chloro-trimethyl-silane
dichloromethane
A
bis(trimethylsilyl)methane
B
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With N,N,N,N-tetraethylammonium tetrafluoroborate In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide for 18.4167h; electroreduction, anode: Al, cathode: stainless steel; | A 10% B 90% |
Conditions | Yield |
---|---|
With methylmagnesium bromide In not given | 90% |
With CH3MgBr In not given | 90% |
chloro-trimethyl-silane
dichloromethane
A
bis(trimethylsilyl)methane
B
1,2-bis(trimethylsilyl)ethane
C
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With N,N,N,N-tetraethylammonium tetrafluoroborate In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide for 33.5h; electroreduction, anode: Al, cathode: stainless steel; | A 88% B 6% C 6% |
Conditions | Yield |
---|---|
In neat (no solvent, gas phase) vapor phase chlorination at temp. of boiling benzene;; | 74% |
In tetrachloromethane Irradiation (UV/VIS); introduction of gaseous Cl2 into a soln. of Si(CH3)4 in CCl4 under irradiation with sunlight in presence of some PCl5;; | 33% |
Chloro(chloromethyl)dimethylsilane
methylmagnesium bromide
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
42% | |
With diethyl ether |
tetramethylsilane
Chloro(chloromethyl)dimethylsilane
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
aluminium trichloride In tetrachloromethane for 6h; Heating; atmospheric pressure; | 33% |
tetramethylsilane
Chloro(chloromethyl)dimethylsilane
A
chloro-trimethyl-silane
B
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
aluminium trichloride In neat (no solvent) at 30 - 40℃; for 19h; Product distribution; atmospheric pressure; other time and solvents, different ratio of the starting materials; | A n/a B 32% |
tetramethylsilane
A
methanesulfonyl trimethylsilyl chloride
B
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With yttrium(III) chloride; sulfuryl dichloride for 8h; Irradiation; | A 20% B 20% |
methyl magnesium iodide
(chloromethyl)trichlorosilane
A
iodo(trimethylsilyl)methane
B
Chloromethyltrimethylsilane
diethyl ether
Chloro(chloromethyl)dimethylsilane
methylmagnesium chloride
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With tetrachloromethane; phosphorus pentachloride; chlorine unter Belichtung; | |
With tetrachloromethane; potassium carbonate; acetonitrile; bis(triphenylphosphine)platinum(II) dichloride at 120℃; for 16h; | 2.4 % Chromat. |
n-Butyl chloride
(bromomethyl)trimethylsilane
A
1-bromo-butane
B
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With triisooctyl amine Equilibrium constant; |
n-Butyl chloride
iodo(trimethylsilyl)methane
A
1-iodo-butane
B
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With triisooctyl amine Equilibrium constant; |
trichloromethyltrimethylsilane
Dilithium N,N'-bis(trimethylsilyl)hydrazide tetramer
A
chloro-trimethyl-silane
B
(dichloromethyl)trimethylsilane
C
N,N'-bis(trimethylsilyl)hydrazine
D
tris(trimethylsilyl)hydrazine
E
1,1,1,3,3,3-hexamethyl-disilazane
F
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
In diethyl ether at -78℃; Product distribution; var.: reagent; |
tetrachloromethane
tetramethylsilane
phosphorus pentachloride
chlorine
Chloromethyltrimethylsilane
bis(chloromethyl)dimethylsilane
A
tetramethylsilane
B
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With Zn In ethanol; water react. of (CH3)2Si(CH2Cl)2 and Zn powder in aq. ethanol in presence of NaI and Na2CO3;; |
Conditions | Yield |
---|---|
With n-butyllithium In tetrahydrofuran; hexane at -78℃; |
(dichloromethyl)trimethylsilane
A
chloro-trimethyl-silane
B
tetramethylsilane
C
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With hydrogen at 200℃; under 760.051 Torr; for 1h; Kinetics; Flow reactor; | |
With hydrogen at 200℃; under 760.051 Torr; for 1h; Kinetics; Flow reactor; |
(dichloromethyl)trimethylsilane
A
chloro-trimethyl-silane
B
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With hydrogen at 200℃; under 760.051 Torr; for 1h; Kinetics; Flow reactor; |
benzylamine
Chloromethyltrimethylsilane
N-benzyl-1-(trimethylsilyl)-N-((trimethylsilyl)methyl)methanamine
Conditions | Yield |
---|---|
With potassium carbonate In acetonitrile Heating; | 100% |
With potassium carbonate In acetonitrile for 68h; Heating; | 76% |
trimethylsilylmethyllithium
Chloromethyltrimethylsilane
lithium hydride
Conditions | Yield |
---|---|
In tetrahydrofuran; water; pentane | 100% |
3-fluorosalicylaldehyde
Chloromethyltrimethylsilane
3-fluoro-2-((trimethylsilyl)methoxy)benzaldehyde
Conditions | Yield |
---|---|
With potassium carbonate; sodium iodide In N,N-dimethyl-formamide at 65℃; for 12h; Inert atmosphere; | 100% |
With potassium carbonate; sodium iodide In N,N-dimethyl-formamide at 65℃; | 98% |
With potassium carbonate; sodium iodide In N,N-dimethyl-formamide at 65℃; |
furfural
Chloromethyltrimethylsilane
1-(2'-furyl)-2-trimethylsilanylethan-1-ol
Conditions | Yield |
---|---|
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether at 20℃; for 1h; Stage #2: furfural In diethyl ether at 0 - 20℃; for 1h; | 99% |
With magnesium In diethyl ether at 0 - 20℃; for 12h; Grignard reaction; | 90% |
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether for 1h; Grignard reaction; Heating; Stage #2: furfural In diethyl ether at 0 - 20℃; for 12h; Addition; Further stages.; | 90% |
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether for 1h; Heating; Stage #2: furfural In diethyl ether for 12h; Grignard reaction; Further stages.; | 90% |
Stage #1: Chloromethyltrimethylsilane With 1,1-Dibromoethane; magnesium In diethyl ether for 18h; Heating; Stage #2: furfural In diethyl ether at 0 - 23℃; for 18h; Grignard reaction; |
2-Mercaptopyridine
Chloromethyltrimethylsilane
2-(trimethylsilylmethylmercapto)pyridine
Conditions | Yield |
---|---|
With potassium carbonate; potassium iodide In ethanol for 1h; Heating; | 98% |
Conditions | Yield |
---|---|
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether at 20℃; for 1h; Stage #2: thiophene-2-carbaldehyde In diethyl ether at 0 - 20℃; for 1h; | 98% |
Stage #1: Chloromethyltrimethylsilane With magnesium; ethylene dibromide In diethyl ether for 1h; Heating; Stage #2: thiophene-2-carbaldehyde In diethyl ether at 0 - 20℃; for 21h; | 94% |
2-bromo-4,5-dichloro-1 H-imidazole
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With potassium hexamethylsilazane In N,N-dimethyl acetamide at 0 - 100℃; for 4h; | 98% |
Chloromethyltrimethylsilane
trimethylsilylmethyl azide
Conditions | Yield |
---|---|
With sodium azide In N,N-dimethyl-formamide at 80℃; for 44h; | 97% |
With N,N,N,N,N,N-hexamethylphosphoric triamide; sodium azide at 80℃; for 12h; | 95% |
With sodium azide In N,N-dimethyl-formamide at 80℃; for 40h; Inert atmosphere; | 85% |
Conditions | Yield |
---|---|
In neat (no solvent) at 70℃; for 2h; Inert atmosphere; | 97% |
In N,N-dimethyl-formamide at 100℃; for 20h; | 95% |
(+)-(S)-1-Phenyl-3,4,5,6-tetrahydro[1,2]thiazin-1-oxide
Chloromethyltrimethylsilane
(+)-(1S,6S)-6-(trimethylsilyl)methyl-1-phenyl-3,4,5,6-tetrahydro-1λ4-1,2-thiazine 1-oxide
Conditions | Yield |
---|---|
Stage #1: (+)-(S)-1-Phenyl-3,4,5,6-tetrahydro[1,2]thiazin-1-oxide With n-butyllithium In tetrahydrofuran; hexane at -50 - 20℃; Stage #2: Chloromethyltrimethylsilane In tetrahydrofuran; hexane at -78 - 20℃; for 18h; optical yield given as %de; diastereoselective reaction; | 97% |
Chloro(chloromethyl)dimethylsilane
Chloromethyltrimethylsilane
chloromethyl(dimethyl)(trimethylsilylmethyl)silane
Conditions | Yield |
---|---|
Stage #1: Chloromethyltrimethylsilane With magnesium; ethylene dibromide In tetrahydrofuran for 2h; Schlenk technique; Inert atmosphere; Reflux; Stage #2: Chloro(chloromethyl)dimethylsilane In tetrahydrofuran for 20h; Reflux; Schlenk technique; Inert atmosphere; | 97% |
tert-butylamine
Chloromethyltrimethylsilane
N-tert-butyl<(trimethylsilyl)metyl>amine
Conditions | Yield |
---|---|
Stage #1: tert-butylamine; Chloromethyltrimethylsilane at 200℃; for 18h; Stage #2: With sodium hydroxide In water | 96% |
at 200℃; for 18h; Product distribution / selectivity; Heating / reflux; | 96% |
Stage #1: tert-butylamine; Chloromethyltrimethylsilane at 200℃; for 18h; Stage #2: With sodium hydroxide In water at 20℃; for 1h; Product distribution / selectivity; | 96% |
methyltris(trimethylsilyl)silane
Chloromethyltrimethylsilane
2-[(trimethylsilyl)methyl]heptamethyltrisilane
Conditions | Yield |
---|---|
With potassium tert-butylate In tetrahydrofuran Inert atmosphere; | 96% |
Chloromethyltrimethylsilane
1,4-bis(trimethylsilyl)dodecamethylbicyclo[2.2.2]octasilane
1-(trimethylsilyl)-4-[(trimethylsilyl)methyl]dodecamethylbicyclo[2.2.2]octasilane
Conditions | Yield |
---|---|
Stage #1: 1,4-bis(trimethylsilyl)dodecamethylbicyclo[2.2.2]octasilane With potassium tert-butylate In tetrahydrofuran Inert atmosphere; Stage #2: Chloromethyltrimethylsilane In tetrahydrofuran at 20℃; for 16.1667h; Cooling with ice; Inert atmosphere; | 96% |
thiophenol
Chloromethyltrimethylsilane
(phenylsulfanylmethyl)trimethylsilane
Conditions | Yield |
---|---|
With sodium hydroxide In ethanol; water for 4h; Heating; | 95% |
benzylamine
Chloromethyltrimethylsilane
N-(trimethylsilylmethyl)benzylamine
Conditions | Yield |
---|---|
In dimethyl sulfoxide Heating; | 95% |
at 20 - 120℃; for 24h; | 93.3% |
In acetonitrile for 16h; Reflux; Inert atmosphere; | 93% |
p-Chlorothiophenol
Chloromethyltrimethylsilane
<(4-chlorophenylthio)methyl>trimethylsilane
Conditions | Yield |
---|---|
With sodium hydroxide In ethanol; water for 4h; Heating; | 95% |
Chloromethyltrimethylsilane
1,1,1-trichloro-3,3-dimethyl-1,3-disilabutane
Conditions | Yield |
---|---|
With trichlorosilane; tetra-n-butylphosphonium chloride at 150℃; for 4h; | 95% |
With trichlorosilane; benzyltriphenylphosphonium chloride | 72% |
With trichlorosilane; benzyltriphenylphosphonium chloride | 72% |
With tetrachlorosilane; magnesium; methyl iodide 1.) THF, reflux, 0.5 h, 2.) THF, 80 deg C, 4 h; Yield given. Multistep reaction; |
2-mercaptobenzimidazole sodium salt
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
In benzene for 4h; Heating; | 95% |
(R)-1-phenyl-ethyl-amine
Chloromethyltrimethylsilane
(R)-(+)-N-1-phenylethyl-N-trimethylsilylmethylamine
Conditions | Yield |
---|---|
In dimethyl sulfoxide at 90℃; for 18h; | 95% |
Heating; | 84% |
With potassium carbonate In acetonitrile for 4h; Heating; | 81% |
Conditions | Yield |
---|---|
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether Heating; Stage #2: furan-3-carboxaldehyde In diethyl ether at 0 - 20℃; for 12h; Further stages.; | 95% |
Stage #1: Chloromethyltrimethylsilane With 1,1-Dibromoethane; magnesium In diethyl ether for 19h; Heating; Stage #2: furan-3-carboxaldehyde In diethyl ether at 0 - 23℃; for 18h; Grignard reaction; |
1-methyl-4-((phenylsulfonyl)methyl)benzene
Chloromethyltrimethylsilane
Conditions | Yield |
---|---|
With lithium methylsulfinyl carbanion at 20℃; for 2h; Product distribution; Further Variations:; Reagents; Temperatures; | 95% |
Chloromethyltrimethylsilane
1-cyclopropyl-5,9-dimethyl-deca-4,8-dien-1-one
(E)-2-Cyclopropyl-6,10-dimethyl-1-trimethylsilanyl-undeca-5,9-dien-2-ol
Conditions | Yield |
---|---|
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether Stage #2: With cerium(III) chloride In tetrahydrofuran; diethyl ether at 0℃; Stage #3: 1-cyclopropyl-5,9-dimethyl-deca-4,8-dien-1-one In tetrahydrofuran; diethyl ether at 0 - 20℃; | 95% |
Conditions | Yield |
---|---|
In pentane | 95% |
In pentane | 95% |
In pentane at 40℃; for 16h; Argon gasification; | 80% |
ethyl cinnamate
Chloromethyltrimethylsilane
trimethyl[(3E)-2-methylene-4-phenylbut-3-en-1-yl]silane
Conditions | Yield |
---|---|
Stage #1: Chloromethyltrimethylsilane With magnesium In tetrahydrofuran at 20℃; for 3h; Stage #2: ethyl cinnamate With cerium(III) chloride In tetrahydrofuran at -78 - 20℃; Stage #3: With silica gel In dichloromethane at 20℃; for 3h; Further stages.; | 95% |
tributyltin chloride
magnesium
Chloromethyltrimethylsilane
(trimethylsilyl)(tributylstannyl)methane
Conditions | Yield |
---|---|
With iodine; ammonium chloride In diethyl ether N2-atmosphere; addn. of Me3SiCH2Cl to Mg (activated with I2), refluxing(1 h), addn. of Bu3SnCl, refluxing (18 h); addn. of satd. aq. NH4Cl, extn. of aq. layer (ether), washing of org. layer (satd. aq. NaCl), drying (Na2SO4), evapn. of ether, distn. (vac.); | 95% |
2-chloro-1-(2,4-dichlorophenyl)ethanone
(trimethylsilyl)methylmagnesium chloride
Chloromethyltrimethylsilane
1-(1-chloromethylethenyl)-2,4-difluorobenzene
Conditions | Yield |
---|---|
Stage #1: (trimethylsilyl)methylmagnesium chloride; Chloromethyltrimethylsilane With magnesium In tert-butyl methyl ether at 55℃; for 4h; Stage #2: 2-chloro-1-(2,4-dichlorophenyl)ethanone In tert-butyl methyl ether at -10 - 0℃; Stage #3: With sulfuric acid In tert-butyl methyl ether at 25 - 50℃; for 3h; | 95% |
(S)-1-phenyl-ethylamine
Chloromethyltrimethylsilane
N-(S)-α-methylbenzyl-N-((trimethylsilyl)methyl)amine
Conditions | Yield |
---|---|
In neat (no solvent) at 200℃; for 3h; Sealed tube; | 94% |
With triethylamine for 16h; Reflux; Inert atmosphere; | 76% |
With potassium carbonate In acetonitrile for 4h; Heating; | 75% |
(Z)-3-bromo-4-trimethylsilyl-3-buten-2-one
Chloromethyltrimethylsilane
(Z)-2-bromo-3-methyl-1-trimethylsilyl-1,3-butadiene
Conditions | Yield |
---|---|
Stage #1: Chloromethyltrimethylsilane With magnesium; ethylene dibromide In diethyl ether for 1h; Inert atmosphere; Reflux; Stage #2: (Z)-3-bromo-4-trimethylsilyl-3-buten-2-one In diethyl ether at 0℃; Peterson olefination; Inert atmosphere; Stage #3: With water; acetic acid at 50℃; for 6h; Peterson olefination; Inert atmosphere; | 94% |
Chloromethyltrimethylsilane
2-(trimethylsilyl)-2-[(trimethylsilyl)methyl]hexamethyltrisilane
Conditions | Yield |
---|---|
In benzene at 0℃; for 2h; | 94% |
The Chloromethyltrimethylsilane, with the CAS register number 2344-80-1, has other names as silane cmm3; trimethyl(chloromethyl)silane; trimethylsilylchloromethane; (trimethylsilyl)methyl chloride; (ch3)3sich2cl; (chloromethyl)trimethyl-silan; cc3285; chloromethyltrimethylsilane.
The characteristics of this chemical could be summarized as: (1)ACD/LogP: 2.52; (2)ACD/LogD (pH 5.5):2.52; (3)ACD/LogD (pH 7.4): 2.52; (4)ACD/BCF (pH 5.5): 48.33; (5)ACD/BCF (pH 7.4): 48.33 ; (6)ACD/KOC (pH 5.5): 558.7; (7)ACD/KOC (pH 7.4): 558.7; (8)#Freely Rotating Bonds: 1; (9)Index of Refraction: 1.397; (10)Molar Refractivity: 34.14 cm3; (11)Molar Volume: 141.6 cm3; (12)Polarizability: 13.53 ×10-24 cm3; (13)Surface Tension: 17.2 dyne/cm; (14)Density: 0.865 g/cm3; (15)Enthalpy of Vaporization: 32.17 kJ/mol; (16)Boiling Point: 96 °C at 760 mmHg; (17)Vapour Pressure: 50.6 mmHg at 25°C.
This is a kind of clear colorless liquid and is insoluble in water. Besides, it is sensitive to moisture, so it should be kept in the inflammables area and then keep under argon. And keep it in a cool, dry, well-ventilated area away from incompatible substances.
Being among the highly flammable chemicals, it may catch fire in contact with air, only needing brief contact with an ignition source, and it has a very low flash point or evolve highly flammable gases in contact with water. Besides, it is a kind of irritant chemical, it is irritating to eyes, respiratory system and skin, and it may cause burns and even the inflammation to the skin or other mucous membranes. What is more, it could destroy living tissue on contact, as it is corrosive.
So while dealing with this chemical, we should be very cautious and take the following instructions. Wear suitable gloves and eye/face protection and suitable protective clothing; And then keep away from sources of ignition - No smoking and do not empty into drains at the same time. What's more, if in case of contact with eyes, rinse immediately with plenty of water and seek medical advice, and then take precautionary measures against static discharges. You could also get more safety information from WGK Germany 3.
Its product categories are including halides; pharmacetical; si (classes of silicon compounds); si-(c)4 compounds; silicon compounds (for synthesis); synthetic organic chemistry, while its preparation products are containing (trimethylsilyl)diazomethane, and n-(methoxymethyl)-n-(trimethylsilylmethyl)benzylamine.
Additionally, you could convert the following data information into the molecular structure:
SMILES:ClC[Si](C)(C)C
InChI:InChI=1/C4H11ClSi/c1-6(2,3)4-5/h4H2,1-3H3
InChIKey:OOCUOKHIVGWCTJ-UHFFFAOYAF
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