Conditions | Yield |
---|---|
In diethyl ether byproducts: SO2; to finely ground dry Ag salt in anhyd. Et2O cooled to 0°C added dropwise with vigorous stirring equimolar amt. of thionyl chloride; suspn. stirred for 15 min; soln. was decanted from AgCl; AgCl dried; soln. washed (Et2O); all extracts combined; cooled to 0°C; | A n/a B 99% |
Conditions | Yield |
---|---|
In diethyl ether byproducts: SO2, SO3; to finely ground dry Ag salt in anhyd. Et2O cooled to 0°C added dropwise with vigorous stirring equimolar amt. of thionyl chloride; suspn. stirred for 15 min; soln. was decanted from AgCl; AgCl dried; soln. washed (Et2O); all extracts combined; cooled to 0°C; | A n/a B n/a C 99% |
tetrachlorosilane
Nitrogen dioxide
A
silica gel
C
nitrosylchloride
Conditions | Yield |
---|---|
In neat (no solvent) heating (molar ratio SiCl4:NO2 1:5.6, 353 K); mass spectrometry, chromy.; | A 98.5% B n/a C n/a |
In neat (no solvent) heating (molar ratio SiCl4:NO2 1:6.0, 313 K); mass spectrometry, chromy.; | A 98.3% B n/a C n/a |
In neat (no solvent) heating (molar ratio SiCl4:NO2 1:6.8, 313 K); mass spectrometry, chromy.; | A 98.5% B n/a C n/a |
In neat (no solvent) heating (molar ratio SiCl4:NO2 1:5.2, 313 K); mass spectrometry, chromy.; | A 95.5% B n/a C n/a |
In neat (no solvent) heating (molar ratio SiCl4:NO2 1:6, 298 K, exclusion of air, 180 h), heating 313-333 K, 8-10 h); distn. of gasous products; mass spectrometry, chromy.; |
nitric acid
B
water
C
Nitrogen dioxide
D
nitrosylchloride
E
dinitrogen monoxide
Conditions | Yield |
---|---|
In nitric acid byproducts: Cl2; to Ru complex was added concd. HNO3; mixt. heated under reflux for 5 min; cooled to room temp.; ppt. filtered off; washed (water, alc., ether); dried (vac.); recrystd. (aq. HNO3); elem. anal.; | A 95% B n/a C n/a D n/a E n/a |
molybdenum(V) chloride
nitrogen(II) oxide
acetonitrile
A
Mo(NO)Cl3(NCMe)2
B
nitrosylchloride
Conditions | Yield |
---|---|
In dichloromethane NO was bubbled through the soln. of MoCl5 and CH3CN at room temp. for 1h, Ar atm.; concn., pptn. with pentane, filtration, washing with pentane, drying invac.; elem. anal.; | A 70% B n/a |
nitric acid
B
water
C
nitrosylchloride
D
dinitrogen monoxide
Conditions | Yield |
---|---|
In nitric acid byproducts: Cl2; to Ru complex was added concd. HNO3; mixt. heated under reflux for 50 min; cooled to room temp.; ppt. filtered off; washed (water, alc., ether); dried (vac.); mother liquor evapd. on water bath; ppt. was obtained; elem.anal.; | A 65% B n/a C n/a D n/a |
tetrachlorosilane
Nitrogen dioxide
A
silica gel
B
chlorine
D
nitrosylchloride
Conditions | Yield |
---|---|
In neat (no solvent) heating (molar ratio SiCl4:NO2 1:4.8, 313 K); mass spectrometry, chromy.; | A 62% B <1 C n/a D n/a |
In neat (no solvent) heating (molar ratio SiCl4:NO2 1:5.6, 293 K); mass spectrometry, chromy.; | A 51% B <1 C n/a D n/a |
nitrogen(II) oxide
tungsten(VI) chloride
trichlorotrinitrosyltungsten
B
nitrosylchloride
Conditions | Yield |
---|---|
In dichloromethane mixt. of WCl6 and CH2Cl2 under N2 was stirred at room temp., N2 was replaced by NO for 30 min, NO was flushed out of system, mixt. was refluxedunder N2 for 3.5 h to removed ClNO; filtered, washed with CH2Cl2, dried under vac. at ambient temp.; elem. anal.; | A 61% B n/a |
nitrogen(II) oxide
tungsten(VI) chloride
W(NO)2Cl4
B
nitrosylchloride
Conditions | Yield |
---|---|
In dichloromethane mixt. of WCl6 and CH2Cl2 under N2 was stirred at room temp., N2 was replaced by NO for 17 min, NO was flushed out of system, mixt. was refluxedunder N2 for 3.5 h to removed ClNO; filtered, washed with CH2Cl2, dried under vac. at ambient temp.; elem. anal.; | A 47% B n/a |
Conditions | Yield |
---|---|
In neat (no solvent) HNO3 : NaCl = 3:1; at 100°C about 3 h;; | 35% |
In neat (no solvent) HNO3 : NaCl = 3:1; at 100°C about 3 h;; | 35% |
In water using concd. HNO3;; |
1-Chloropropane
A
hydrogenchloride
B
propylium
C
nitrosylchloride
Conditions | Yield |
---|---|
With nitric oxide cation In gas at 24.9℃; Rate constant; Product distribution; |
Conditions | Yield |
---|---|
With nitric oxide cation In gas at 24.9℃; Rate constant; Thermodynamic data; ΔHr,2980; variation of vibrational excitation in NO+; |
Conditions | Yield |
---|---|
With nitric oxide cation In gas at 24.9℃; Rate constant; Thermodynamic data; ΔHr,2980; variation of vibrational excitation in NO+; |
isopropyl chloride
A
hydrogenchloride
B
isopropyl cation
C
nitrosylchloride
Conditions | Yield |
---|---|
With nitric oxide cation In gas at 24.9℃; Rate constant; Product distribution; |
Conditions | Yield |
---|---|
With nitric oxide cation In gas at 24.9℃; Rate constant; Thermodynamic data; ΔHr,2980; |
Conditions | Yield |
---|---|
With nitric oxide cation In gas at 24.9℃; Rate constant; Thermodynamic data; ΔHr,2980; variation of vibrational excitation in NO+; |
Conditions | Yield |
---|---|
In gas Kinetics; byproducts: O2NCF2C(O)F, O2NCF2CFClNO2; 322.8, 333.2 and 342.2 K, 13.0-90.2 Torr CF2CFCl and 9.3-89.5 Torr NO2 pressure, in the presence/absence of CF4 (277.6-458.5 Torr); |
Conditions | Yield |
---|---|
In water reaction of satd. NH4Cl soln. with concd. HNO3 at ambient temp.;; | |
In water reaction of satd. NH4Cl soln. with concd. HNO3 at ambient temp.;; |
bis(triphenylphosphine)iminium chloride
nitrosylchloride
Conditions | Yield |
---|---|
In dichloromethane byproducts: [(Ph3P)2N][BF4]; (Ar); CH2Cl2 was added via syringe to mixt. of NOBF4 and (Ph3P)2NCl; not isolated; IR monitoring; |
Conditions | Yield |
---|---|
In gas | |
In neat (no solvent, gas phase) |
Conditions | Yield |
---|---|
In neat (no solvent) passing NO2 over KCrO3Cl at ambient temp. and at 180°C;; | A 0% B n/a |
In neat (no solvent) | A 0% B n/a |
nitrosylchloride
Conditions | Yield |
---|---|
With hydrogenchloride; nitric acid In water byproducts: H2O, Cl2; max. conc. of H ions is 0.58% at 25 °C and 36% at 100 °C; | |
With HCl; HNO3 In water byproducts: H2O, Cl2; max. conc. of H ions is 0.58% at 25 °C and 36% at 100 °C; |
Conditions | Yield |
---|---|
With Nitrogen dioxide In water | |
With NO2 In water |
Conditions | Yield |
---|---|
In neat (no solvent) at 120 - 175°C;; | |
In water using concd. HNO3;; | |
In neat (no solvent) at 120 - 175°C;; | |
In water |
Conditions | Yield |
---|---|
In nitric acid byproducts: NO2, Cl2; reaction of KCl with HNO3 under formation of KNO3 and gases; passing gases over 50% HNO3 at -15 - 0°C;; fractionated distillation;; | |
byproducts: Cl2, H2O, KCl; high conc. of acid; | |
byproducts: Cl2, H2O, KCl; high conc. of acid; | |
In nitric acid byproducts: NO2, Cl2; aq. HNO3; reaction of KCl with HNO3 under formation of KNO3 and gases; passing gases over 50% HNO3 at -15 - 0°C;; fractionated distillation;; |
Conditions | Yield |
---|---|
In water treatment of KCl with excess of 50% HNO3 on heating; cooling down at 30°C under dissolving of NOCl in acid;; | |
In water treatment of KCl with excess of 50% HNO3 on heating; cooling down at 30°C under dissolving of NOCl in acid;; |
Conditions | Yield |
---|---|
at 24.84℃; for 0.5h; Temperature; Ionic liquid; | 100% |
tetrafluoroethane-β-sultone
nitrosylchloride
chlorosulfuric acid trifluorovinyl ester
Conditions | Yield |
---|---|
at -35°C; | 97% |
at -35°C; | 97% |
Conditions | Yield |
---|---|
for synthesis of small amounts;; | 96% |
for synthesis of small amounts;; | 96% |
Conditions | Yield |
---|---|
In liquid sulphur dioxide byproducts: HCl; <-10°C, 15-30min, protective gas to exclude moisture; filtration or evapn. of SO2;; washing with CH2Cl2, drying in vac.;; | 96% |
In nitromethane byproducts: HCl; <0°C, 15-30min, protective gas to exclude moisture; filtration or evapn. of solvent;; washing with CH2Cl2, drying in vac.;; | 96% |
In nitromethane byproducts: HCl; <0°C, 15-30min, protective gas to exclude moisture; filtration or evapn. of solvent;; washing with CH2Cl2, drying in vac.;; | 96% |
In sulfur dioxide byproducts: HCl; <-10°C, 15-30min, protective gas to exclude moisture; filtration or evapn. of SO2;; washing with CH2Cl2, drying in vac.;; | 96% |
Conditions | Yield |
---|---|
In dichloromethane anaerobic conditions; NOCl was added to stirred soln. of SnCl4 in CH2Cl2at 0°C; stirred for 1 h while NOCl was passed through; distd. (vac.); | 96% |
In tetrachloromethane reaction with NOCl in CCl4 to (NO)2SnCl6 at -15°C;; | |
In not given reaction with excess NOCl under formation of (NO)2SnCl6;; | |
In tetrachloromethane |
antimonypentachloride
nitrosylchloride
nitrosonium hexachloroantimonate
Conditions | Yield |
---|---|
In dichloromethane 0 - 10 °C, under N2; the product was filtered under N2, washed with CH2Cl2, dried in vac. at25 °C, elem. anal.; | 96% |
trifluorormethanesulfonic acid
nitrosylchloride
nitrosyl trifluoromethane sulfonate
Conditions | Yield |
---|---|
In tetrachloromethane 0 - 10 °C; liquid components were removed in vac., the rest was dried in vac. at 25 °C, elem. anal.; | 96% |
deca-B-methyl-1-hydroxymethyl-1,12-dicarba-closo-dodecaborane(12)
nitrosylchloride
ONOCH2C(BCH3)10CH
Conditions | Yield |
---|---|
In pyridine; benzene inert conditions; condensation of NOCl into frozen soln. of carborane (-78°C), warming to room temp., stirring (30 min); votalities removed (vac.), extn. into pentane, solvent removal, recrystn. (pentane); | 95% |
Conditions | Yield |
---|---|
In dichloromethane byproducts: CO; to W(CO)6 were added CH2Cl2 and ClNO, stirred for 0.5 h at room temp., air was introduced into the vessel, mixt. was stirred ca. 5 min, after 2h ClNO total had been added, suspn. was refluxed under N2 for 1 h; cooled to room temp., sepd., filtered, washed with CH2Cl2, dried under vac. for 18 h at 20°C; elem. anal.; | 92% |
tetrakis(acetato)dimolybdenum(II)
nitrosylchloride
Triphenylphosphine oxide
Conditions | Yield |
---|---|
In ethyl acetate N2-atmosphere; addn. of excess NOCl to Mo-complex suspn., dropwise addn.to excess of Ph3PO (pptn.); filtration, washing (ethyl acetate, petroleum ether), drying (vac., 2 h); | 90.5% |
1,2,2-trifluoro-2-hydroxy-1-trifluoromethylethanesulfonic acid sultone
nitrosylchloride
chlorosulfuric acid pentafluoropropenyl ester
Conditions | Yield |
---|---|
at -35°C; | 90% |
at -35°C; | 90% |
bromine trifluoride
bromine
nitrosylchloride
nitrosyl hexafluorophosphate
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: BrCl, Cl2; treating red P with Br2; condensation of NOCl in excess and addn. of BrF3;; | 88% |
In neat (no solvent) byproducts: BrCl, Cl2; treating red P with Br2; condensation of NOCl in excess and addn. of BrF3;; | 88% |
nitrosylchloride
Conditions | Yield |
---|---|
87% | |
87% |
Conditions | Yield |
---|---|
In further solvent(s) distillation of NOCl on GeO2 in vac. at -10 °C, addn. of BrF3 under cooling with liq. air, warming to room temp., heating;; distillation of solvent in vac.;; | 84% |
In further solvent(s) distillation of NOCl on GeO2 in vac. at -10 °C, addn. of BrF3 under cooling with liq. air, warming to room temp., heating;; distillation of solvent in vac.;; | 84% |
In neat (no solvent) | |
In neat (no solvent) |
(meso-tetraphenylporphyrinato)carbonyl(ethanol)ruthenium(II)
nitrosylchloride
Conditions | Yield |
---|---|
In benzene addn. of satd. NOCl soln. to soln. of Ru-complex, stirring (2 h); evapn. (vacuum), addn. of hexane, pptn., centrifugation, washing (hexane), drying (vacuum); elem. anal.; | 81% |
Conditions | Yield |
---|---|
In dichloromethane bubbling NOCl into a suspn. of the Mo complex in CH2Cl2 (ca. 10 min), removal od excess NOCl by a stream of N2; evapn., washing (hexane), drying (vac.); elem. anal.; | 81% |
3-methoxy-2-propenenitrile
nitrosylchloride
3,3-dimethoxy-2-hydroxyiminopropionitrile
Conditions | Yield |
---|---|
In methanol at -10 - 20℃; for 5h; | 80.1% |
Conditions | Yield |
---|---|
In melt Reaction of SbCl3 melt with NOCl to give SbCl5; | 80% |
With chlorine In melt Reaction of SbCl3 melt with a mixt. of NOCl and Cl2 to give SbCl5; |
Conditions | Yield |
---|---|
In dichloromethane byproducts: CO; under N2; addn. of soln. of ClNO in CH2Cl2 to a soln. of Mn-complex at room temp., reaction monitored by IR; filtration, evapn., product: brown oil.; | 80% |
tricarbonylbis(triphenylphosphine)ruthenium(0)
nitrosylchloride
A
dicarbonyldichlorobis(triphenylphosphine)ruthenium(II)
Conditions | Yield |
---|---|
In methanol; dichloromethane addn. of NOCl soln. to Ru complex soln.; addn. of hot methanol; vigorously stirring; pptn.; centrifuging; washing (methanol, ether); drying (vac.); keeping centrifugate, 3-4h; pptn.; centrifuging; washing (methanol, ether); drying (vac.); elem. anal.; | A 10% B 80% |
Ni(1,2-bis(diphenylphosphanyl)-benzene)Cl2
nitrosylchloride
trichloro(o-phenylenebis(diphenylphosphine))nickel(III)
Conditions | Yield |
---|---|
In dichloromethane excess NOCl slowly carried in stream dry N2 through 0°C trap containing stirred soln. (Ni(o-C6H4(PPh2)2)Cl) in CH2Cl2; solvent volume reduced, cyclohexane added with stirring, mixt. cooled overnight at -20°C, product filtered off, rinsed with CCl4 and dried; elem. anal.; | 80% |
2,3,7,8,12,13,17,18-octaethyl-21H,23H-porphine ruthenium(II) carbonyl
nitrosylchloride
4-flourophenylmagnesium bromide
Conditions | Yield |
---|---|
In tetrahydrofuran; dichloromethane byproducts: CO; under Ar or N2, standard Schlenk technique; NOCl added to a soln. of Ru complex in CH2Cl2; stirred for 20 min; evapd.; suspended in THF; excess of Grignard reagent in THF added; reaction was complete within 20 min (IR monitoring); evapd., redissolved in CH2Cl2, filtered and evapd. under inert atmosphere; elem. anal.; single crystal X-ray diffraction; | 78% |
n-butyllithium
1-methyl-o-carborane
nitrosylchloride
A
1-methyl-2-nitroso-ortho-carborane
B
bis(2-methyl-ortho-carboranyl)amine
Conditions | Yield |
---|---|
In diethyl ether; pentane (N2); hexane soln. of n-BuLi added to Et2O/pentane soln. of carborane deriv.; lithio-carborane deriv. soln. added dropwise to ClNO soln. at -117°C during 35 min; allowed to reach room temp. during 3 h; added in small portions to aq. KHCO3; organic layer dild. with Et2O; washed with H2O; dried and evapd; nitroso deriv. sublimed out; residue triturated with MeOH; elem. anal.; | A 77% B 22% |
Conditions | Yield |
---|---|
In neat (no solvent) under Ar; ClNO vac. transferred to VCl4; warmed slowly to room temp.; volatiles sublimed onto sublimation probe by heating to 50°C under vac.; crystals obtained; elem. anal.; | 76% |
[Pt(o-OC6H4CHNOH)2]
nitrosylchloride
trans-(N,N)-[PtCl2(o-OC6H4CHNOH)2]
Conditions | Yield |
---|---|
In tetrachloromethane; chloroform NOCl passed through soln. of complex in CHCl3/CCl4 for 20 min at 5°C; solvent evapd. at 14-18°C, filtered, washed with acetone/CCl4, then with Et2O, dried at room temp. in vac.-desiccator over CaCl2, elem. anal.; | 73% |
Product Name: Nitrosyl chloride (CAS NO.2696-92-6)
Molecular Formula: ClNO
Molecular Weight: 65.4591g/mol
Mol File: 2696-92-6.mol
EINECS: 220-273-1
Density: 1.54 g/cm3
Surface Tension: 42.6 dyne/cm
Enthalpy of Vaporization: 25.78 kJ/mol
Vapour Pressure: 2180 mmHg at 25°C
XLogP3-AA: 0.7
H-Bond Donor: 0
H-Bond Acceptor: 2
Structure Descriptors of Nitrosyl chloride (CAS NO.2696-92-6):
IUPAC Name: nitrosyl chloride
Canonical SMILES: N(=O)Cl
InChI: InChI=1S/ClNO/c1-2-3
InChIKey: VPCDQGACGWYTMC-UHFFFAOYSA-N
NOCl can be prepared by the direct combination of chlorine and nitric oxide. Alternatively, nitrosylsulfuric acid and HCl also affords the compound:
HCl + NOHSO4 → NOCl + H2SO4
It also arises from the combination of hydrochloric and nitric acids according to the following reaction:
HNO3 + 3 HCl → Cl2 + 2 H2O + NOCl
Although this mixture was used for dissolving gold for a long time the first description of the gas was done by Edmund Davy in 1831.
Reported in EPA TSCA Inventory.
Poison by inhalation and ingestion. A corrosive irritant to skin, eyes, and mucous membranes. Inhalation may cause pulmonary edema and hemorrhage. Potentially explosive reaction with acetone + platinum. Mixtures with hydrogen + oxygen ignite spontaneously. When heated to decomposition it emits very toxic fumes of Cl− and NOx.
Safety Information of Nitrosyl chloride (CAS NO.2696-92-6):
Hazard Codes: C,T
RIDADR: 1069
Hazard Note: Toxic/Corrosive
HazardClass: 2.3
DOT Classification: 2.3; Label: Poison Gas, Corrosive
Nitrosyl chloride , its CAS NO. is 2696-92-6, the synonyms are EINECS 220-273-1 ; HSDB 849 ; Nitrogen chloride oxide (nocl) ; Nitrogen oxychloride (NOCl) ; Nitrosonium chloride ; Nitrosyl chloride ((NO)Cl) .
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