manganese
Conditions | Yield |
---|---|
byproducts: bibenzyl; flash vacuum pyrolysis at 350°C and 0.1 torr; | 98% |
Conditions | Yield |
---|---|
In tetrahydrofuran byproducts: KCl, C16H22; to slurry of MnCl2 (1.71 mmol) in THF at -78°C added (dmCh)K (3.42 mmol) from solid addn. funnel over 3 h (alternativly, THF soln. of (dmCh)K added dropwise over 3 h), stirred for 4 h, allowed to warm to 25°C, stirred addnl. for 12 h; THF removed, pentane added, filtered, pentane removed; | A n/a B 15% |
manganese
Conditions | Yield |
---|---|
With aluminium | |
With silicon In neat (no solvent) Electric Arc; redn. with Si in carbon electric arc;; |
Conditions | Yield |
---|---|
byproducts: N2, NaCl; vac., heating in ampoule (300-400°C); cooling, washing (MeOH), drying (vac.), powder XRD, FT IR; |
manganese
Conditions | Yield |
---|---|
With NH4SCN; H3BO3; KCl In water Electrochem. Process; under N2; Mn electrodeposited from soln. of MnCl2*4H2O, H3BO3, KCl, and NH4SCN; pH 5.0, at -2.0 - -0.7 V for 180 min; |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: CO; isothermal react. under Ar, mixing of stoich. amts. of MnO and C, placing in an alumina crucible in a tube furnace, heating to 1350°C for 80 min; effects of gangue components on the reduction is studied; determination by X-ray diffraction and EDAX; |
manganese
Conditions | Yield |
---|---|
With (NH4)2SO4 In not given Electrochem. Process; electrodeposited at pH 8.0; 20-25°C; 4 A/dm**2; no agitation; |
Conditions | Yield |
---|---|
byproducts: CO; at 1400-1550°C; |
manganese
Conditions | Yield |
---|---|
With sodium In neat (no solvent) redn. with Na at 25 °C;; | |
With aluminium In neat (no solvent) heating in a vessel (coated with CaO or MgO) in presence of cryolite or CaF2;; | |
With beryllium byproducts: BeO; redn. with Be at 25-1280 °C;; |
Conditions | Yield |
---|---|
Kinetics; byproducts: Al2O3; at 1800°K; |
Conditions | Yield |
---|---|
at min. 1300°C; |
Conditions | Yield |
---|---|
In melt Kinetics; melting ferruginous phosphate slag, temp. 1720 - 1870 K; |
manganese
Conditions | Yield |
---|---|
With pyrographite In neat (no solvent) redn. with graphite in presence of Fe;; | |
reduction using alkali oxides as catalysts; |
Conditions | Yield |
---|---|
In neat (no solvent) Electric Arc; react. in electric arc using carbon-electrodes with 5 wt.-% Mn3O4;; |
manganese
Conditions | Yield |
---|---|
at 700-800°C; | |
at 700-800°C; |
Conditions | Yield |
---|---|
reaction at low temperatures;; | |
reaction at low temperatures;; |
Conditions | Yield |
---|---|
In ammonia formed Mn is chemically very active; | |
In ammonia NH3 (liquid); formed Mn is chemically very active; |
Conditions | Yield |
---|---|
With Mn oxide In neat (no solvent) thermite process; exclusion of air; mixture of finely dispersed Al and metal oxide is locally ignited by ignition mixture; strong evolution of heat;; mixture of molten Al2O3 and metal obtained;; | |
With Mn oxide In neat (no solvent) thermite process; exclusion of air; mixture of finely dispersed Al and metal oxide is locally ignited by ignition mixture; strong evolution of heat;; mixture of molten Al2O3 and metal obtained;; |
Conditions | Yield |
---|---|
In neat (no solvent) water-free MnCl2 reacts with molten Al; AlCl3 sublimes;; Al-Mn alloy obtained;; | |
In neat (no solvent) water-free MnCl2 reacts with molten Al; AlCl3 sublimes;; Al-Mn alloy obtained;; |
Conditions | Yield |
---|---|
With ammonium In water byproducts: H2; Electrolysis; | |
With NH4(1+) In water byproducts: H2; Electrolysis; |
Conditions | Yield |
---|---|
With pyrographite In neat (no solvent) Electric Arc; react. in carbon-arc (d.c.);; detected by X-ray;; |
Conditions | Yield |
---|---|
With ammonium sulfate; carbon dioxide; ammonia In water Electrolysis; reacting MnO2 with NH3 and CO2 to Mn-amidocarbonate, then electrolysis; pH:8; | |
With aluminium In neat (no solvent) byproducts: Al2O3; redn. with Al in N2 or Ar (up to 150 atm);; | |
With carbon monoxide |
manganese
Conditions | Yield |
---|---|
byproducts: SiO2; Electric Arc; using electric arc at 1000°C; | |
With carbon monoxide; hydrogen |
Conditions | Yield |
---|---|
In neat (no solvent) heating to 338 °C;; | |
In neat (no solvent) heating to 300-390 °C;; | |
byproducts: C, CO, CO2, CH4, H2; at 338°C; | |
In neat (no solvent) heating to 300-390 °C;; | |
In neat (no solvent) heating to 338 °C;; |
manganese
Conditions | Yield |
---|---|
With NH4 formiate Electrolysis; current density 25 A/dm2; with H2SeO3 additive; | |
In water Electrolysis; in the presence of H2SeO3, pH=5-7.5 at 5-50°C with Cu and Al cathode; | |
In water Electrolysis; | |
In water Electrolysis; |
Conditions | Yield |
---|---|
In water Electrolysis; | |
In water Electrolysis; |
manganese
Conditions | Yield |
---|---|
With hydrogen In neat (no solvent) redn. of MnWO4 with H2 at 950-1113 °C;; |
manganese(II) acetate
manganese
Conditions | Yield |
---|---|
thermic decompn.; product: powder; | |
thermic decompn.; product: powder; |
Conditions | Yield |
---|---|
With ammonium In water byproducts: H2; Electrolysis; | |
With NH4(1+) In water byproducts: H2; Electrolysis; |
manganese
lithium
copper
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) (inert gas), mixed, heated to 500°C for 24 h, stayed at 500°C for 2 days, heated to 800°C for 2 days, held at 800°C for 10 days; slowly cooled to room temp., elem. anal., XRD; | 100% |
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) (inert gas), mixed, heated to 500°C for 24 h, stayed at 500°C for 2 days, heated to 800°C for 2 days, held at 800°C for 10 days; slowly cooled to room temp., elem. anal., XRD; | 100% |
manganese
sodium
copper
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) (inert gas), mixed, heated to 500°C for 24 h, stayed at 500°C for 2 days, heated to 800°C for 2 days, held at 800°C for 10 days; slowly cooled to room temp., elem. anal., XRD; | 100% |
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) (inert gas), mixed, heated to 500°C for 24 h, stayed at 500°C for 2 days, heated to 800°C for 2 days, held at 800°C for 10 days; slowly cooled to room temp., elem. anal., XRD; | 100% |
Conditions | Yield |
---|---|
With tin at 999.84℃; for 36h; Glovebox; Inert atmosphere; | 100% |
In further solvent(s) Sn, Eu, Mn, and Sb layered into an alumina crucible, placed into a fusedsilica tube with a 2-nd crucible filled with SiO2 wood placed on top, s ealed under Ar, heated slowly to 500°C, allowed to dwell for 1 h,heated slowly to 1100°C,; the react. vessel slowly cooled to 600°C, removed, inverted, placed into a centrifuge, spun for 1 min at 6500 rpm; | |
In further solvent(s) Sn, Eu, Mn, and Sb placed in a graphite tube, vac.-sealed in a fused silica tube, heated to 1000°C slowly, held at 1000°C for 24 h, cooled to 550°C slowly, held at 550°C for 4 d, cooled toroom temp. slowly; |
Conditions | Yield |
---|---|
In neat (no solvent) stoich. react. Mn, Th, and Te at 1000°C; | 100% |
Conditions | Yield |
---|---|
In trifluoroacetic acid byproducts: H2; N2; addn. of CF3COOH to Mn-powder; stirring for 3-4 h at room temp.; filtration; dried in vac.; elem. anal.; | 100% |
Conditions | Yield |
---|---|
Stage #1: bismuth; manganese; Yb for 1h; Milling; Inert atmosphere; Stage #2: at 1125 - 1225℃; for 96h; Inert atmosphere; Sealed tube; | 100% |
Conditions | Yield |
---|---|
In further solvent(s) under Ar atm. using Schlenk techniques; metal powder, thiourea (excess),4-methylpyridine refluxed overnight, soln. cooled to room temp.; soln. left undisturbed for 4 wks; soln. filtered (Celite); layered (hexane); crystn.; | 99% |
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) solid state synthesis; mixt. of Fe, Mn, C pelletized; heated in evacuated quartz tube at 1030°C for 24 h; quneched in ice water; detn. by XRD; | 99% |
Conditions | Yield |
---|---|
With I2 In further solvent(s) N2-atmosphere; stirring in N-methylimidazole (12 h); Et2O addn. (crystn.); elem. anal.; | 98% |
manganese
Conditions | Yield |
---|---|
In N,N-dimethyl-formamide according to O. Herrmann, S.H. Mehdi, A. Corsini, Can. J. Chem. 56 (1978) 1084; | 98% |
Conditions | Yield |
---|---|
With sodium bromide In 2-ethoxy-ethanol; ethanol Electrochem. Process; Mn anode, stainless steel cathode, 55 to 60°C, 5.1-6.0 A/dm, 32-35 V; reaction mixture storing in inert atmosphere (2 d), soln. repeatedly decanting, residue drying (water jet pump, 25 to 30°C, 12-13 h); elem. anal.; | 97.5% |
manganese
5-Hydroxy-2,2-dimethyl-3,4-dihydro-2H-<1>benzopyran
palladium
Conditions | Yield |
---|---|
97% |
Conditions | Yield |
---|---|
In melt Electric arc; Inert atmosphere; | A 97% B n/a |
manganese
2,3,6-trimethylphenol
silver
palladium
2,3,6-trimethylcyclohexylamine
Conditions | Yield |
---|---|
With ammonia | 96% |
Conditions | Yield |
---|---|
With tert-butylammonium hexafluorophosphate(V) In acetylacetone Electrochem. Process; tetra-n-butylammonium hexafluorophosphate added to dry acetylacetone, Mnelectrode; evapn. under vac., residue washed twice with hexane and twice with petroleum ether; | 95.1% |
treating of Mn (purity 99.7%) 4 molar HNO3 for 1h at room temp., addn. of acetylacetone in presence of N2 for 5h 30.2 degree.C; | |
treating of Mn (purity 99.7%) 4 molar HNO3 for 1h at room temp., addn. of acetylacetone in presence of N2 for 5h 30.2 degree.C; |
manganese
manganese(II) acetate
Conditions | Yield |
---|---|
With acetic acid In acetonitrile Electrolysis; 4.5 h, initial voltage 50 V; | 95% |
Conditions | Yield |
---|---|
In melt melting the starting materials in an evacuated silica ampoule at 900°C for 48 h, cracking the ampoule under Ar; | 95% |
In neat (no solvent) byproducts: Zn; (vac.); stoich. amounts; heated at 800°C for 24 h; |
Conditions | Yield |
---|---|
With ethylamine In water High Pressure; heating at 130°C for 6 days; filtration, washing (dry EtOH); | 95% |
manganese
Conditions | Yield |
---|---|
With ammonium hexafluorophosphate In water Mn addn. to org.-compd. soln., reflux (1-2 h); filtration, solvent removal (vac.), recrystallization (acetonitrile/MeOH), pptn. from water with NH4PF6, ion exchange (Amberlite CG 400 Cl(-) form); elem. anal.; | 95% |
1-methyl-1H-imidazole
manganese
sulfur
{Mn(N-methylimidazole)6}S8
Conditions | Yield |
---|---|
In further solvent(s) N2-atmosphere; stirring in N-methylimidazole (9 days, room temp. or 12 h, 90°C); decantation, layering with Et2O, washing (Et2O), drying (vac.); elem. anal.; | 95% |
manganese
2,5-diaminoterephthalic acid
N,N-dimethyl-formamide
Conditions | Yield |
---|---|
Stage #1: 2,5-diaminoterephthalic acid; N,N-dimethyl-formamide With sodium nitrate In water for 1h; Sonication; Stage #2: manganese at 20 - 22℃; under 760.051 Torr; for 2h; Time; Electrochemical reaction; | 93% |
manganese
2-amino-6-chlorophenyl-isopropylsulfane
3-amino-2-isopropylthiobenzonitrile
Conditions | Yield |
---|---|
With potassium cyanide In N-methyl-acetamide | 90% |
Conditions | Yield |
---|---|
In water High Pressure; hydrothermal synthesis; ratio Mn/Sb/S=2:2:5, heating for 5 d at 130°C; | 90% |
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) in evac. sealed tube at 690°C; | A 10% B 90% |
In neat (no solvent) on slow heating (inhibition of violent react.) stoichiometric amts. of elements in evacuated vessel for 20 up to 50 h at 700 up to 800°C; due to chemical attack against Vycor glass or quartz walls at higher temps. tubes with two walls are used;; simultaneous formation of MnTe2;; | |
In neat (no solvent) on heating stoichiometric amts. of elements in evacuated vessel for 20 up to 50 h at 700 up to 800°C;; simultaneous formation of MnTe2;; | |
In neat (no solvent) on slow heating (inhibition of violent react.) stoichiometric amts. of elements in evacuated vessel for 20 up to 50 h at 700 up to 800°C; due to chemical attack against Vycor glass or quartz walls at higher temps. tubes with two walls are used;; simultaneous formation of MnTe2;; | |
In neat (no solvent) on slow heating (inhibition of violent react.) stoichiometric amts. of elements in evacuated vessel;; simultaneous formation of MnTe2;; |
manganese
Conditions | Yield |
---|---|
In neat (no solvent) (N2); heating mixt. of manganese compds. at 80°C for 3 d in evacuated vessel; collecting crystals, elem. anal.; | 90% |
Conditions | Yield |
---|---|
at 20 - 1120℃; for 2h; | 90% |
manganese
Conditions | Yield |
---|---|
With tetraethylammonium perchlorate In acetonitrile Electrolysis; Electrochemical reaction; | 88% |
Manganese and its compounds are on the Community Right-To-Know List. Reported in EPA TSCA Inventory.
OSHA PEL: Fume: TWA 1 mg/m3; STEL 3 mg/m3; Compounds: CL 5 mg/m3
ACGIH TLV: Fume: 1 mg/m3; STEL 3 mg/m3; Dust and Compounds: TWA 5 mg/m3; (Proposed: TWA 0.2 mg/m3)
DFG MAK: 0.5 mg/m3
For occupational chemical analysis use OSHA: #ID-125G or NIOSH: Elements (ICP), 7300.
The Manganese is an organic compound with the formula Mn. With the CAS registry number 7439-96-5, the IUPAC name of this chemical is manganese. The product's categories are Inorganics; AAS; AAS CRMsAlphabetic; AASSpectroscopy; Application CRMs; M; MA - MDSpectroscopy; Matrix Selection; Nitrate; Spectroscopy; ICP CRMsAlphabetic; ICP-OES/-MS; ICPSpectroscopy; Manganese; Metal and Ceramic Science; Metals; AA Standard SolutionsAlphabetic; NitrateSpectroscopy; Reference/Calibration Standards; Single Solution; Standard Solutions; Catalysis and Inorganic Chemistry; Chemical Synthesis; ManganeseMetal and Ceramic Science. Besides, it should be stored in a cool dry and well-ventilated place.
Preparation: this chemical can be prepared by Manganese carbonate and sulfuric acid.
Uses of Manganese: it is a metal with important industrial metal alloy uses, particularly in stainless steels. Manganese(II) ions function as cofactors for a number of enzymes in higher organisms, where they are essential in detoxification of superoxide free radicals. The element is a required trace mineral for all known living organisms. In larger amounts, and apparently with far greater activity by inhalation, manganese can cause a poisoning syndrome in mammals, with neurological damage which is sometimes irreversible.
When you are using this chemical, please be cautious about it as the following:
It is highly flammable and toxic by inhalation, in contact with skin and if swallowed. Please take off immediately all contaminated clothing. It contacts with water liberates extremely flammable gases and can cause burns. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. Besides, this chemical is irritating to to eyes and skin. When you are using it, wear suitable gloves and eye/face protection. In case of accident or if you feel unwell seek medical advice immediately (show the label where possible).
You can still convert the following datas into molecular structure:
(1)SMILES: [Mn]
(2)InChI: InChI=1/Mn
(3)InChIKey: PWHULOQIROXLJO-UHFFFAOYAG
(4)Std. InChI: InChI=1S/Mn
(5)Std. InChIKey: PWHULOQIROXLJO-UHFFFAOYSA-N
The toxicity data is as follows:
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
man | TCLo | inhalation | 2300ug/m3 (2.3mg/m3) | BRAIN AND COVERINGS: OTHER DEGENERATIVE CHANGES BEHAVIORAL: CHANGES IN MOTOR ACTIVITY (SPECIFIC ASSAY) BEHAVIORAL: MUSCLE WEAKNESS | American Industrial Hygiene Association Journal. Vol. 27, Pg. 454, 1966. |
rat | LD50 | oral | 9gm/kg (9000mg/kg) | "Sbornik Vysledku Toxixologickeho Vysetreni Latek A Pripravku," Marhold, J.V., Institut Pro Vychovu Vedoucicn Pracovniku Chemickeho Prumyclu Praha, Czechoslovakia, 1972Vol. -, Pg. 21, 1972. |
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