotrisiloxane

: 546-45-2
1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4800, Mw/Mn=2.10; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane: polymer, Mn=4800, Mw/Mn=2.10; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions

Conditions	Yield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane	90%

...Expand

: 109-72-8, 29786-93-4
n-butyllithium

: 1066-35-9
dimethylmonochlorosilane

: 541-05-9
Hexamethylcyclotrisiloxane

: 121263-52-3
C12H34O3Si4

Conditions

Conditions	Yield
In tetrahydrofuran; toluene for 5h; Inert atmosphere;	90%

...Expand

: 75-77-4
chloro-trimethyl-silane

: 13269-39-1
2,4,6-trimethylcyclotrisiloxane

: 541-05-9
Hexamethylcyclotrisiloxane

: 546-45-2
1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4200, Mw/Mn=2.01; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane: polymer, Mn=4200, Mw/Mn=2.01; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions

Conditions	Yield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane	88%

...Expand

: 84751-30-4
[(pentamethylcyclopentadienyl)2Sm(μ-H)]2

: 541-05-9
Hexamethylcyclotrisiloxane

: 130013-56-8
{(C5(CH3)5)2Sm(C4H8O)}2(OSi(CH3)2OSi(CH3)2O)

Conditions

Conditions	Yield
In tetrahydrofuran dissoln. of the Sm-compd. and hexamethylcyclotrisiloxane in THF, stirred for 5 min; removal of solvent by rotary evaporation, extractn. of solid with hexane, removal of hexane, elem. anal.;	88%

: 541-05-9
Hexamethylcyclotrisiloxane

: 696-62-8
para-iodoanisole

: 22868-26-4
(p-methoxyphenyl)dimethylsilanol

Conditions

Conditions	Yield
Stage #1: para-iodoanisole With n-butyllithium In diethyl ether at -78℃; Inert atmosphere; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; Inert atmosphere;	88%

: 541-05-9
Hexamethylcyclotrisiloxane

: 402-43-7
p-trifluoromethylphenyl bromide

: 228873-97-0
hydroxy(dimethyl)(4-trifluoromethylphenyl)silane

Conditions

Conditions	Yield
Stage #1: p-trifluoromethylphenyl bromide With tert.-butyl lithium In diethyl ether at -78℃; Inert atmosphere; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; Inert atmosphere;	87%
Stage #1: p-trifluoromethylphenyl bromide With n-butyllithium In diethyl ether at -78℃; for 1h; Metallation; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at 20℃; for 13h; Substitution;	83%
Stage #1: p-trifluoromethylphenyl bromide With n-butyllithium In diethyl ether; hexane at -78℃; for 1h; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether; hexane at 20℃; for 13h; Further stages.;	83%

: 106-39-8
bromochlorobenzene

: 541-05-9
Hexamethylcyclotrisiloxane

: 18246-04-3
(4-chlorophenyl)dimethylsilanol

Conditions

Conditions	Yield
Stage #1: bromochlorobenzene With tert.-butyl lithium In diethyl ether at -78 - -60℃; Inert atmosphere; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -74℃; Inert atmosphere;	87%

: 541-05-9
Hexamethylcyclotrisiloxane

: 591-51-5
phenyllithium

: 5272-18-4
dimethylphenylsilanol

Conditions

Conditions	Yield
In diethyl ether Substitution;	86%

: 75-77-4
chloro-trimethyl-silane

: 13269-39-1
2,4,6-trimethylcyclotrisiloxane

: 541-05-9
Hexamethylcyclotrisiloxane

: 546-45-2
1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=2.17; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane: polymer, Mn=4300, Mw/Mn=2.17; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions

Conditions	Yield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane	85%

...Expand

: 541-05-9
Hexamethylcyclotrisiloxane

: 66703-03-5
trans-1-iodo-1-pentene

: 915380-13-1
(E)-dimethyl-(1-pentenyl)silanol

Conditions

Conditions	Yield
Stage #1: trans-1-iodo-1-pentene With n-butyllithium In diethyl ether at -78℃; for 0.5h; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃;	85%

: 541-05-9
Hexamethylcyclotrisiloxane

: 75-78-5
dimethylsilicon dichloride

: 17883-13-5
2,2,4,4,6,6,8,8-Octamethyl-1,5,7-trioxa-3-aza-cyclooctasilan

Conditions

Conditions	Yield
Stage #1: Hexamethylcyclotrisiloxane; dimethylsilicon dichloride; N,N,N,N,N,N-hexamethylphosphoric triamide at 20℃; for 3h; Inert atmosphere; Stage #2: With ammonia In toluene at 5℃; for 8h; Cooling with ice;	84.7%

: 541-05-9
Hexamethylcyclotrisiloxane

: 90-14-2
1-Iodonaphthalene

: 17950-90-2
dimethyl(naphthalen-1-yl)silanol

Conditions

Conditions	Yield
Stage #1: 1-Iodonaphthalene With n-butyllithium In diethyl ether at -78℃; Inert atmosphere; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; Inert atmosphere;	84%
Stage #1: 1-Iodonaphthalene With n-butyllithium In diethyl ether; hexane at -78℃; for 1h; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; for 12h;	67%

: 75-77-4
chloro-trimethyl-silane

: 13269-39-1
2,4,6-trimethylcyclotrisiloxane

: 541-05-9
Hexamethylcyclotrisiloxane

: 546-45-2
1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=1.89; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane: polymer, Mn=4300, Mw/Mn=1.89; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions

Conditions	Yield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃; Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane	82%

...Expand

: 541-05-9
Hexamethylcyclotrisiloxane

: 95-46-5
2-methylphenyl bromide

: 188404-95-7
hydroxy(dimethyl)(2-methylphenyl)silane

Conditions

Conditions	Yield
Stage #1: 2-methylphenyl bromide With n-butyllithium In diethyl ether at -78℃; for 1h; Metallation; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at 20℃; for 13h; Substitution;	81%
Stage #1: 2-methylphenyl bromide With n-butyllithium In diethyl ether; hexane at -78℃; for 1h; Stage #2: Hexamethylcyclotrisiloxane In diethyl ether; hexane at 20℃; for 13h; Further stages.;	81%

: 541-05-9
Hexamethylcyclotrisiloxane

: 865-37-2
dimethylaluminum hydride

: 254763-42-3
(Me)2Al(μ-OSiMe2H)(μ-OSiMe2OSiMe2H)Al(Me)2

Conditions

Conditions	Yield
In hexane stirring (4 d); evapn. (vac.); elem. anal.;	81%

Hexamethylcyclotrisiloxane Specification

The Hexamethylcyclotrisiloxane , with cas registry number of 541-05-9, belongs to the categories of (1) Siloxanes ; (2) Organics ; (3) Si (Classes of Silicon Compounds) ; (4) Si-O Compounds ; (5) Organometallic Reagents ; (6) Organosilicon. Its IUPAC name is 2,2,4,4,6,6-hexamethyl-1,3,5,2,4,6-trioxatrisilinane . And its systematic name is 2,2,4,4,6,6-hexamethyl-1,3,5,2,4,6-trioxatrisilinane . This compound is stable, but moisture sensitive. It is also incompatible with strong oxidizing agents.

Physical properties of Hexamethylcyclotrisiloxane are: (1) #H bond acceptors: 3 ; (2) #H bond donors: 0 ; (3) #Freely Rotating Bonds: 0 ; (4) Index of Refraction: 1.417 ; (5) Molar Refractivity: 59.26 cm³ ; (6) Molar Volume: 235.4 cm³ ; (7) Surface Tension: 17.5 dyne/cm ; (8) Enthalpy of Vaporization: 35.34 kJ/mol ; (9) Vapour Pressure: 11.6 mmHg at 25°C.

Preparation of Hexamethylcyclotrisiloxane : This chemical can be prepared by many ways. Here will give a example, use octamethyl-cyclotetrasiloxane as reactants. And the reaction occures under the temperature of 140 - 170 ℃ for 5 hours using the reagent of Aluminium iodide . The yield is 99%.

Uses of Hexamethylcyclotrisiloxane : (1) Hexamethylcyclotrisiloxane is used to the manufacture of methyl vinyl silicone rubber products, and is also an important raw material synthesis of other polymers. In addition to the general synthesis of silicone polymers, it can also be used to prepare a specific organic silicon compounds, as a variety of surface treatment agent, coupling agent, crosslinking agent, etc. (2) Hexamethylcyclotrisiloxane is used to prepare many other chemicals. For example, it reacts with tert-butyl-lithium in the solvent of diethyl ether and other conditions: 1.) 0 deg C, 1 h, 2.) To 25 deg C, 1.5 h. The yield is about 98%.

When you are using this chemical, please be cautious about it as the following:
The Hexamethylcyclotrisiloxane is highly flammable and irritating to eyes, respiratory system and skin. If contact with eyes accidently, rinse immediately with plenty of water and seek medical advice. It should be stored in flammables area.

You can still convert the following datas into molecular structure:
(1) SMILES:O1[Si](O[Si](O[Si]1(C)C)(C)C)(C)C;
(2) InChI:InChI=1/C6H18O3Si3/c1-10(2)7-11(3,4)9-12(5,6)8-10/h1-6H3;
(3) InChIKey:HTDJPCNNEPUOOQ-UHFFFAOYAR

Product Name

Hexamethylcyclotrisiloxane

Synthetic route

Hexamethylcyclotrisiloxane Specification

Related Products

Hot Products