Conditions | Yield |
---|---|
byproducts: VOF3; vigorous react.; | 97.8% |
Conditions | Yield |
---|---|
In further solvent(s) fluorination (N2 carrier gas (ratio F/N2 1:5), -50°C, als solvent freon-11); | 80% |
In neat (no solvent) at 0°C under inflammation (pale blue); further oxifluoride formed;; |
(trifluoroethenyl)pentafluorosulfur(VI)
A
fluorosulfonyl fluoride
B
bis(pentafluorosulfur)oxide
C
chlorotrifluoromethane
D
difluoro(pentafluorosulfanyl)acetyl fluoride
E
thionyl fluoride
Conditions | Yield |
---|---|
With oxygen 25°C, 12 h, further product; | A n/a B n/a C n/a D 72% E n/a |
With O2 25°C, 12 h, further product; | A n/a B n/a C n/a D 72% E n/a |
With ozone 25°C, 12 h, further product; | A n/a B n/a C n/a D 52% E n/a |
With O3 25°C, 12 h, further product; | A n/a B n/a C n/a D 52% E n/a |
(1,2-dibromotrifluoroethyl)pentafluorosulfur(VI)
A
fluorosulfonyl fluoride
B
disulfur decafluoride
C
1,2,2-tribromo-1,1,2-trifluoroethane
D
silicon tetrafluoride
E
thionyl fluoride
Conditions | Yield |
---|---|
Irradiation (UV/VIS); irradiated (Hanovia S 500 lamp) in silica ampule, 20 h, further products; | A n/a B n/a C 49% D n/a E n/a |
thionyl chloride
1,2,2,2-tetrafluoro-ethanesulfonyl fluoride
triethylamine
A
thionyl chlorofluoride
B
1-chlorotetrafluoroethanesulfonyl chloride
C
thionyl fluoride
Conditions | Yield |
---|---|
-70°C; | A n/a B 47% C n/a |
-70°C; | A n/a B 47% C n/a |
chlorine fluorosulfate
sulfur tetrafluoride
A
SF4(Cl)OSO2F
B
thionyl fluoride
Conditions | Yield |
---|---|
In neat (no solvent) ClOSO2F transferred under static vac. to FEP reactor, SF4 condensed andreactor placed in 0°C bath and left for 1.5 h; reactor cooled to -95°C, volatile materials pumped from -95 to -70°C, reactor allowed to warm to room temp., volatile materials pumped into -196°C trap and fractionated, product refractionated through -63°C trap; | A 46% B n/a |
bis(pentafluorosulfur) peroxide
sulfur dioxide
A
thionyl tetrafluoride
B
pentafluorosulfur fluorosulfonate
C
sulfur trioxide
D
thionyl fluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, 48 h; | A n/a B 45% C n/a D n/a E n/a |
thiocyanogen
fluorine
A
thiazyl trifluoride
B
sulphur cyanide pentafluoride
C
sulfur tetrafluoride
D
thionyl fluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
In further solvent(s) byproducts: (FCN)3; reactn. of a soln. of dirhodane in FCl2C-CClF2 with diluted F2 (F2:N2 0 1:10); cooled down to -183°C; solvent removed by condensation; mixt. condensed to aq. KOH-soln. at room temp. to remove SF4, SOF and (FCN)3; sepn. by fractionated condensation at -127°C, -140°C, -196°C; | A 8% B 5% C 30% D 40% E 3% |
nitrogen trifluoride
sulfur trioxide
A
fluorosulfonyl fluoride
C
thionyl fluoride
D
sulphur hexafluoride
Conditions | Yield |
---|---|
byproducts: NO, NO2; 520 °C, nickel tube; | A 30% B n/a C 4% D <1 |
Conditions | Yield |
---|---|
In liquid sulphur dioxide | 15% |
N-(pentafluorosulfanyl)-(dichloro)methanimide
A
Schwefelpentafluorid-isocyanid
B
thionyl fluoride
Conditions | Yield |
---|---|
With P(i-Pr)3 In neat (no solvent) byproducts: 2-fluoro-propane, SOF2; all manipulations in dry evacuated apparatus; S and P compds. added through septum into liq. N2 cooled apparatus; trap at -196°C contained F5SNC, other compds. in trap at -120°C; | A 10% B n/a |
With tris(2-octyl) phosphite In neat (no solvent) byproducts: SOF2; all manipulations in dry evacuated apparatus under Ar; S and P compds. added through septum into liq. N2 cooled apparatus then allowed to warm very slowly with stirring; trap at -196°C contained F5SNC, other compds. in trap at -100°C and -78°C; |
thionyl chloride
thiazyl trifluoride
hydrogen fluoride
A
SF5N=SCl2
B
((pentafluorosulfanyl)imino)chlorofluorosulfane
C
thionyl fluoride
Conditions | Yield |
---|---|
HF and NSF3 were condesed in Kel-F reactor at -196°C, allowed toreact at room temp. overnight, SOCl2 added, reacted at room temp. for 2weeks and volatile products were condensed into a NaF scrubber; fractionation through a series of traps at -10, -78, and -196°C in vac., a -78°C trap contained the product, distillation; | A 9.6% B <1 C n/a |
HF and NSF3 were condesed in steel cylinder at -196°C, allowed to react at room temp. for 1 h, SOCl2 added, heated at 79°C for 24h and volatile products were condensed into a NaF scrubber; fractionation through a series of traps at -10, -78, and -196°C in vac., a -78°C trap contained the product, distillation; | A 2% B n/a C n/a |
dinitrogen difluoride
sulfur dioxide
A
fluorosulfonyl anhydride
B
fluorosulfonyl fluoride
C
thionyl tetrafluoride
D
thionyl fluoride
Conditions | Yield |
---|---|
byproducts: N2O, N2; |
dinitrogen difluoride
sulfur dioxide
A
fluorosulfonyl fluoride
B
fluorosulfonylchloride
C
thionyl fluoride
Conditions | Yield |
---|---|
With chlorin byproducts: S2O5F2, SOF4, N2O, N2; 100°C, 1.5 h, in autoclave; |
dinitrogen difluoride
sulfur dioxide
A
fluorosulfonyl fluoride
B
thionyl fluoride
Conditions | Yield |
---|---|
byproducts: S2O5F2, SOF4, N2O, N2; 100°C, 1.5 h, in autoclave; |
hypofluorous acid trifluoromethyl ester
sulfur dioxide
A
fluorosulfonyl fluoride
C
Bis-(trifluormethyl)-sulfat
E
thionyl fluoride
Conditions | Yield |
---|---|
byproducts: CO2; 170-180°C, further products; fractionated distn.; |
Conditions | Yield |
---|---|
byproducts: S, HF; 12 h, room temp.; | |
byproducts: S, HF; 12 h, room temp.; |
A
fluorosulfonyl fluoride
C
sodium sulfate
D
thionyl fluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
With fluorine byproducts: O2; -80°C; | |
With F2 byproducts: O2; -80°C; |
sulfur dioxide
tetramethylammonium fluoride
A
nitrogen
C
thionyl fluoride
Conditions | Yield |
---|---|
In liquid sulphur dioxide | |
In sulfur dioxide |
Conditions | Yield |
---|---|
50-150°C; | |
50-150°C; |
Conditions | Yield |
---|---|
With trifluorophosphoric acid other Radiation; CO2-laser radiation; react. rate increased by Xe or Kr, decreased by He, Ne, Ar; |
pentafluorosulfanyl chloride
sulfur dioxide
A
sulfuryl dichloride
B
fluorosulfonyl fluoride
C
disulfur decafluoride
D
pentafluorosulfur fluorosulfonate
E
thionyl fluoride
Conditions | Yield |
---|---|
byproducts: SiF4; other Radiation; photochemical reaction with 253.7 nm radiation, 48 h, in glass vessel; | A n/a B n/a C <1 D n/a E n/a |
sulfur dioxide
sulphur hexafluoride
A
fluorosulfonyl fluoride
B
sulfur tetrafluoride
C
thionyl fluoride
Conditions | Yield |
---|---|
Kinetics; other Radiation; no react. on mere heating at 627 °C, but induction by CO2-laser; |
sulfur dioxide
tungsten(VI) fluoride
A
tungsten oxide tetrafluoride
B
thionyl fluoride
Conditions | Yield |
---|---|
In liquid sulphur dioxide 20°C; |
disulfur decafluoride
sulfur dioxide
A
fluorosulfonyl fluoride
B
pentafluorosulfur fluorosulfonate
C
sulfur trioxide
D
thionyl fluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, in glass vessel; |
sulfur tetrafluoride
sulfur trioxide
A
fluorosulfonyl anhydride
B
fluorosulfonyl fluoride
C
thionyl fluoride
Conditions | Yield |
---|---|
50-150 °C, exclusion of oxygen, SO3:SF4 = 1:2; | |
50-150 °C, exclusion of oxygen, SO3:SF4 = 1:2; |
hydrogen fluoride
hydrogen sulfide
A
fluorosulfonyl fluoride
B
sulfur tetrafluoride
C
thionyl fluoride
Conditions | Yield |
---|---|
With potassium fluoride; water In hydrogen fluoride Electrochem. Process; 5% KF, in presence of moisture, electrofluorination; | |
With water; sodium fluoride In hydrogen fluoride Electrochem. Process; 5% NaF, in presence of moisture, electrofluorination; | |
With NaF; H2O In hydrogen fluoride HF (liquid); Electrochem. Process; 5% NaF, in presence of moisture, electrofluorination; | |
With KF; H2O In hydrogen fluoride HF (liquid); Electrochem. Process; 5% KF, in presence of moisture, electrofluorination; |
Conditions | Yield |
---|---|
In neat (no solvent) | |
In neat (no solvent) |
sulfur tetrafluoride
sodium nitrite
A
thionyl tetrafluoride
C
thionyl fluoride
Conditions | Yield |
---|---|
byproducts: SF6; 200-300°C, 2-8 h; | |
byproducts: SF6; 200-300°C, 2-8 h; |
sodium nitrate
sulfur tetrafluoride
A
fluorosulfonyl fluoride
B
thionyl tetrafluoride
D
thionyl fluoride
E
sulphur hexafluoride
Conditions | Yield |
---|---|
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-% SOF4, 27 vol.-% SOF2, 5.2 vol.-% SF6, 1 vol.-% SO2F2, 35 vol.-% N2, 1 vol.-% NO; | |
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-% SOF4, 27 vol.-% SOF2, 5.2 vol.-% SF6, 1 vol.-% SO2F2, 35 vol.-% N2, 1 vol.-% NO; |
chlorine monofluoride
thionyl fluoride
pentafuorosulfanyl hypochlorite
Conditions | Yield |
---|---|
cesium fluoride In neat (no solvent) absence of air and moisture; activating CsF (in stainless-steel autoclave passivated with F2) with SO2 followed by vac. pyrolysis, condensing SOF2 and excess ClF at -196°C, wrming to -40°C, standing for1 d; fractional low-temp. distn. (condensing at -120°C); | 99% |
Conditions | Yield |
---|---|
In neat (no solvent) Sonication; absence of air and moisture; condensing excess SOF2 onto Me4NF at -196°C, warming to room temp., placing in ultrasonic bath for few h; pumping off excess SOF2 (dry ice temp.); | 99% |
In acetonitrile absence of air and moisture; |
chlorosulfonic acid
aminosulfonic acid
thionyl fluoride
bis(fluorosulfonyl)amide
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 80℃; under 16501.7 Torr; for 17h; Solvent; Autoclave; | 77% |
Reported in EPA TSCA Inventory.
OSHA PEL: TWA 2.5 mg(F)/m3
ACGIH TLV: TWA 2.5 mg(F)/m3; BEI: 3 mg/g creatinine of fluorides in urine prior to shift; 10 mg/g creatinine of fluorides in urine at end of shift.
NIOSH REL: (Inorganic Fluorides) TWA 2.5 mg(F)/m3
The Thionyl fluoride with CAS registry number of 7783-42-8 is also known as Sulfur difluoride monoxide. The systematic name is Thionyl difluoride. Its EINECS registry number is 231-997-2. In addition, the formula is F2OS and the molecular weight is 86.06. This chemical is a colorless gas. Besides, it is a a useful reagent as the related derivative.
Physical properties about Thionyl fluoride are: (1)ACD/LogP: 0.16; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 0.16; (4)ACD/LogD (pH 7.4): 0.16; (5)ACD/BCF (pH 5.5): 1; (6)ACD/BCF (pH 7.4): 1; (7)Polar Surface Area: 36.28Å2; (8)Index of Refraction: 1.376; (9)Molar Refractivity: 11.23 cm3; (10)Molar Volume: 48.9 cm3; (11)Polarizability: 4.45×10-24cm3; (12)Surface Tension: 38.7 dyne/cm; (13)Density: 1.758 g/cm3; (14)Flash Point: °C; (15)Enthalpy of Vaporization: 21.8 kJ/mol; (16)Boiling Point: °C at 760 mmHg; (17)Vapour Pressure: 7510 mmHg at 25 °C.
Preparation of Thionyl fluoride: it is prepared by the reaction of thionyl chloride with fluoride sources such as antimony trifluoride.
3SOCl2+2SbF3→3SOF2+2SbCl3
When you are using this chemical, please be cautious about it. As a chemical, it is harmful by inhalation and may cause burns. During using it, wear suitable protective clothing, gloves and eye/face protection. In case of accident or if you feel unwell seek medical advice immediately.
You can still convert the following datas into molecular structure:
1. Canonical SMILES: O=S(F)F
2. InChI: InChI=1S/F2OS/c1-4(2)3
3. InChIKey: LSJNBGSOIVSBBR-UHFFFAOYSA-N
The toxicity data is as follows:
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
mouse | LCLo | inhalation | 260ppm/1H (260ppm) | LUNGS, THORAX, OR RESPIRATION: ACUTE PULMONARY EDEMA LUNGS, THORAX, OR RESPIRATION: DYSPNEA | Archives des Maladies Professionnelles de Medecine du Travail et de Securite Sociale. Vol. 34, Pg. 581, 1973. |
rabbit | LCLo | inhalation | 1000ppm/1H (1000ppm) | LUNGS, THORAX, OR RESPIRATION: ACUTE PULMONARY EDEMA LUNGS, THORAX, OR RESPIRATION: DYSPNEA | Archives des Maladies Professionnelles de Medecine du Travail et de Securite Sociale. Vol. 34, Pg. 581, 1973. |
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