Conditions | Yield |
---|---|
In neat (no solvent) Teflon-valve-equipped standard vacuum line or a nitrogen-filled glovebox;excess B5H9;pentaborane, B2Br4 separately condensed in the reactor, after 20 min at room temp., vessel cooled to -10 ° C,; over course of the following 10 h,all volatile material removed,reactor warmed to room temp.,all volatile material at room temp. were removed,BBr2B5H8 extd. with CH2Cl2, yield:80% on basis of amt. of B2Br4 employed, 86% on basis of unrecovered B5H9; | A 80% B n/a C n/a |
Conditions | Yield |
---|---|
boron is mixed with ca. 9 w % Mg, in H2 atmosphere; | 70% |
In not given kept over liq. Hg for 48 h; distd. (vac., room temp.); | 57.6% |
at red heat; in H2 atmosphere; | 40% |
Conditions | Yield |
---|---|
with excess of BF3; addn. of Al to depress formation of Br2; addn. of Hg to get rid of Br2; | 70% |
with excess of BF3; addn. of Al to depress formation of Br2; addn. of Hg to get rid of Br2; | 70% |
boron tribromide
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: o-CH3C6H4NO2; decompn. reaction immediately; | 50% |
boron tribromide
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: C6H5NO2; decompn. reaction immediately; | 50% |
diboron tetrabromide
tribromofluoromethane
A
closo-B9Br9
B
boron trifluoride
C
boron tribromide
D
diboron tetrafluoride
Conditions | Yield |
---|---|
B2Br4 and CFBr3 were reacted in a NMR-tube at ambient temp. for 3,75 h; products detected by (19)F- and (11)B-NMR, CBr4 by (13)C-NMR; | A 2% B 7% C 2% D 39% |
Conditions | Yield |
---|---|
30% | |
30% |
BBr3*Cl3CCOOC2H5
boron tribromide
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: Cl3CCOOC2H5; decompn. reaction immediately; | 25% |
Conditions | Yield |
---|---|
Vac.-distn. of B2Br4 to CBr4, heating in an oil-bath (96°C, 5.75 h).; Monitored by (11)B-NMR.; | 8.6% |
Conditions | Yield |
---|---|
heating of B2S3 in Br2 vapour; |
Conditions | Yield |
---|---|
250 °C in reaction tube; | |
at 250°C in sealed tube; | |
at 250°C in sealed tube; |
Conditions | Yield |
---|---|
With coal 250°C; fractionated distn.; |
Conditions | Yield |
---|---|
byproducts: CO; glowed B2O3-C mixt. is treated with Br2; |
Conditions | Yield |
---|---|
800-1000°C; |
Conditions | Yield |
---|---|
140 °C, reaction tube; |
Conditions | Yield |
---|---|
0% |
Conditions | Yield |
---|---|
With bromine at 100°C in light; | A >99 B n/a |
With bromine at room temperature in light; | |
With hydrogen bromide; aluminium bromide at 80-90 °C; |
Conditions | Yield |
---|---|
With bromine at moderate temp.; |
boron tribromide
Conditions | Yield |
---|---|
With C2H4Br2 at 250°C in sealed tube; | |
With bromine at 700°C, or at red heat; | |
With C2H4Br2 at 250°C in sealed tube; |
Conditions | Yield |
---|---|
250 °C in reaction tube; |
A
hydrogen cyanide
B
boron tribromide
Conditions | Yield |
---|---|
decompn. by moisture of air; | |
decompn. by moisture of air; |
Conditions | Yield |
---|---|
byproducts: CH3Br; decompn. above 66°C; |
mercury bis(trifluoromethanethiolate)
boron tribromide
tris(trifluoromethylsulfanyl)borane
Conditions | Yield |
---|---|
In further solvent(s) in 2-methylbutane, -196 to +25°C; | 100% |
95% | |
95% |
Conditions | Yield |
---|---|
In diethyl ether (π-C5H5)2ZrCl2/BBr3 (molar ratio: 3:2);; | 100% |
In diethyl ether (π-C5H5)2ZrCl2/BBr3 (molar ratio: 3:2);; | 100% |
nitrido(tetra-tert-butylphthalocyaninato)rhenium(V)
boron tribromide
Conditions | Yield |
---|---|
In dichloromethane addn. of BBr3 to soln. of rhenium complex at 0°C, 0°C (6 h); removement of solvent (vacuum); | 100% |
boron tribromide
Conditions | Yield |
---|---|
In dichloromethane addn. of BBr3 to soln. of rhenium complex at 0°C, 0°C (6 h); removement of solvent (vacuum); | 100% |
Conditions | Yield |
---|---|
In toluene byproducts: MeBBr2; under inert atm.; BBr3 was added dropwise to a toluene soln. of Fe-complex at room temp., the mixt. was stirred at room temp. for 6 h; evapd., hexane was added, filtd., filtrate evapd.; elem. anal.; | 100% |
In benzene-d6 byproducts: MeBBr2; 1 equiv. of BBr3, 20°C, 1 h, inert atm.; not isolated; detd. by (1)H NMR spectroscopy; |
Conditions | Yield |
---|---|
In toluene byproducts: MeBBr2; under inert atm.; BBr3 was added dropwise to a toluene soln. of Fe-complex at room temp., the mixt. was stirred for 24 h at 80°C; evapd., tolyene was added, filtd., filtrate evapd.; elem. anal.; | 100% |
Conditions | Yield |
---|---|
In dichloromethane at 20℃; for 16h; Cooling with ice; | 100% |
Conditions | Yield |
---|---|
Stage #1: 1,3,5-tris(trimethylsilyl)benzene; boron tribromide at 100℃; for 4h; Inert atmosphere; Stage #2: water In hexane at 0℃; | 100% |
Stage #1: 1,3,5-tris(trimethylsilyl)benzene; boron tribromide at 100℃; for 4h; Inert atmosphere; Stage #2: water In hexane at 0℃; | 99% |
Conditions | Yield |
---|---|
In dichloromethane at -40 - 20℃; | 100% |
tris(dimethylamino)borane
boron tribromide
bromobis(dimethylamino)borane
Conditions | Yield |
---|---|
In pentane at -40 - 20℃; for 2h; Inert atmosphere; | 99% |
In pentane at -40°C to -50°C; | 85% |
In pentane at -40°C to -50°C; | 85% |
In pentane -50 - -40°C, 2 mol BBr3; | |
80°C; | >99 |
2,4,6-triethyl-borazine
boron tribromide
A
2,4,6-tribromo-cyclotriborazane
B
Br2(CH3CH2)B3N3H3
Conditions | Yield |
---|---|
In dichloromethane addn. of BBr3 to a stirred soln. of the borazine in CH2Cl2 at -10°C over 1 h, warming to room temp., refluxing for 1 h; filtn., evapn. of volatiles under reduced pressure, sublimation under vacuum (40-50°C bath temp.), elem. anal.; | A n/a B 99% |
tricarbonyl(η6-α-methylbenzyl methyl ether) chromium(0)
boron tribromide
(OC)3CrC6H5CH(CH3)Br
Conditions | Yield |
---|---|
In dichloromethane stirring at -78°C for 1 h, quenching (satd. aq. NaHCO3), warming to room temp.; addn. of H2O, extn. (Et2O), drying (MgSO4), filtration, concn.; | 99% |
bis(benzyl-tert-butylamino)boron fluoride
boron tribromide
{bis(benzyl-tert-butylamino)boron}tetrabromo borate
Conditions | Yield |
---|---|
In dichloromethane react. in dry N2 or in vac. with exclosure of moisture; BBr3 was added to a soln. of the B-compound in CH2Cl2 with stirring at -50°C; the soln. was allowed to warm to 0°C; it was stirred for 15 min at this temp.;; evapd. in vac., volatiles condensed at -196°C; product remains as the residue; elem. anal.;; | 99% |
boron tribromide
dimethyl amine
(bisdimethylamine)dibromoboronium(+1) bromide
Conditions | Yield |
---|---|
In chloroform reaction at -70°C;; | 99% |
In chloroform reaction at -70°C;; | 99% |
In chloroform | >99 |
In chloroform | >99 |
Conditions | Yield |
---|---|
With carbon monoxide; hydrogen In neat (no solvent) A sealed tube contained Os3(CO)12, BBr3 and 630 torr (at -196°C)of 3:1 H2:CO gas mixt. was heated at 150°C for 1 h, cooled;; purified by sublimation at 190°C or by treatment with H2O-CH2Cl2and recrystn. from CH2Cl2; elem. anal.;; | 99% |
(benzyl alcohol)tricarbonylchromium(0)
boron tribromide
[Cr(η6-C6H5CH2Br)(CO)3]
Conditions | Yield |
---|---|
In dichloromethane stirring at -78°C for 1 h, quenching (satd. aq. NaHCO3), warming to room temp.; addn. of H2O, extn. (Et2O), drying (MgSO4), filtration, concn.; | 99% |
In dichloromethane BBr3 in CH2Cl2 was added to a soln. of complex in CH2Cl2 under N2 at -78°C, stirred for 1.5-3 h; satd. aq. NaHCO3 was added, warmed to room temp., H2O was added, the organic layer was sepd., dried over MgSO4, filtered, the solvent was removed under reduced pressure; | 70% |
Conditions | Yield |
---|---|
In hexane byproducts: MeBBr2; under inert atm.; BBr3 was added dropwise to a hexane soln. of Fe-complex at room temp., the mixt. was stirred vigorously for 1 h; evapd., hexane was added, filtd., filtrate evapd.; elem. anal.; | 99% |
In benzene-d6 byproducts: MeBBr2; 1 equiv. of BBr3, 20°C, 0,5 h, inert atm.; not isolated; detd. by (1)H NMR spectroscopy; |
triethylsilane
boron tribromide
Conditions | Yield |
---|---|
In dichloromethane under O2-free Ar; soln. of boronium bromide complex (0.75 mmol) and Et3SiH (2.25 mmol) in CH2Cl2 (5 ml) added dropwise to BBr3 (2.25 mmol) in CH2Cl2 (5 ml) (-78°C); warmed to room temp.; pptd. with n-hexane (5 ml); | 99% |
methanol
boron tribromide
Conditions | Yield |
---|---|
In dichloromethane (Ar or N2); addn. of BBr3 to soln of N,N-diethyl 10-trimethylsilylphenanthren-9-yl-O-carbamate in CH2Cl2 at -78°C, stirring at room temp. overnight, addn. of MeOH; | 99% |
Conditions | Yield |
---|---|
In hexane; toluene (under Ar, Schlenk); soln. of BBr3 in hexane added to soln. of ligand intoluene at ambient temp., stirred overnight; solvent removed under reduced pressure; | 99% |
boron tribromide
Conditions | Yield |
---|---|
In tetrachloromethane Inert atmosphere; | 99% |
Conditions | Yield |
---|---|
Stage #1: C12H9BrFN; boron tribromide In dichloromethane at 20℃; Stage #2: water | 99% |
Conditions | Yield |
---|---|
In hexane; toluene at -30 - 20℃; for 3h; | 99% |
tetraphenylarsonium tetrachloronitridorhenate
boron tribromide
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: BCl3; condensing BBr3 onto the Re-complex in vac.; refluxing for 7 h; evapn. of excess BBr3; drying in vac.; elem. anal.; | 98.5% |
Conditions | Yield |
---|---|
In neat (no solvent) (N2); BBr3 was condensed above Hg compd. in an evacuated tube, mixt. was warmed up to room temp. and stirred for 60 min; identified by (19)F- and (11)B-NMR; | 98% |
1,4,6,9-tetraisopropyl-3,8-diethyl-2,7-bis(diethylboryl)-5-stannaspiro[4.4]nona-1,3,6,8-tetraene
boron tribromide
3,4-diethyl-2,5-diisopropyl-1,6-dibromo-2,3,4,5-tetracarba-nido-hexaborane(6)
Conditions | Yield |
---|---|
In hexane byproducts: EtBBr2, SnBr4; N2-atmosphere; addn. of excess BBr3 to Sn-compd. at -78°C, warming to room temp., stirring for 3 h; filtration, removal of volatiles (vac.), fractional distn.; | 98% |
bis(cyclopentadienyl)hafnium dichloride
boron tribromide
Conditions | Yield |
---|---|
In dichloromethane (π-C5H5)2HfCl2/BBr3 (molar ratio 3:2); inert atm.; 5 min. in CH2Cl2;; | 98% |
In dichloromethane (π-C5H5)2HfCl2/BBr3 (molar ratio 3:2); inert atm.; 5 min. in CH2Cl2;; | 98% |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: BrSi(CH3)3; BBr3 and C6H5Si(CH3)3 mixed under stirring and cooling (room temp.), 60°C, 1h; | 98% |
In dichloromethane byproducts: BrSi(CH3)3; in inert atmosphere, dropwise addn. of trimethylphenylsilane to a stirred soln. of BBr3 at -78°C, stirring (-78°C, 1 h), slow warming to room temp.; evapn. in vac. at 30°C.; | 94% |
In neat (no solvent) (N2); neat BBr3 added by pipette to neat PhSiMe3 in a Schenk flask; placed in 60 °C oil bath for 4.5 h; volatile components removed by vacuum distillation at room temp.; | 94% |
Conditions | Yield |
---|---|
In carbon disulfide (N2); P4Se3 in CS2 was added to soln. of BBr3 in CS2 at room temp.; cooled to -78°C; filtered; dried in vac. at room temp.; | 98% |
1,4,6,9-tetrabutyl-3,8-diethyl-2,7-bis(diethylboryl)-5-stannaspiro[4.4]nona-1,3,6,8-tetraene
boron tribromide
1,6-dibromo-2,5-dibutyl-3,4-diethyl-2,3,4,5-tetracarba-nido-hexaborane(6)
Conditions | Yield |
---|---|
In hexane byproducts: EtBBr2, SnBr4; N2-atmosphere; addn. of excess BBr3 to Sn-compd. at -78°C, warming to room temp., stirring for 3 h; filtration, removal of volatiles (vac.), fractional distn.; | 98% |
MF: BBr3
MW: 250.52
mp : -46 °C(lit.)
bp : -90 °C
density : 2.60 g/mL at 20 °C(lit.)
vapor density : 8.6 (vs air)
vapor pressure : 40 mm Hg ( 14 °C)
Fp : 30 °F
storage temp. : Poison room
color : colorless
Sensitive : Moisture Sensitive
IUPAC Name: tribromoborane
Storage temp: Poison room
Sensitive: Moisture Sensitive
Stability: Stable, but reacts violently with water
Appearance: clear to amber liquid with a pungent odour
Product Categories: Inorganics;Piperazine derivates;Deprotecting Reagents;Others;Protection and Derivatization
Synonyms of Boron tribromide (10294-33-4): BBr3 ; Borane,tribromo- ; Boron,tribromo- ; boronbromide(bbr3) ; tribromo-boran ; tribromoborane ; tribromoboron ; tribromo-Boron
Molecular Structure of Boron tribromide (10294-33-4):
Boron tribromide (10294-33-4) is commercially available and is a strong Lewis acid. It is an excellent demethylating or dealkylating agent for ethers, often in the production of pharmaceuticals. Additionally, it also finds applications in olefin polymerization and in Friedel-Crafts chemistry as a Lewis acid catalyst. The electronics industry uses boron tribromide as a boron source in pre-deposition processes for doping in the manufacture of semiconductors.
Boron tribromide (10294-33-4) is used as intermingle source in semiconductor silicon; extracting high-purity boron and organic boron compound; a source in optical fibre.
The first synthesis was done by M. Poggiale in 1846 by reacting boron trioxide with carbon and bromine at high temperatures:
B2O3 + 3 C + 3 Br2 → 2 BBr3 + 3 CO
An improvement of this method was developed by F. W?hler and Deville in 1857. By starting from amorphous boron the reaction temperatures are lower and no carbon monoxide is produced
2 B + 3 Br2 → 2 BBr3
RTECS#: CAS# 142-82-5: MI7700000
CAS# 10294-33-4: ED7400000
LD50/LC50: RTECS:
CAS# 142-82-5: Inhalation, rat: LC50 = 103 gm/m3/4H;
RTECS:
CAS# 10294-33-4:.
Carcinogenicity: Heptane (n-) - Not listed as a carcinogen by ACGIH, IARC, NTP, or CA Prop 65.
Boron tribromide (10294-33-4) - Not listed as a carcinogen by ACGIH, IARC, NTP, or CA Prop 65.
Other: See actual entry in RTECS for complete information.
Hazard Codes:T+CFN
Risk Statements: 14-26/28-35-40-62-11-67-65-50/53
R14: Reacts violently with water
R26/28: Very toxic by inhalation and if swallowed
R35: Causes severe burns
R40: Limited evidence of a carcinogenic effect
R62: Risk of impaired fertility
R11: Highly flammable
R67: Vapours may cause drowsiness and dizziness
R65: Harmful: may cause lung damage if swallowed
R50/53: Very toxic to aquatic organisms, may cause long-term adverse effects in the aquatic environment
Safety Statements: 9-26-28-36/37/39-45-23-33-16-62-61-60
S9: Keep container in a well-ventilated place
S26: In case of contact with eyes, rinse immediately with plenty of water and seek medical advice
S28: After contact with skin, wash immediately with plenty of soap-suds
S36/37/39: Wear suitable protective clothing, gloves and eye/face protection
S45: In case of accident or if you feel unwell, seek medical advice immediately (show the label whenever possible.)
S23: Do not breathe vapour
S33: Take precautionary measures against static discharges
S16: Keep away from sources of ignition
S62: If swallowed, do not induce vomitting; seek medical advice immediately and show this container or label
S61: Avoid release to the environment. Refer to special instructions / safety data sheets
S60: This material and its container must be disposed of as hazardous waste
RIDADR: UN 3390 6.1/PG 1
WGK Germany: 3
RTECS: ED7400000
F: 10-21
HazardClass: 8
PackingGroup: I
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