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Conditions | Yield |
---|---|
In neat (no solvent) slight excess over the stoich. amt. of COF2 required; reaction mixt. heated in a stainless steel or monel cylinder at 210°C for 46 h; | A 100% B n/a |
Conditions | Yield |
---|---|
300 °C; | A 90% B n/a |
300 °C; | A 90% B n/a |
300 °C; | A 90% B n/a |
tantalum pentafluoride
Conditions | Yield |
---|---|
2 h at 1000 °C; | 70% |
2 h at 1000 °C; | 70% |
Conditions | Yield |
---|---|
In melt placing of mixt. of Ta with SnF2 (molar ratio SnF2:Ta=1.46) in Fluoroplast-4 ampule, closing by screwed stopper, exposition for 1.00 h at 240°C; various product ratio yields for various conditions; cooling, stirring up in water, collection, drying; | A 9.2% B n/a |
Conditions | Yield |
---|---|
In neat (no solvent) at ambient temp.;; | |
heating in quartz vessel; excess ClF3 is washed out by liq. HF; | |
In neat (no solvent) reaction with formation of heat;; | |
In neat (no solvent) reaction with formation of heat;; | |
heating in quartz vessel; excess ClF3 is washed out by liq. HF; |
Conditions | Yield |
---|---|
Kinetics; 473-593 K, 0.1-0.3 atm of HF; | |
In water byproducts: H2; concd. HF;; |
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In water byproducts: Pt; In presence of H2PtCl6 complete reaction at ambient temp. within a few minutes; H2PtCl6 is reduced to form Pt;; | A >99 B n/a |
Conditions | Yield |
---|---|
in a quartz system; | |
in monel or Ni tube at about 300 °C; sepn. of products by cooling, then purifn. by sublimation; | |
In gaseous matrix Ta was reacted with F2 at 230-1200°C in Ar matrix; monitored by IR; |
Conditions | Yield |
---|---|
200 to 500°C; |
hydrogen fluoride
tantalum pentachloride
A
hydrogenchloride
B
tantalum pentafluoride
Conditions | Yield |
---|---|
In hydrogen fluoride in 3% hydrofluoric acid for 4 min.; | |
In hydrogen fluoride aq. HF; in 3% hydrofluoric acid for 4 min.; |
Conditions | Yield |
---|---|
Kinetics; 200 to 500°C; |
Conditions | Yield |
---|---|
315°C; 15 h; | >99 |
315°C; 15 h; | >99 |
Conditions | Yield |
---|---|
excess AsF3; |
Conditions | Yield |
---|---|
dark red heat; | |
dark red heat; |
Conditions | Yield |
---|---|
In neat (no solvent) powdered metal treated with XeF2 (air-tight autoclave, 200-300°C); |
Conditions | Yield |
---|---|
slight warming;; | |
slight warming;; |
Conditions | Yield |
---|---|
In further solvent(s) in cooled bromine, then heating; |
BrF2(1+)*TaF6(1-)=(BrF2)TaF6
A
tantalum pentafluoride
B
bromine trifluoride
Conditions | Yield |
---|---|
heating in vac.; |
tantalum pentafluoride
Conditions | Yield |
---|---|
heating in dry O2; |
tantalum pentafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: NH4F; heating on top of a pt-sheet;; | |
In neat (no solvent) byproducts: NH4F; heating on top of a pt-sheet;; |
Conditions | Yield |
---|---|
78 °C; | |
78 °C; |
B
tantalum pentafluoride
Conditions | Yield |
---|---|
In neat (no solvent) heating in a stream of dry air at 1000 °C;; | A >99 B n/a |
In neat (no solvent) heating in a stream of dry air at 1000 °C;; | A >99 B n/a |
Conditions | Yield |
---|---|
850 °C in Ar stream; |
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) slow decompn. at room temp.; mass-spectroscopy; |
tantalum pentafluoride
Conditions | Yield |
---|---|
With tetrafluoroethylene-vinylidene fluoride copolymer In neat (no solvent) mechanical mixt. of metal and fluoropolymer (molar ratio 1:5-6) prepd. by hot pressing on press with heating plates; heated to 423 K; load of 20MPa was applied for 5 min; cooled to 353 K; load was removed; mixt. was withdrawn or heated to 673 K; MS; TG; DSC; |
tantalum pentafluoride
hydrogen bromide
Conditions | Yield |
---|---|
With diethyl ether In diethyl ether a calcd. amt. of TaF5 was added to a soln. of HBr in ether (saturated at 0°C) under N2; the reaction vessel was left at room temp. for several hours;; after sepn. of two upper layers from the bottom layer, the solvent was pumped off from the latter at 5 Torr and 25°C within 40 min; elem.anal.;; | 85% |
Conditions | Yield |
---|---|
In dichloromethane at 20℃; for 5 - 10h; Inert atmosphere; Schlenk technique; | 85% |
tantalum pentafluoride
triphenylarsineoxide
[TaF5(OAs(phenyl)3)]
Conditions | Yield |
---|---|
In dichloromethane for 0.333333h; Inert atmosphere; Schlenk technique; | 85% |
tantalum pentafluoride
ortho-phenylenebis(dimethylarsine)
[TaF4{o-C6H4(AsMe2)2}2][TaF6]
Conditions | Yield |
---|---|
In acetonitrile for 1.33333h; Inert atmosphere; Schlenk technique; | 85% |
tantalum pentafluoride
1,3-bis-(2,6-diisopropylphenyl)-imidazol-2-ylidene
Conditions | Yield |
---|---|
In toluene at 20℃; for 14h; Glovebox; Schlenk technique; Inert atmosphere; | 83.6% |
1,10-Phenanthroline
tantalum pentafluoride
[TaF4(1,10-phenanthroline)2][TaF6]
Conditions | Yield |
---|---|
In dichloromethane Inert atmosphere; Schlenk technique; | 83% |
tantalum pentafluoride
1,2-bis(dimethylphosphanyl)ethane
[TaF4{Me2P(CH2)2PMe2}2][TaF6]
Conditions | Yield |
---|---|
In acetonitrile for 1h; Inert atmosphere; Schlenk technique; | 83% |
Conditions | Yield |
---|---|
In hydrogen fluoride aq. HF; TaF5 in aq. 45% HF added to soln. of crown ether; stored at 20-25°C in exsiccator for a low evapn. of solvent over several days; | 82% |
tantalum pentafluoride
(TaF5)2[μ-κ2-1,4-(OMe)2-2,5-C6H2F2]
Conditions | Yield |
---|---|
In dichloromethane under Ar using standard Schlenk techniques; TaF5 (0.50 mmol) added to stirred soln. of 1,4-(OMe)2-2,5-C6H2F2 (0.25 mmol); stirred (4 h); crystd. from CH2Cl2/pentane (-20°C); elem. anal.; | 82% |
tantalum pentafluoride
Conditions | Yield |
---|---|
In dichloromethane-d2 for 0.5h; Schlenk technique; Inert atmosphere; | 82% |
Conditions | Yield |
---|---|
In dichloromethane Inert atmosphere; Schlenk technique; | 81% |
In dichloromethane (N2); triphenylphosphine oxide added to a soln. of TaF5 in equimolar ratio; evapd.; washed with toluene; dried; elem. anal.; | |
In toluene (N2); triphenylphosphine oxide added to a soln. of TaF5 in equimolar ratio; cooled to room temp.; pptd.; separated; washed with toluene; dried; elem. anal.; | |
In acetonitrile (N2); triphenylphosphine oxide added to a soln. of TaF5 in equimolar ratio; evapd.; washed with toluene; dried; elem. anal.; |
Conditions | Yield |
---|---|
In dichloromethane (Ar); suspension of TaF5 in CH2Cl2 treated with CH2ClCOOH; stirred for 30 min; layered with pentane; 12 h; elem. anal.; | 81% |
Conditions | Yield |
---|---|
In dichloromethane at 20℃; for 5 - 10h; Inert atmosphere; Schlenk technique; | 81% |
Conditions | Yield |
---|---|
In tetrahydrofuran; dichloromethane (Ar); std. Schlenk technique; suspn. of TaF5 in CH2Cl2 was treated with THF (0.5 equiv.); mixt. was stirred at room temp. for 30 min; filtered; dried (vac.); crystd. (CH2Cl2/pentane, -30°C); elem. anal.; | 79% |
In dichloromethane-d2 Ar, a large excess of THF aded to a suspn., reacted for 1 min; not isolated, detected by NMR; | |
In tetrahydrofuran; chloroform (Ar); std. Schlenk technique; suspn. of TaF5 in CHCl3 was treated with THF (2 equiv.); mixt. was refluxed; |
Conditions | Yield |
---|---|
In dichloromethane under Ar using standard Schlenk techniques; suspn. of TaF5 (0.60 mmol) treated with 1,2-dimethoxybenzene (0.60 mmol); stirred (2 h); filtered; dried (vac.); solvent removed; elem. anal.; | 79% |
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