Conditions | Yield |
---|---|
In neat (no solvent) slight excess over the stoich. amt. of COF2 required; reaction mixt. heated in a stainless steel or monel cylinder at 210°C for 46 h; | A 100% B n/a |
Conditions | Yield |
---|---|
300 °C; | A 90% B n/a |
300 °C; | A 90% B n/a |
300 °C; | A 90% B n/a |
tantalum pentafluoride
Conditions | Yield |
---|---|
2 h at 1000 °C; | 70% |
2 h at 1000 °C; | 70% |
Conditions | Yield |
---|---|
In melt placing of mixt. of Ta with SnF2 (molar ratio SnF2:Ta=1.46) in Fluoroplast-4 ampule, closing by screwed stopper, exposition for 1.00 h at 240°C; various product ratio yields for various conditions; cooling, stirring up in water, collection, drying; | A 9.2% B n/a |
Conditions | Yield |
---|---|
In neat (no solvent) at ambient temp.;; | |
heating in quartz vessel; excess ClF3 is washed out by liq. HF; | |
In neat (no solvent) reaction with formation of heat;; | |
In neat (no solvent) reaction with formation of heat;; | |
heating in quartz vessel; excess ClF3 is washed out by liq. HF; |
Conditions | Yield |
---|---|
Kinetics; 473-593 K, 0.1-0.3 atm of HF; | |
In water byproducts: H2; concd. HF;; |
Conditions | Yield |
---|---|
With dihydrogen hexachloroplatinate In water byproducts: Pt; In presence of H2PtCl6 complete reaction at ambient temp. within a few minutes; H2PtCl6 is reduced to form Pt;; | A >99 B n/a |
Conditions | Yield |
---|---|
in a quartz system; | |
in monel or Ni tube at about 300 °C; sepn. of products by cooling, then purifn. by sublimation; | |
In gaseous matrix Ta was reacted with F2 at 230-1200°C in Ar matrix; monitored by IR; |
Conditions | Yield |
---|---|
200 to 500°C; |
hydrogen fluoride
tantalum pentachloride
A
hydrogenchloride
B
tantalum pentafluoride
Conditions | Yield |
---|---|
In hydrogen fluoride in 3% hydrofluoric acid for 4 min.; | |
In hydrogen fluoride aq. HF; in 3% hydrofluoric acid for 4 min.; |
Conditions | Yield |
---|---|
Kinetics; 200 to 500°C; |
Conditions | Yield |
---|---|
315°C; 15 h; | >99 |
315°C; 15 h; | >99 |
Conditions | Yield |
---|---|
excess AsF3; |
Conditions | Yield |
---|---|
dark red heat; | |
dark red heat; |
Conditions | Yield |
---|---|
In neat (no solvent) powdered metal treated with XeF2 (air-tight autoclave, 200-300°C); |
Conditions | Yield |
---|---|
slight warming;; | |
slight warming;; |
Conditions | Yield |
---|---|
In further solvent(s) in cooled bromine, then heating; |
BrF2(1+)*TaF6(1-)=(BrF2)TaF6
A
tantalum pentafluoride
B
bromine trifluoride
Conditions | Yield |
---|---|
heating in vac.; |
tantalum pentafluoride
Conditions | Yield |
---|---|
heating in dry O2; |
tantalum pentafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: NH4F; heating on top of a pt-sheet;; | |
In neat (no solvent) byproducts: NH4F; heating on top of a pt-sheet;; |
Conditions | Yield |
---|---|
78 °C; | |
78 °C; |
B
tantalum pentafluoride
Conditions | Yield |
---|---|
In neat (no solvent) heating in a stream of dry air at 1000 °C;; | A >99 B n/a |
In neat (no solvent) heating in a stream of dry air at 1000 °C;; | A >99 B n/a |
Conditions | Yield |
---|---|
850 °C in Ar stream; |
Conditions | Yield |
---|---|
In neat (no solvent, solid phase) slow decompn. at room temp.; mass-spectroscopy; |
tantalum pentafluoride
Conditions | Yield |
---|---|
With tetrafluoroethylene-vinylidene fluoride copolymer In neat (no solvent) mechanical mixt. of metal and fluoropolymer (molar ratio 1:5-6) prepd. by hot pressing on press with heating plates; heated to 423 K; load of 20MPa was applied for 5 min; cooled to 353 K; load was removed; mixt. was withdrawn or heated to 673 K; MS; TG; DSC; |
tantalum pentafluoride
hydrogen bromide
Conditions | Yield |
---|---|
With diethyl ether In diethyl ether a calcd. amt. of TaF5 was added to a soln. of HBr in ether (saturated at 0°C) under N2; the reaction vessel was left at room temp. for several hours;; after sepn. of two upper layers from the bottom layer, the solvent was pumped off from the latter at 5 Torr and 25°C within 40 min; elem.anal.;; | 85% |
Conditions | Yield |
---|---|
In dichloromethane at 20℃; for 5 - 10h; Inert atmosphere; Schlenk technique; | 85% |
tantalum pentafluoride
triphenylarsineoxide
[TaF5(OAs(phenyl)3)]
Conditions | Yield |
---|---|
In dichloromethane for 0.333333h; Inert atmosphere; Schlenk technique; | 85% |
tantalum pentafluoride
ortho-phenylenebis(dimethylarsine)
[TaF4{o-C6H4(AsMe2)2}2][TaF6]
Conditions | Yield |
---|---|
In acetonitrile for 1.33333h; Inert atmosphere; Schlenk technique; | 85% |
tantalum pentafluoride
1,3-bis-(2,6-diisopropylphenyl)-imidazol-2-ylidene
Conditions | Yield |
---|---|
In toluene at 20℃; for 14h; Glovebox; Schlenk technique; Inert atmosphere; | 83.6% |
1,10-Phenanthroline
tantalum pentafluoride
[TaF4(1,10-phenanthroline)2][TaF6]
Conditions | Yield |
---|---|
In dichloromethane Inert atmosphere; Schlenk technique; | 83% |
tantalum pentafluoride
1,2-bis(dimethylphosphanyl)ethane
[TaF4{Me2P(CH2)2PMe2}2][TaF6]
Conditions | Yield |
---|---|
In acetonitrile for 1h; Inert atmosphere; Schlenk technique; | 83% |
Conditions | Yield |
---|---|
In hydrogen fluoride aq. HF; TaF5 in aq. 45% HF added to soln. of crown ether; stored at 20-25°C in exsiccator for a low evapn. of solvent over several days; | 82% |
tantalum pentafluoride
(TaF5)2[μ-κ2-1,4-(OMe)2-2,5-C6H2F2]
Conditions | Yield |
---|---|
In dichloromethane under Ar using standard Schlenk techniques; TaF5 (0.50 mmol) added to stirred soln. of 1,4-(OMe)2-2,5-C6H2F2 (0.25 mmol); stirred (4 h); crystd. from CH2Cl2/pentane (-20°C); elem. anal.; | 82% |
tantalum pentafluoride
Conditions | Yield |
---|---|
In dichloromethane-d2 for 0.5h; Schlenk technique; Inert atmosphere; | 82% |
Conditions | Yield |
---|---|
In dichloromethane Inert atmosphere; Schlenk technique; | 81% |
In dichloromethane (N2); triphenylphosphine oxide added to a soln. of TaF5 in equimolar ratio; evapd.; washed with toluene; dried; elem. anal.; | |
In toluene (N2); triphenylphosphine oxide added to a soln. of TaF5 in equimolar ratio; cooled to room temp.; pptd.; separated; washed with toluene; dried; elem. anal.; | |
In acetonitrile (N2); triphenylphosphine oxide added to a soln. of TaF5 in equimolar ratio; evapd.; washed with toluene; dried; elem. anal.; |
Conditions | Yield |
---|---|
In dichloromethane (Ar); suspension of TaF5 in CH2Cl2 treated with CH2ClCOOH; stirred for 30 min; layered with pentane; 12 h; elem. anal.; | 81% |
Conditions | Yield |
---|---|
In dichloromethane at 20℃; for 5 - 10h; Inert atmosphere; Schlenk technique; | 81% |
Conditions | Yield |
---|---|
In tetrahydrofuran; dichloromethane (Ar); std. Schlenk technique; suspn. of TaF5 in CH2Cl2 was treated with THF (0.5 equiv.); mixt. was stirred at room temp. for 30 min; filtered; dried (vac.); crystd. (CH2Cl2/pentane, -30°C); elem. anal.; | 79% |
In dichloromethane-d2 Ar, a large excess of THF aded to a suspn., reacted for 1 min; not isolated, detected by NMR; | |
In tetrahydrofuran; chloroform (Ar); std. Schlenk technique; suspn. of TaF5 in CHCl3 was treated with THF (2 equiv.); mixt. was refluxed; |
Conditions | Yield |
---|---|
In dichloromethane under Ar using standard Schlenk techniques; suspn. of TaF5 (0.60 mmol) treated with 1,2-dimethoxybenzene (0.60 mmol); stirred (2 h); filtered; dried (vac.); solvent removed; elem. anal.; | 79% |
Reported in EPA TSCA Inventory.
OSHA PEL: TWA 2.5 mg(F)/m3
ACGIH TLV: TWA 2.5 mg(F)/m3; BEI: 3 mg/g creatinine of fluorides in urine prior to shift; 10 mg/g creatinine of fluorides in urine at end of shift.
NIOSH REL: TWA 2.5 mg(F)/m3
The Tantalum fluoride with CAS registry number of 7783-71-3 is also known as Tantalum(V) fluoride. The IUPAC name is Pentafluorotantalum. It belongs to product categories of Tantalum Salts; Catalysis and Inorganic Chemistry; Chemical Synthesis; Salts; TantalumMetal and Ceramic Science. Its EINECS registry number is 232-022-3. In addition, the formula is F5Ta and the molecular weight is 275.94. This chemical is a white crystalline powder and should be stored in sealed containers in cool and dry place.
Physical properties about Tantalum fluoride are: (1)H-Bond Acceptor: 5; (2)Exact Mass: 275.940012; (3)MonoIsotopic Mass: 275.940012; (4)Heavy Atom Count: 6; (5)Complexity: 37.1; (6)Covalently-Bonded Unit Count: 1.
Preparation of Tantalum fluoride: it is prepared by reaction of tantalum(V) chloride with anhydrous hydrofluoric acid. Solid tantalum pentafluoride is obtained by condensation and filtration separation of the reaction mixture. Then the solid is sublimated in a vacuum to generate product.
TaCl5+5HF→TaF5+5HCl
Uses of Tantalum fluoride: it is used for chemical vapor deposition of tantalum and ion implantation doping. What's more, it is used as organic synthesis catalyst.
When you are using this chemical, please be cautious about it. As a chemical, it may cause burns. During using it, wear suitable protective clothing, gloves and eye/face protection. After contact with skin, take off immediately all contaminated clothing, and wash immediately. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. If accident happens or you feel unwell seek medical advice immediately.
You can still convert the following datas into molecular structure:
1. Canonical SMILES: F[Ta](F)(F)(F)F
2. InChI: InChI=1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5
3. InChIKey: YRGLXIVYESZPLQ-UHFFFAOYSA-I
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