Conditions | Yield |
---|---|
With tellurium tetrachloride In benzene for 3h; Heating; | 95% |
With copper(l) iodide; copper dichloride In diethyl ether at 20℃; for 4h; Inert atmosphere; | 94.1% |
With dichloromethane; eosin y at 50℃; Temperature; Reagent/catalyst; Flow reactor; Inert atmosphere; Irradiation; | 99 %Spectr. |
2-phenyl-4,4,5,5-tetramethyl-1,3,2-dioxoborole
Phenyltrichlorosilane
A
Triphenylsilyl chloride
B
diphenylsilyl dichloride
Conditions | Yield |
---|---|
Stage #1: 2-phenyl-4,4,5,5-tetramethyl-1,3,2-dioxoborole With bis(tricyclohexylphosphine)nickel(II) dichloride; triethylaluminum; dimethylaluminum chloride In 1,4-dioxane; hexane; 1,3,5-trimethyl-benzene at 90℃; for 0.5h; Stage #2: Phenyltrichlorosilane In hexane; toluene; 1,3,5-trimethyl-benzene at 90℃; for 24h; | A n/a B 88% |
Conditions | Yield |
---|---|
Stage #1: bromobenzene With n-butyllithium In diethyl ether; hexane Stage #2: With tetrachlorosilane In diethyl ether; hexane at 0 - 5℃; | |
Stage #1: bromobenzene With n-butyllithium In diethyl ether at -78℃; Stage #2: With tetrachlorosilane In diethyl ether at 0 - 20℃; |
Phenyltrichlorosilane
chlorobenzene
A
phenylchlorosilane
B
diphenylsilyl dichloride
Conditions | Yield |
---|---|
Stage #1: Phenyltrichlorosilane With hydrogenchloride In water at 350 - 400℃; under 1500.15 Torr; for 3h; Stage #2: chlorobenzene at 350 - 480℃; under 1500.15 Torr; for 10h; Reagent/catalyst; Temperature; |
Conditions | Yield |
---|---|
With magnesium at 185℃; for 17.5h; Inert atmosphere; | 68% |
Phenyltrichlorosilane
chlorobenzene
A
Triphenylsilyl chloride
B
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With magnesium at 155℃; Inert atmosphere; | A 67.2% B 31.4% |
Conditions | Yield |
---|---|
With hexachloroethane; palladium dichloride at 20℃; for 1h; | 89% |
With hydrogenchloride; ether adduct of tris(pentafluorophenyl)boron In toluene at 20℃; for 150h; Schlenk technique; Inert atmosphere; Cooling with liquid nitrogen; | 61 %Spectr. |
With dichloromethane; eosin y at 20℃; for 4h; Reagent/catalyst; Inert atmosphere; Irradiation; Green chemistry; | 99 %Spectr. |
Conditions | Yield |
---|---|
With silicon-copper at 400℃; | |
With silver; silicon at 400℃; | |
With iron; silicon at 550℃; | |
With silicon-copper at 420℃; |
chlorobenzene
silicon
A
biphenyl
B
Phenyltrichlorosilane
C
diphenylsilyl dichloride
Conditions | Yield |
---|---|
tin at 450℃; under 0.1 Torr; for 1h; Product distribution / selectivity; | |
tin; copper; zinc at 480℃; Product distribution / selectivity; | |
tin; copper at 450℃; under 0.1 Torr; for 1h; Product distribution / selectivity; |
chlorobenzene
A
biphenyl
B
Phenyltrichlorosilane
C
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With silicon; tin(ll) chloride at 450 - 500℃; for 2h; Product distribution / selectivity; | |
With silicon; tin; copper; zinc at 450℃; Product distribution / selectivity; | |
With silicon; tin; zinc at 450℃; Product distribution / selectivity; | |
With silicon; tin at 450℃; Product distribution / selectivity; |
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With diethyl ether; hexachlorodisilane | |
With tetrachlorosilane; diethyl ether; benzene | |
With tetrachlorosilane; diethyl ether |
Conditions | Yield |
---|---|
With silicon; tin(ll) chloride at 450 - 500℃; for 3h; Product distribution / selectivity; |
Conditions | Yield |
---|---|
With silicon; tin at 450℃; for 1h; Product distribution / selectivity; | |
With silicon; copper at 450℃; for 1h; Product distribution / selectivity; |
Conditions | Yield |
---|---|
tin at 450℃; under 0.1 Torr; for 1h; Product distribution / selectivity; |
Conditions | Yield |
---|---|
tin at 450℃; under 0.1 Torr; for 1h; Product distribution / selectivity; | |
tin at 450℃; under 0.1 Torr; for 1h; Product distribution / selectivity; |
Conditions | Yield |
---|---|
With pyridine | |
In neat (no solvent) boiling of (C6H5)Si(OC2H5)2 and C6H5COCl in presence of some pyridine for a longer period of time;; | |
In neat (no solvent) boiling of (C6H5)Si(OC2H5)2 and C6H5COCl in presence of some pyridine for a longer period of time;; |
dichloro(o-chlorophenyl)phenylsilane
A
9,9-dichloro-9-silafluorene
B
Phenyltrichlorosilane
C
chlorobenzene
D
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With hexachlorodisilane at 500℃; gas phase; Further byproducts given; | A 95% B 0.3 g C 0.8 g D 0.2 g |
chlorobenzene
silicon
A
biphenyl
B
diphenylsilyl dichloride
C
benzene
Conditions | Yield |
---|---|
tin at 450℃; under 0.1 Torr; for 1h; Product distribution / selectivity; |
Conditions | Yield |
---|---|
With aluminium trichloride |
Dichlorosilane
chlorobenzene
A
Phenyltrichlorosilane
B
diphenylsilyl dichloride
C
benzene
Conditions | Yield |
---|---|
1,1'-(1,2-ethanediyl)bisbenzene at 650℃; for 0.5h; Product distribution / selectivity; | A 10.7% B 5.11% C 8.87% |
chlorobenzene
silicon
A
biphenyl
B
Phenyltrichlorosilane
C
diphenylsilyl dichloride
D
benzene
Conditions | Yield |
---|---|
tin at 480℃; Product distribution / selectivity; | |
tin; copper; zinc at 480℃; Product distribution / selectivity; | |
tin at 480℃; Product distribution / selectivity; |
dichloro(o-chlorophenyl)phenylsilane
A
1,9,9-trichloro-9-silafluorene
B
9,9-dichloro-9-silafluorene
C
Phenyltrichlorosilane
D
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With chloroform at 620℃; gas phase; | A 44% B 4.5% C 1.5 g D 4.5 g |
hexachlorodisilane
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With phenylmagnesium bromide In not given | |
With C6H5MgBr In not given |
Conditions | Yield |
---|---|
With boron trichloride at 185℃; | |
With aluminium trichloride at 185℃; |
dichloro(o-chlorophenyl)phenylsilane
A
9,9-dichloro-9-silafluorene
B
Phenyltrichlorosilane
C
diphenylsilyl dichloride
D
toluene
Conditions | Yield |
---|---|
With 1,1-Dichloro-2,5-dihydro-1H-silole at 600℃; gas phase; Further byproducts given. Title compound not separated from byproducts; | A 30% B 0.5 g C 0.8 g D n/a |
dichloromethylphenylsilane
A
dimethylsilicon dichloride
B
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With aluminum (III) chloride at 120℃; for 3h; | A 6% B 6% |
Conditions | Yield |
---|---|
With phosphorus pentachloride at 180 - 240℃; |
Conditions | Yield |
---|---|
With tetrachlorosilane at 840℃; in der Dampfphase; |
tetrachlorosilane
A
Triphenylsilyl chloride
B
Phenyltrichlorosilane
C
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With phenylmagnesium bromide In diethyl ether SiCl4 (1 mol) and C6H5MgBr (2.25 mol) in boiling ether;; | |
With C6H5MgBr In diethyl ether SiCl4 (1 mol) and C6H5MgBr (2.25 mol) in boiling ether;; |
Conditions | Yield |
---|---|
With benzene In neat (no solvent) H2SiCl2 and C6H6 with a Zn-halide as catalyst at 400°C;; |
diphenylsilyl dichloride
1,3-diallyl-4-(trimethylsilyloxy)-2,6-dioxo-1,3,5-triazine
Conditions | Yield |
---|---|
at 120 - 160℃; | 99.6% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 40℃; for 6h; | 99.5% |
Conditions | Yield |
---|---|
In 5,5-dimethyl-1,3-cyclohexadiene at 120℃; for 10h; | 99.3% |
(S)-4-trimethylsilyl-3-butyn-2-ol
diphenylsilyl dichloride
C26H36O2Si3
Conditions | Yield |
---|---|
With 2,6-dimethylpyridine In dichloromethane at 0 - 23℃; for 4h; | 99% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 1h; | 99% |
Conditions | Yield |
---|---|
Stage #1: allyl bromide With indium In N,N-dimethyl-formamide at 20℃; for 1h; Stage #2: diphenylsilyl dichloride In N,N-dimethyl-formamide at 20℃; for 3h; | 99% |
With zinc In tetrahydrofuran for 0.166667h; Inert atmosphere; Sonication; | 88% |
Conditions | Yield |
---|---|
In tetrahydrofuran at 0 - 20℃; Inert atmosphere; | 99% |
diphenylsilyl dichloride
Conditions | Yield |
---|---|
In tetrahydrofuran at -25 - 20℃; | 99% |
tetrakis(trimethylsilyl)silane
diphenylsilyl dichloride
1-chloro-1,1-diphenyl-2,2-bis(trimethylsilyl)trimethyltrisilane
Conditions | Yield |
---|---|
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In 1,2-dimethoxyethane for 6h; Stage #2: diphenylsilyl dichloride In 1,2-dimethoxyethane; toluene for 14h; | 99% |
Conditions | Yield |
---|---|
With sodium; 1,2-dibromomethane In xylene Ar; to suspension of Na were added at 138°C during 1.5 h silane and borane (4:1) and CH2Br2; 30 min reflux; filtration; evapn. of solvent and drying at 100°C for 20 h (vacuo); elem. anal.; | 98.8% |
silver trifluoromethanesulfonate
diphenylsilyl dichloride
Diphenylsilicium-bis(trifluormethansulfonat)
Conditions | Yield |
---|---|
In dichloromethane at -25 - 20℃; | 98% |
96 h,25°C; | 80% |
1,2-dimethyl-4,5-di(mercaptomethyl)benzene
diphenylsilyl dichloride
9,10-Dimethyl-2,2-diphenyl-5,6-benzo-1,3,2-dithiasilepine
Conditions | Yield |
---|---|
With triethylamine In benzene for 5h; Heating; | 98% |
vinyl magnesium bromide
diphenylsilyl dichloride
diphenyl-divinyl-silane
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 12h; Grignard reaction; | 98% |
In tetrahydrofuran; pentane for 12h; Heating; | 80% |
sodium tri-tert-butylsilanide
diphenylsilyl dichloride
Conditions | Yield |
---|---|
In tetrahydrofuran Substitution; supersilanidation; | 98% |
diphenylsilyl dichloride
allylsamarium bromide
allyl(chloro)diphenylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran at 20℃; for 1h; | 98% |
Conditions | Yield |
---|---|
Stage #1: propargyl bromide With indium In N,N-dimethyl-formamide at 20℃; for 1h; Stage #2: diphenylsilyl dichloride In N,N-dimethyl-formamide at 20℃; for 3h; | 98% |
phenylacetylene
diphenylsilyl dichloride
1,1-diphenylbis(phenylethynyl)silane
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran at -70℃; | 97% |
With [{Ir(μ-Cl)(CO)2}2]; N-ethyl-N,N-diisopropylamine; lithium iodide at 100℃; for 72h; Schlenk technique; Inert atmosphere; | 90% |
With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; for 1h; Inert atmosphere; | 90% |
ethynylmagnesium chloride
diphenylsilyl dichloride
diethynyldiphenylsilane
Conditions | Yield |
---|---|
In tetrahydrofuran at 30 - 40℃; for 3h; | 97% |
Stage #1: ethynylmagnesium chloride; diphenylsilyl dichloride In tetrahydrofuran for 1h; Inert atmosphere; Stage #2: With ammonium chloride In tetrahydrofuran; water Inert atmosphere; | 70% |
In tetrahydrofuran |
Conditions | Yield |
---|---|
With air; sodium fluoride; rhodium(I)-bis(1,5-cyclooctadiene) tetrafluoroborate at 100℃; for 12h; | 97% |
diphenylsilyl dichloride
Conditions | Yield |
---|---|
Stage #1: 1,2-bis(1H-indol-2-yl)benzene With potassium hexamethylsilazane In tetrahydrofuran; toluene at 0℃; for 0.25h; Stage #2: diphenylsilyl dichloride In tetrahydrofuran; toluene at 0 - 20℃; for 12h; | 97% |
Conditions | Yield |
---|---|
With polyaniline at 40 - 50℃; for 8h; | 96% |
In diethyl ether at 40℃; for 3h; Inert atmosphere; | 76.92% |
Conditions | Yield |
---|---|
With sodium tetrafluoroborate In various solvent(s) for 0.75h; Heating; | 96% |
With hydrogen fluoride In ethanol at 20℃; | 90% |
With ammonium hexafluorosilicate In 1,2-dimethoxyethane at 0℃; for 0.333333h; Product distribution; var. react.: Na2SiF6, var. solv., temp and time; | 82% |
Conditions | Yield |
---|---|
In benzene for 12h; Heating; | 96% |
diphenylsilyl dichloride
Conditions | Yield |
---|---|
With ammonium fluoride; 18-crown-6 ether In hexane; toluene for 10h; Heating; | 96% |
diphenylsilyl dichloride
Conditions | Yield |
---|---|
In chloroform for 6h; Heating; | 96% |
diphenylsilyl dichloride
1,4-diphenylbut-2-ene-1,4-dione
1,2,4-triphenylbutane-1,4-dione
Conditions | Yield |
---|---|
With air; sodium fluoride; rhodium(I)-bis(1,5-cyclooctadiene) tetrafluoroborate at 100℃; for 12h; | 96% |
Conditions | Yield |
---|---|
Stage #1: 2,6-diisopropylbenzenamine With n-butyllithium In diethyl ether; hexane at -78 - 20℃; Inert atmosphere; Stage #2: diphenylsilyl dichloride In diethyl ether; hexane at -78℃; Inert atmosphere; | 96% |
Stage #1: 2,6-diisopropylbenzenamine With n-butyllithium In diethyl ether; hexane; Petroleum ether at -78 - 20℃; Stage #2: diphenylsilyl dichloride In Petroleum ether at -78℃; for 8h; | 66% |
With n-butyllithium In diethyl ether; hexane; Petroleum ether at -78 - 20℃; for 8h; |
diphenylsilyl dichloride
trimethylsilylacetylene
bis((trimethylsilyl)ethynyl)diphenylsilane
Conditions | Yield |
---|---|
With [{Ir(μ-Cl)(CO)2}2]; N-ethyl-N,N-diisopropylamine; lithium iodide at 100℃; for 72h; Schlenk technique; Inert atmosphere; | 96% |
Stage #1: trimethylsilylacetylene With n-butyllithium In diethyl ether; hexane at -78 - 0℃; for 1h; Stage #2: diphenylsilyl dichloride In diethyl ether; hexane at 0 - 20℃; | 87% |
With n-butyllithium In diethyl ether; hexane at -78 - 20℃; | 72% |
1.4-dibromobenzene
diphenylsilyl dichloride
bis(4-bromophenyl)(diphenyl)silane
Conditions | Yield |
---|---|
Stage #1: 1.4-dibromobenzene With n-butyllithium In tetrahydrofuran at -78℃; for 2h; Inert atmosphere; Stage #2: diphenylsilyl dichloride In tetrahydrofuran at -78 - 20℃; for 14h; Inert atmosphere; | 96% |
Stage #1: 1.4-dibromobenzene With n-butyllithium In diethyl ether at 0℃; for 3h; Inert atmosphere; Stage #2: diphenylsilyl dichloride In diethyl ether at 20℃; for 48h; Inert atmosphere; | 85% |
Stage #1: 1.4-dibromobenzene With n-butyllithium In diethyl ether at -78℃; for 2.5h; Inert atmosphere; Stage #2: diphenylsilyl dichloride In diethyl ether at -78 - 20℃; Inert atmosphere; | 82.9% |
allyl bromide
diphenylsilyl dichloride
A
diallyldiphenylsilane
B
allyl(chloro)diphenylsilane
Conditions | Yield |
---|---|
Stage #1: allyl bromide With indium In 1,3-dimethylimidazolidine at 20℃; for 1h; Stage #2: diphenylsilyl dichloride In 1,3-dimethylimidazolidine at 70℃; for 3h; | A 3% B 96% |
Reported in EPA TSCA Inventory.
DOT Classification: 8; Label: Corrosive
The IUPAC name of this chemical is dichloro(diphenyl)silane. With the CAS registry number 80-10-4, it is also named as Benzene, 1,1'-(dichlorosilylene)bis-. The product's categories are Silicon Compounds; Organosilicon Reagents; Dichlorosilanes; Dichlorosilanes (for Polysilanes); Functional Materials; Reagent for High-Performance Polymer Research; Si-Cl Compounds; Phenyl Silanes. It is colorless transparent liquid with a pungent odor that is corrosive to metals and tissue. In addition, this chemical will burn though it may require some effort to ignite. When heated to decomposition or on contact with acid or acid fumes it emits toxic fumes of Cl-. So the storage environment should be ventilate, low-temperature and dry.
The other characteristics of this product can be summarized as: (1)ACD/LogP: 6.69; (2)# of Rule of 5 Violations: 1; (3)ACD/LogD (pH 5.5): 6.69; (4)ACD/LogD (pH 7.4): 6.69; (5)#H bond acceptors: 0; (6)#H bond donors: 0; (7)#Freely Rotating Bonds: 2; (8)Index of Refraction: 1.582; (9)Molar Refractivity: 69.88 cm3; (10)Molar Volume: 209.2 cm3; (11)Polarizability: 27.7×10-24 cm3; (12)Surface Tension: 36.7 dyne/cm; (13)Enthalpy of Vaporization: 52.36 kJ/mol; (14)Boiling Point: 305 °C at 760 mmHg; (15)Vapour Pressure: 0.00152 mmHg at 25°C; (16)Rotatable Bond Count: 2; (17)Exact Mass: 251.992882; (18)MonoIsotopic Mass: 251.992882; (19)Heavy Atom Count: 15; (20)Complexity: 174.
Preparation of Dichloro diphenylsilane: The crude monomer can be obtained by chlorobenzene and silica powder in the presence of copper catalyst. Then we can get trichloro(phenyl)silane and dichloro diphenylsilane by rectification.
Uses of Dichloro diphenylsilane: It is used as raw materials of silicone oil and silicone. it is also used in the production of silicone and siloxanes and silicones, methyl phenyl. In addition, it can react with biphenyl-2,2'-diol to get 6,6-diphenyl-dibenzo[d,f][1,3,2]dioxasilepine. This reaction needs solvent benzene by heating.
When you are using this chemical, please be cautious about it as the following:
It is not only harmful if swallowed, but also toxic in contact with skin. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. After contact with skin, wash immediately with plenty of soap-suds. If you want to contact this product, you must wear suitable protective clothing, gloves and eye/face protection. In case of accident or if you feel unwell, seek medical advice immediately (show the label whenever possible.)
People can use the following data to convert to the molecule structure.
1. SMILES:Cl[Si](Cl)(c1ccccc1)c2ccccc2
2. InChI:InChI=1/C12H10Cl2Si/c13-15(14,11-7-3-1-4-8-11)12-9-5-2-6-10-12/h1-10H
The following are the toxicity data which has been tested.
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
rabbit | LD50 | skin | 100uL/kg (0.1mL/kg) | BEHAVIORAL: SOMNOLENCE (GENERAL DEPRESSED ACTIVITY) SKIN AND APPENDAGES (SKIN): "DERMATITIS, OTHER: AFTER SYSTEMIC EXPOSURE" | National Technical Information Service. Vol. OTS0571886, |
About|Contact|Cas|Product Name|Molecular|Country|Encyclopedia
Message|New Cas|MSDS|Service|Advertisement|CAS DataBase|Article Data|Manufacturers | Chemical Catalog
©2008 LookChem.com,License: ICP
NO.:Zhejiang16009103
complaints:service@lookchem.com Desktop View