CAS No.7782-44-7,Oxygen Suppliers,MSDS download

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Antimex Chemical Limied

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Wuhan ZeShanCheng Biomedical Technology Co., Ltd.

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HENAN SUNLAKE ENTERPRISE CORPORATION

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Anqiu Hengan Gas Manufacture Factory

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Hangzhou Sinopoly AS manufacturing Co.,Ltd

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Chengdu Taiyu Industrial Gases Co., Ltd.

Oxygen O2 CAS No.: 7782-44-7 EINECS No.: 231-956-9 UN No.: UN1072 Purity: 99.995%-99.9997% Dot Class: 2.2 Appearance: Colorless Grade Standard: Industrial Grade, Medical Grade, Electronic Grade.

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Shanghai united Scientific Co.,Ltd.

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GZ HONESTCHEM CO., LTD

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Nanjing Raymon Biotech Co., Ltd.

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yuyongmei

YUYONGMEI was established in Aug,1999, located in the industrial park of Nanjing University of Technology, It is a private enterprises in Jiangsu Province with 1200 square meters’ R&D center. Our R&D center has a well-equipped synthetic laboratory a

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Buffett (China) Holding Co.,Ltd

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NovaChemistry

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Airgas Specialty Gases

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JFE Chemical Corporation

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Societa Italiana Acetilene & Derivati S.p.A.

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Synthesia, a.s.

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Synthetic route

: (bis(1,10-phenantroline) copper(I))(1+)

A: copper(II) bis(1,10-phenanthroline)

B: 7782-44-7
hydroperoxyl radical

Conditions

Conditions	Yield
With perchloric acid; oxygen In acetonitrile Kinetics;	A 100% B n/a

: 75-15-0
carbon disulfide

: 7722-84-1
dihydrogen peroxide

: 80937-33-3
oxygen

A: 7446-09-5
sulfur dioxide

B: 7782-44-7
hydroperoxyl radical

Conditions

Conditions	Yield
In gas Kinetics; byproducts: HS; other Radiation; H2O2 is photolysed at 266 nm (Nd:YAG laser) in a flow reactor, addn. of CS2 (NO) and O2 (N2); HO2 yield measurement by LMR (laser magnetic resonance), SO2 yield measurement by CIMS (chemical ionization mass spectometry);	A 90% B 95%

Conditions	Yield
In gas Kinetics; between 218 and 298 K, OH source: F + H2O or H + NO2, ClO source: Cl + O3, reaction carried out in a discharge-flow system;	A 9% B n/a C n/a D n/a
In gaseous matrix Kinetics; carrier gas: He; hydroxyl radicals were prepared by the reaction between H and NO2; ClO radicals were prepared by the reaction between O3 an Cl; resonance-fluorescence measurements;

Conditions	Yield
In neat (no solvent) Kinetics; byproducts: C2H4, C2H5O2; Irradiation (UV/VIS); reaction of O2 with C2H5 radicals formed by flash-light photolysis (22 °C, 5-100 Torr total pressure); 99.9% of C2H5 reacted with formation of C2H5O2; rate constant;;	0.1%
In neat (no solvent) Kinetics; byproducts: C2H4; reaction of C2H5 radicals with O2 at T<320 °C; mechanism;;

Conditions	Yield
In gas Kinetics; CH4-O2 reaction at 1100 °C and total pressure of 10 Torr; HO2 decay (1. order);; mass spectroscopy;;
In neat (no solvent) CH4-O2 flames (12 Torr);; mass spectroscopy; assignment to HO2 is doubtful;;
In neat (no solvent) CH4-O2 flames (70 Torr);; mass spectroscopy;;
In neat (no solvent) byproducts: CH3, H2O2; reaction of 5 Torr CH4 with 3 Torr O2 at 1090 °C (reaction period 10E-2 s); collision yield; following reaction;; mass spectroscopy;;	0.05%
In neat (no solvent) examination of the CH4-O2 reaction;;

Conditions	Yield
Kinetics; byproducts: OH, H2O, O2; at 298-386 K and 15-150 Torr;
In neat (no solvent) Kinetics; byproducts: OH, H2O, O2; gaseous H2O2 was mixed with O+O2; rate constant;;
In neat (no solvent)

Conditions	Yield
With water; acetic acid In water Kinetics; byproducts: O2; Irradiation (UV/VIS);
In neat (no solvent) Kinetics; byproducts: O2; OH radicals formed from H+NO2 reacted with O3; rate constant;; UV absorption measurements;;

Conditions	Yield
With nitrogen In gas Kinetics; kinetic of react. of OH radical with H2O2 studied over temp. range 96-296 K; H2O2/N2 gas expanded through Laval nozzle; laser-induced fluorescence of OH radical used as probe;
In gas Kinetics; kinetics studied at 250-1250 K by means of UV spectroscopy;
In gaseous matrix Kinetics; 245-423 K; total pressure=45-500 torr; in He stream, in contact with quarz, Pyrex or Teflon only; not sepd.;

Conditions	Yield
In gaseous matrix Kinetics; other Radiation; laser photolysis (mixt. of O3 with He (1:1E+4), KrF excimer laser); detection by time-resolved atomic absorption spectroscopy;
fast-flow discharge system (room temp., excess of O3, bychoise addn. ofCO or NO);

Conditions	Yield
In water mechanism of H2O2-decomposition discussed;;
In water mechanism of H2O2-decomposition discussed;;

Conditions	Yield
In gaseous matrix Kinetics; H and O2 reacted in excess of Ar in fast flow-discharge tube at 2-10 Torr and at 231-512 K; detected by mass spectrometry and GC chromy;
With He or N2 or H2O In gas Kinetics; other Radiation; reacting H atoms with O2 in the presence of He, N2 or H2O (microwave discharge, pressure 0.25 - 1 Torr);
With nitrogen In gas Kinetics;

Conditions	Yield
With isopropyl alcohol; 12-tungstoferric acid In water Kinetics; Irradiation (UV/VIS); soln. contg. heteropolytungstate ion (2E-6 M) and i-PrOH (1.7 M) subjected to 10E-6 s photoflash in presence of O2 (2E-4 M) at pH 1.0 (0.05 M H2SO4);
With isopropyl alcohol; sodium phosphotungstate In water Kinetics; Irradiation (UV/VIS); soln. contg. heteropolytungstate ion (2E-6 M) and i-PrOH (1.7 M) subjected to 10E-6 s photoflash in presence of O2 (2E-4 M) at pH 1.0 (0.05 M H2SO4);
With isopropyl alcohol; sodium metatungstate In water Kinetics; Irradiation (UV/VIS); soln. contg. polytungstate ion (2E-6 M) and i-PrOH (1.7 M) subjected to10E-6 s photoflash in presence of O2 (2E-4 M) at pH 1.0 (0.05 M H2SO4);
With isopropyl alcohol; 12-tungstosilicic acid, K-salt In water Kinetics; Irradiation (UV/VIS); soln. contg. heteropolytungstate ion (2E-6 M) and i-PrOH (1.7 M) subjected to 10E-6 s photoflash in presence of O2 (2E-4 M) at pH 1.0 (0.05 M H2SO4);

Conditions	Yield
In gaseous matrix Kinetics; Cl concn. 3E11 - 3E12 molecule/cm3, HO2 concn. 1E10 - 5E11 molecule/cm3,236 K, 1 Torr of He;	A 94.5% B n/a
In gaseous matrix Kinetics; Cl concn. 3E11 - 3E12 molecule/cm3, HO2 concn. 1E10 - 5E11 molecule/cm3,256 K, 1 Torr of He;	A 79.4% B n/a
In gaseous matrix Kinetics; Cl concn. 3E11 - 3E12 molecule/cm3, HO2 concn. 1E10 - 5E11 molecule/cm3,276 K, 1 Torr of He;	A 74.8% B n/a
In gaseous matrix Kinetics; Cl concn. 3E11 - 3E12 molecule/cm3, HO2 concn. 1E10 - 5E11 molecule/cm3,296 K, 1 Torr of He;	A 70.4% B n/a

Conditions	Yield
In gaseous matrix Kinetics; Cl concn. 2E10 - 5E10 molecule/cm3, HO2 concn. 4E11 - 4E12 molecule/cm3,336 K, 1 Torr of He;	A 26% B n/a
In gaseous matrix Kinetics; Cl concn. 2E10 - 5E10 molecule/cm3, HO2 concn. 4E11 - 4E12 molecule/cm3,316 K, 1 Torr of He;	A 23.6% B n/a
In gaseous matrix Kinetics; Cl concn. 2E10 - 5E10 molecule/cm3, HO2 concn. 4E11 - 4E12 molecule/cm3,296 K, 1 Torr of He;	A 18.6% B n/a

Conditions	Yield
Kinetics; byproducts: O2; rate constant;;
In sulfuric acid Kinetics; byproducts: O2; other Radiation; decrease of HO2 which was formed by pulsed or continuous electron radiation of H2O2-O2-H2SO4 soln.; rate constant;;
In gaseous matrix Kinetics; byproducts: O2; 298 K, He or Ar present at total pressures 75 - 730 torr;

Conditions	Yield
In gaseous matrix Kinetics; reaction of O2H (produced on reaction of H + O2 + M -> HO2 + M) and O3 (He carrier gas, 1.5 - 4 Torr, 245 K - 365 K);
In gas Kinetics; discharge-flow system at room temp.;;
In gas Kinetics; rate constant determined in the temp. range 233-400 K;

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