indium
Conditions | Yield |
---|---|
In not given Electrolysis; at 60°C;for 40 min; density of current 3-6 A/dm^2; electrolyte: in the presence of K-Na-tartarate; | 100% |
In not given Electrolysis; at 60°C;for 40 min; density of current 3-6 A/dm^2; in the presence of H2SO4; | 100% |
In not given Electrolysis; at 60°C;for 40 min; density of current 3-6 A/dm^2; in the presence of acetic acid, Na-acetate; | 100% |
Conditions | Yield |
---|---|
In decalin byproducts: isobutane; pyrolysis in decalin under dry and deoxygenated N2 (140°C, 24 h); GLC anal. of org. products; | A >99 B 96% |
Conditions | Yield |
---|---|
In toluene at 20℃; for 24h; Inert atmosphere; Schlenk technique; Glovebox; | A 96% B 94% C n/a |
Conditions | Yield |
---|---|
In dichloromethane addn. of soln. of Cp2Co in CH2Cl2 to suspn. of InOTf in CH2Cl2; pptn., filtration, rinsing of ppt. with CH2Cl2; removal of solvent in vac.; slow evapn of concd. CH2Cl2 soln.; crystn.; | A n/a B 90.1% |
Conditions | Yield |
---|---|
With dimethyl sulfoxide In benzene | A 90% B n/a |
With [2,2]bipyridinyl In benzene | A 90% B n/a |
With triethylamine In benzene | A 90% B n/a |
Conditions | Yield |
---|---|
In xylene pyrolysis in p-xylene under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 85% |
Conditions | Yield |
---|---|
In m-xylene=m-xylol pyrolysis in m-xylene under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 83% |
Conditions | Yield |
---|---|
In o-xylene=o-xylol pyrolysis in o-xylene under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 72% |
Conditions | Yield |
---|---|
In xylene pyrolysis in p-xylene under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 67% |
lithium pentamethylcyclopentadienide
A
indium
C
bis(pentamethylcyclopentadienyl)indium(III) chloride
D
decamethylfulvalene
Conditions | Yield |
---|---|
In diethyl ether InCl added to suspension of Li(C5(CH3)5), stirred for 5h at room temp.; exclusion of air and moisture; filtered, washed four times with ether, sublimation; elem. anal.; | A 21% B 62.01% C 5% D 2.5% |
tri-sec-butylindium
A
indium
B
2,2',3,3'-tetrahydro-1H,1'H-1,1'-biindene
Conditions | Yield |
---|---|
In further solvent(s) pyrolysis in indane under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 62% |
Conditions | Yield |
---|---|
In decalin byproducts: butene; pyrolysis in decalin under dry and deoxygenated N2 (140°C, 24 h); GLC anal. of org. products; | A 60% B >99 |
Conditions | Yield |
---|---|
In further solvent(s) pyrolysis in p-chlorotoluene under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 60% |
Conditions | Yield |
---|---|
In tetralin pyrolysis in tetralin under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 60% |
tri-sec-butylindium
A
indium
B
2,3-diphenylbutane
Conditions | Yield |
---|---|
In ethylbenzene pyrolysis in ethylbenzene under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 51% |
tri-sec-butylindium
A
indium
B
3,4-dimethylhexane
C
butene-2
D
n-butane
Conditions | Yield |
---|---|
In decalin pyrolysis in decalin under dry and deoxygenated N2 (140°C, 24 h); GLC anal. of org. products; | A >99 B 10% C 30% D 40% |
Conditions | Yield |
---|---|
In further solvent(s) pyrolysis in p-methoxytoluene under dry and deoxygenated N2 (stirring; 140°C, 9 h); GLC anal. of org. products; | A n/a B 35% |
K(1+)*{HIn(CH2C(CH3)3)3}(1-)=K{HIn(CH2C(CH3)3)3}
Chlorodiisopropylphosphane
A
indium
B
(((CH3)3CCH2)2In(P(CH(CH3)2)2))2
C
((CH3)3CCH2)3In*P(H)(CH(CH3)2)2
D
((CH3)3CCH2)3In*P2(CH(CH3)2)4
Conditions | Yield |
---|---|
In pentane byproducts: H2, (Me3CCH2)P(i-Pr)2, KCl; under Ar, standard vac. line techniques; pentane solns. of ClP(i-Pr)2 and In compd. (molar ratio 1:1) cooled to -78°C; combined; warmed slowly to room temp.; stirred for 2 d; pentane sol. products sepd. from ppt. by extn. (8 times); solvent removed by vac. distn. at 0°C; mixt. of three In compds. obtained; P2(i-Pr)4 adduct crystd. at room temp. in drybox; detd. by (1)H and (31)P NMR spectroscopy; | A n/a B n/a C n/a D 33.7% |
N,N,N,N,-tetramethylethylenediamine
indium(III) chloride
A
indium
Cl2InCH2InCl2((CH2N(CH3)2)2)2
Conditions | Yield |
---|---|
With methylene chloride In dichloromethane; toluene equimolar amts. of InCl and InCl3 suspended in CH2Cl2-toluene (1:1, v/v) at -80°C, TMEDA added, stirred, allowed to reach room temp., further stirred for 1 h (total react. time 3-4 h); filtered, crystals deposited on standing collected and dried under vac., further crop obtained by addn. of Et2O to mother liquor and recrystn. (CH2Cl2); InCl3 solvate isolated from separate expt. by addn. of petroleum ether to react. mixt.; elem. anal.; | A n/a B 20% C n/a |
lithium tetrahydridoindanate
quinuclidine hydrochloride
lithium bromide
A
indium
Conditions | Yield |
---|---|
In diethyl ether byproducts: H2, LiCl; quinuclidine hydrochloride added over 5 min to an in situ generated soln. of LiInH4 contg. LiBr in Et2O at -78°C, warmed to -30°C,stirred for 2 h, filtered, kept at this temp. for 72 h; evapd. (vac.), extd. (toluene), crystd. at -50°C overnight; | A n/a B 17% |
Conditions | Yield |
---|---|
In tetrahydrofuran byproducts: tBu3SiH, tBu3SiBr, (tBu3Si)2; equimolar ratio, stirring (-78°C, 12 h), warming (room temp.); volatile compds. removal (vac.), dissoln. (pentane), filtn., pptn. (1 week, -23°C); elem. anal.; | A n/a B 16.2% |
In tetrahydrofuran byproducts: NaBr; equimolar ratio, stirring (-78°C, 12 h), warming (room temp.); volatile compds. removal (vac.), dissoln. (pentane), filtn., pptn. (1 week, -23°C); elem. anal.; | A n/a B 16.2% |
(Cp(*)Fe(CO)2)2InI
sodium tetrakis[(3,5-di-trifluoromethyl)phenyl]borate
A
indium
B
[((η5-C5Me5)Fe(CO)2)2(μ-I)][B(C6H3(CF3)2-3,5)4]
Conditions | Yield |
---|---|
In dichloromethane (N2 or Ar); a soln. of Fe complex added to a suspn. of B complex at -78°C, warmed to 20°C over 30 min, stirred for 3 h; filtered, layered with hexanes; | A n/a B 15% |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: ethylene, HSiMe3; heated under vac. to 400°C for 10 h; | A n/a B 13% |
N,N,N,N,-tetramethylethylenediamine
indium(III) chloride
A
indium
Cl2InCH2InCl2((CH2N(CH3)2)2)2
Conditions | Yield |
---|---|
With methylene chloride In dichloromethane InCl and catalitic amts. of InCl3 suspended in CH2Cl2 at -80°C, TMEDA added, allowed to reach room temp. over ca. 2 h; Et2O added, ppt. collected, dried; | A n/a B 10% |
dicarbonylcyclopentadienyliodoiron(II)
[CH((CH3)2CN-2,6-(i)Pr2C6H3)2In]
sodium tetrakis[(3,5-di-trifluoromethyl)phenyl]borate
A
indium
B
[((2,6-diisopropylphenyl-NC(Me))2CH)Fe(III)(η5-cyclopentadienyl)(CO)][B(C6H3(CF3)2-3,5)4]
Conditions | Yield |
---|---|
In tetrahydrofuran under N2 or Ar; THF added to solid mixt. of Fe complex and NaB(C6H3(CF3)2)4; THF soln. of In compd. added; volatiles removed; extd. into toluene; soln. filtered; layered with hexane; crystd. for 1 wk; elem. anal.; | A n/a B 10% |
indium
Conditions | Yield |
---|---|
With magnesium violent but incomplete reaction; | |
With sodium carbonate; pyrographite in blow pipe; | |
With hydrogen in tube with H2-flow; |
Conditions | Yield |
---|---|
In neat (no solvent) (Ar); In2O3 and Mn reacted in 1:1 or 1:2 or 2:1 molar ratio; powdered inmortar; sealed under vacuum in quartz ampoule; heated to 723 K and with 0.5 K/h to 973 K; maintained for 7 days; cooled to 0.8 K/h to 473 K; le ft standing at room temp.; |
Conditions | Yield |
---|---|
byproducts: In2O3; at 473°K and then at 673-773°K more; | 100% |
Conditions | Yield |
---|---|
In neat (no solvent) In, As evacuated, closed in an outgassed quartz ampoule at .apprx.1E-4 Pa, heated at 580.+-.20°C, 150h; | 100% |
In neat (no solvent) deposited at GaAs by periodic supply of As and Ga species, deposition times was 25 min; | |
In, As sources used on InAs substrate at 450 to 525°C; | |
In neat (no solvent) mixt. melting (evac. sealed quartz capsule, 7E-4 hPa); differential thermal anal.; | |
In neat (no solvent, solid phase) annealing (800 K, 7 d); |
Conditions | Yield |
---|---|
In neat (no solvent) In, Sb evacuated, closed in an outgassed quartz ampoule at .apprx.1E-4 Pa, heated at 500.+-.20°C, 70h or heated at 400.+-.20°C, 110h; | 100% |
In melt crystn. from the melt with nearly stoichiometric composition;; single crystals obtained;; | |
In neat (no solvent) High Pressure; 0.7 GPa, laser heating; |
Conditions | Yield |
---|---|
With Et4NClO4 In acetonitrile byproducts: H2; Electrolysis; using indium metall anode, platinum wire cathode in soln. of Et4NClO4 and dihydroxynaphthalene (2 h, N2, 20 mA), hydrogen gas evolving at the cathode and forming product at the anode; product collected by filtration, washed with acetonitrile and Et2O, dried (vac.); elem. anal.; | 100% |
Conditions | Yield |
---|---|
at 299.84 - 999.84℃; | A 100% B n/a |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 550 - 950℃; for 240h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 350 - 950℃; for 240h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
at 590 - 900℃; for 120h; Inert atmosphere; | 100% |
Conditions | Yield |
---|---|
With oxygen In dimethyl sulfoxide metal. In under O2 atm. treated with DMSO and triflic acid (3 equiv.) in3 portions, heated at 100°C for 22 h; | 99% |
Conditions | Yield |
---|---|
In neat (no solvent) mixt. K, Nb, In, and As was sealed in Nb container, enclosed in evacuated fused-silica ampule and heated at 600°C for a week and cooled slowly; elem. anal.; | 99% |
Conditions | Yield |
---|---|
In neat (no solvent) (Ar); a mixt. of Gd, Ge, and In sealed (vac.), heated; | 99% |
Conditions | Yield |
---|---|
In melt heating lanthanum, gold and indium in molar ratio 1:2:4 to 1000 for 10 hin vac., keeping at 1000°C for 120 h; cooling to room temp. for 48 h, X-ray anal.; | 99% |
Conditions | Yield |
---|---|
In melt heating praseodymium, gold and indium in molar ratio 1:2:4 to 1000 for 10 h in vac., keeping at 1000°C for 120 h; cooing to room temp. for 48 h, X-ray anal.; | 99% |
Conditions | Yield |
---|---|
In melt heating cerium, gold and indium in molar ratio 1:2:4 to 1000 for 10 h invac., keeping at 1000°C for 120 h; cooling to room temp. for 48 h, X-ray anal.; | 99% |
Conditions | Yield |
---|---|
In tetrahydrofuran | 99% |
Conditions | Yield |
---|---|
In dichloromethane | 99% |
Conditions | Yield |
---|---|
In melt heating neodymium, gold and indium in molar ratio 1:2:4 to 1000 for 10 hin vac., keeping at 1000°C for 120 h; cooling to room temp. for 48 h, X-ray anal.; | 99% |
Conditions | Yield |
---|---|
In nitromethane at 20℃; for 1.5h; Sonication; | 99% |
Conditions | Yield |
---|---|
With oxygen; tetraethylammonium perchlorate In acetonitrile Electrolysis; bubbling O2 through a soln. of thiol in CH3CN/Et4NClO4, electrolysis (open to atmosphere): Pt cathode, In anode, 15V, 50 mA, 1.0 h react. time, at the end of electrolysis stirring for ca. 12 h; filtration, washing with CH3CN, then petroleum ether, drying in vac.; elem. anal.; | 98% |
Conditions | Yield |
---|---|
In nitromethane at 20℃; for 0.5h; Sonication; | 98% |
The German chemists Ferdinand Reich and Hieronymous Theodor Richter dissolved the minerals pyrite, arsenopyrite, galena and sphalerite in hydrochloric acid and distilled the raw zinc chloride. As it was known that ores from that region sometimes contain thallium they searched for the green emission lines with spectroscopic methods. They named the element with the blue spectral line indium. Richter went on to isolate the metal in 1864.
Until 1924, only approximately a gram of Indium (CAS NO.7440-74-6) constituted the world's supply.
Reported in EPA TSCA Inventory.
OSHA PEL: TWA 0.1 mg(In)/m3
ACGIH TLV: TWA 0.1 mg(In)/m3
The Indium, with the cas registry number 7440-74-6, is a kind of silver gray fusible metal. This is insoluble in water, stable chemically but incompatible with strong acids, strong oxidizing agents, sulfur. Its product categories are including Inorganics; Indium; Metal and Ceramic Science; Metals; Catalysis and Inorganic Chemistry; Chemical Synthesis; IndiumMetal and Ceramic Science; IApplication CRMs; ICP CRMs; Alphabetic; Analytical Standards; ICP-OES/-MS; ICPSpectroscopy; Spectroscopy.
The physical properties of this chemical are below: (1)#H bond acceptors: 0; (2)#H bond donors: 0; (3)#Freely Rotating Bonds: 0; (4)Polar Surface Area: 0; (5)Exact Mass: 114.903878; (6)MonoIsotopic Mass: 114.903878; (7)Topological Polar Surface Area: 0; (8)Heavy Atom Count: 1; (9)Covalently-Bonded Unit Count: 1
The production method of this chemical is below: all kinds of waste and intermediate products from the production of lead, Zinc, antimony, tin go through the process of enriched oxidation, extraction, metathesis and electrolysis to get this chemical.
As to its usage, it is widely applied in many ways. It could be used as the doping agent in compound semiconductor and high purity semiconductor [semiconducting] material; It could also be used in producing low melting point alloy and indium; Then it could also be applied in electron electroplate industry.
When you are using this chemical, you should be very cautious. For one thing, it is irritant which may cause inflammation to the skin or other mucous membranes, and it is irritating to eyes, respiratory system and skin. For another thing, it is harmful which may cause damage to health. If by inhalation, in contact with skin and if swallowed, it will be harmful. In addition, it is highly flammable which may catch fire in contact with air, only needing brief contact with an ignition source, and it has a very low flash point or evolve highly flammable gases in contact with water. Beside all these, it is corrosive which may destroy living tissue on contact.
Due to so many dangers, you could take the different measures to deal with different cases. Wear suitable protective clothing, gloves and eye/face protection. If in case of contact with eyes, rinse immediately with plenty of water and seek medical advice, and if in case of accident or if you feel unwell, seek medical advice immediately (show the label whenever possible). Then when store it, keep container in a well-ventilated place away from sources of ignition. After contact with skin, wash immediately with plenty of soap-suds.
Additionally, you could convert the following datas into the molecular structure:
(1)Canonical SMILES: [In]
(2)InChI: InChI=1S/In
(3)InChIKey: APFVFJFRJDLVQX-UHFFFAOYSA-N
Below are the toxicity information of this chemical:
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
mouse | LDLo | subcutaneous | 10mg/kg (10mg/kg) | "Toxicity of Industrial Metals," Browning, E., London, Butterworths, 1961Vol. -, Pg. 144, 1961. |
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