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inquiryNitrogen trifluoride Basic information Product Name: Nitrogen trifluoride Synonyms: N,N,N-Trifluoroamine;NF3;Nitrogen fluoride (NF3);nitrogenfluoride(nf3);Perfluoroammonia;Stickstoff(III
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inquiryCAS No: 7783-54-2 Other names : Nitrogen trifluoride MF: NF3 Formula weight : 71
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inquiryhigh purity lowest priceAppearance:solid or liquid Storage:in sealed air resistant place Package:drum and bag Application:for pharma use Transportation:by sea or air Port:Beijing or Guangzhou
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Superior quality, moderate price & quick delivery. Appearance:Colorless gas Storage:Seal of low temperature high pressure away from the fire Package:1kg/bag, 1kg/drum or 25kg/drum or as per your request. Application:It is an important raw mater
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Nitrogen Trifluoride is a colorless , stable , oxidizing , toxic gas with a characteristic moldy odor . It is shipped in steel cylinders as a non-liquefied gas. Application:· Used for cleaning CVD Chamber or etching vapor deposition layer ( film
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inquiryUnited Scientific Company Located in Shanghai of China , is a competitive player in the global specialty and fine chemical market. Fenghua has both the expertise and flexibility to produce a wide range of chemicals. Focusing on developing the innovat
Nitrogen fluoride (NF3) Storage:keep in dry and cool condition Package:25kg or according to cutomer's demand Application:Chemical research/pharma intermediate Transportation:By Sea,by Air,By courier like DHL or Fedx. Port:Shanghai/Shenzhen
The company have effective management team, professional technical R & D personnel, the service spirit of customer oriented. We have long-term cooperation with famous domestic manufacturer, and excellent customer resources overseas. We are skilled in
Good Price, prompt shipment Application:Catalytic agent; Petrochemical additive; Used in organic synthesis
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Chemical Name: NITROGEN TRIFLUORIDE CAS No. 7783-54-2 Molecular Formula: F3N Formula Weight: 71 Property mp : -207°C bp : -129°C …
Nitrogen trifluoride Application:oled Transportation:by sea,air Port:China main place
(Cl2Te)2N(1+)*GaCl4(1-)=[(Cl2Te)2N]GaCl4
arsenic pentafluoride
A
nitrogen trifluoride
Conditions | Yield |
---|---|
In liquid sulphur dioxide Ga-compd.:AsF5 molar ratio was 1:2.5, stirring for 12 h at 20 °C; soln. was concd. in vac., crystn. on cooling, drying for 12 h. in vac. at 20 °C, elem. anal.; NF3 was detected by IR; | A n/a B 75% |
tetrafluorohydrazine
carbon monoxide
A
nitrogen trifluoride
B
dinitrogen difluoride
C
Carbonyl fluoride
D
trifluoromethylamide
Conditions | Yield |
---|---|
byproducts: N2O, CO2, SiF4; other Radiation; ratio of N2F4 and CO = 1:2, irradiation by high pressure Hg lamp for 2h at room temp.; fractionated distn.; | A n/a B n/a C n/a D 15% |
byproducts: N2O, CO2, SiF4; other Radiation; ratio of N2F4 and CO = 1:2, irradiation by high pressure Hg lamp for 2h at room temp.; fractionated distn.; | A n/a B n/a C n/a D 15% |
1-fluoroethylene
A
nitrogen trifluoride
B
hydrogen cyanide
C
hydrogen fluoride
D
ammonia
Conditions | Yield |
---|---|
byproducts: CH3CN, C2H2F2, CH2CN; in a Pyrex tube at 0.95 Torr; products were detected by mass spectrometry; |
Conditions | Yield |
---|---|
In hydrogen fluoride Electrolysis; in anhydrous HF at -10°C; |
tetrafluorohydrazine
A
nitrogen trifluoride
C
dinitrogen tetraoxide
D
nitrosyl fluoride
Conditions | Yield |
---|---|
In neat (no solvent) 60°C, 18 h;; |
A
nitrogen trifluoride
B
nitrogen
C
hydrogen
D
ozone
E
dinitrogen monoxide
Conditions | Yield |
---|---|
In melt byproducts: O2; Electrolysis; reaction by electrolysis of molten NH4F*HF with a Cu cathode and a graphite anode at 125 °C;; | |
In melt byproducts: O2; Electrolysis; reaction by electrolysis of molten NH4F*HF with a Cu cathode and a graphite anode at 125 °C;; |
Conditions | Yield |
---|---|
byproducts: N2, HF; violent reaction; further unidenfed products formed; | |
In neat (no solvent) | |
In neat (no solvent) | |
byproducts: N2, HF; violent reaction; further unidenfed products formed; |
Conditions | Yield |
---|---|
In neat (no solvent) quenching reaction at 1500-4000K;; |
hydrogen fluoride
guanidine nitrate
A
nitrogen trifluoride
B
carbon tetrafluoride
C
nitrogen
Conditions | Yield |
---|---|
In hydrogen fluoride Electrolysis; at 15°C; ratio of NF3:CF4 = 2.5; 40 % soln. of guanidine in anhydrous liquid HF; | |
In hydrogen fluoride HF (liquid); Electrolysis; at 15°C; ratio of NF3:CF4 = 2.5; 40 % soln. of guanidine in anhydrous liquid HF; |
Conditions | Yield |
---|---|
In neat (no solvent) | |
In neat (no solvent) | >99 |
In neat (no solvent) | |
In neat (no solvent) | >99 |
hydrogen fluoride
hydrazine carboxamide
A
tetrafluorohydrazine
B
nitrogen trifluoride
C
carbon tetrafluoride
D
Carbonyl fluoride
Conditions | Yield |
---|---|
In hydrogen fluoride byproducts: CO2, N2, C; Electrolysis; 1 M soln. of semicarbazide in anhydrous liquid HF; 5.6-5.7 V; ratio of NF3 : CF4 depends on potential used; | A 0% B n/a C n/a D n/a |
In hydrogen fluoride byproducts: CO2, N2, C; HF (liquid); Electrolysis; 1 M soln. of semicarbazide in anhydrous liquid HF; 5.6-5.7 V; ratio of NF3 : CF4 depends on potential used; | A 0% B n/a C n/a D n/a |
tetrafluorohydrazine
hypofluorous acid trifluoromethyl ester
A
nitrogen trifluoride
B
carbon tetrafluoride
C
Carbonyl fluoride
D
N,N-Difluor-O-trifluormethylhydroxylamin
Conditions | Yield |
---|---|
Irradiation (UV/VIS); ambient temp.; |
krypton difluoride
difluoramino trifluoromethane
arsenic pentafluoride
A
nitrogen trifluoride
B
trans-1,2-difluorodiazine
Conditions | Yield |
---|---|
With HF In hydrogen fluoride byproducts: CF4; HF (liquid); reagents were mixed at -196°C for 3 h; |
Conditions | Yield |
---|---|
In hydrogen fluoride Electrolysis; |
S,S-difluoro-N-trifluoromethyl-sulfimide
A
nitrogen trifluoride
B
carbon tetrafluoride
C
difluoramino trifluoromethane
D
fluoro-bis-trifluoromethyl-amine
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
Electrochem. Process; electrochemical fluorination, further product: CHF3; | |
Electrochem. Process; electrochemical fluorination, further product: CHF3; |
Conditions | Yield |
---|---|
In hydrogen fluoride Electrolysis; |
pentafluoroethyliminosulfur difluoride
A
nitrogen trifluoride
B
carbon tetrafluoride
C
Hexafluoroethane
D
Perfluoroethylamine
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
Electrochem. Process; electrochemical fluorination, further products: C2F5H and CHF3; | |
Electrochem. Process; electrochemical fluorination, further products: C2F5H and CHF3; |
difluoroether
nitrosyl fluoride
A
nitrogen trifluoride
B
oxygen
Conditions | Yield |
---|---|
In neat (no solvent) NOF is passed into OF2;; | |
In neat (no solvent) NOF is slowly passed into a vessel filled with OF2; inflammation;; | |
In neat (no solvent) NOF is passed into OF2;; | |
In neat (no solvent) NOF is slowly passed into a vessel filled with OF2; inflammation;; |
nitrogen trifluoride
Conditions | Yield |
---|---|
In melt byproducts: N2, O2, N2F2; Electrolysis; 25 mA/cm**2, 100°C; further byproducts; XRD; SEM; XPS; | |
In melt byproducts: N2, N2F2, H2; Electrolysis; electrolysis of molten NH4F*2HF with and without LiF conducted at 25 mA/cm**2 for 120 h with Ni or nickel-nickel oxide composite anodes; electrolyte kept at 100°C; |
Conditions | Yield |
---|---|
In melt F2 and molten NH4F*2HF at 90°C;; |
ethanedinitrile
nitrogen
fluorine
A
nitrogen trifluoride
B
carbon tetrafluoride
C
Hexafluoroethane
D
difluoramino trifluoromethane
E
fluoro-bis-trifluoromethyl-amine
Conditions | Yield |
---|---|
further products; by heating to 175-250°C; | |
further products; by heating to 175-250°C; |
tetrafluorohydrazine
ethanedinitrile
A
nitrogen trifluoride
B
carbon tetrafluoride
C
Perfluoroethylamine
D
N,N-Difluor-cyanodifluormethylamin
E
N,N,N',N'-Tetrafluor-1,2-diamino-1,1,2,2-tetrafluor-ethan
tetrafluoroammonium hexafluoroantimonate
bromine pentafluoride
Cs(1+)*BrOF4(1-)=CsBrOF4
A
nitrogen trifluoride
B
cesium hexafluoroantimonate
Conditions | Yield |
---|---|
byproducts: BrF3O; addn. at -196°C, stirred at 20°C for 2.5 h, cooled to -196°C; the noncondensable material distd. off, the voleatile material sept. byfractional distn., the solid nonvolatile product determined by Raman spetr.; |
Conditions | Yield |
---|---|
In water Electrolysis; no product but evolution of H2 (cathode) and N2/O2 (anode);; | A 0% B n/a C n/a D n/a |
In water Electrolysis; no product but evolution of H2 (cathode) and N2/O2 (anode);; | A 0% B n/a C n/a D n/a |
nitrogen trifluoride
Conditions | Yield |
---|---|
In water Electrolysis; concd. soln.;; | |
In water Electrolysis; concd. soln.;; |
fluorine
A
difluoroamine
B
nitrogen trifluoride
C
difluoroamino radical
D
N-monofluoroamine
tetrafluorohydrazine
chlorine trifluoride
A
nitrogen trifluoride
B
chlorine monofluoride
Conditions | Yield |
---|---|
In neat (no solvent) Kinetics; at 180 - 210°C in Al tube;; |
Conditions | Yield |
---|---|
100 Torr PuF6, 2250 Torr N2, room temp., 229 d; | |
100 Torr PuF6, 2250 Torr N2, room temp., 229 d; |
Conditions | Yield |
---|---|
In hydrogen fluoride Electrolysis; electrolysis of piperidine in liq. HF;; fractional distn.;; | |
In hydrogen fluoride Electrolysis; electrolysis of piperidine in liq. HF;; fractional distn.;; |
Conditions | Yield |
---|---|
In neat (no solvent) plasma react. in inductively coupled tubular reactor, temp. of reactor exterior <=180°C, 200 mg of powdered precursor in alumina boat, power of 150-200 W, chamber pressure of 250 mTorr, NF3 flow rate of 10 sccm, reaction time of 10-20 min; X-ray diffraction anal.; EDX anal.; chem. anal.; | 99% |
nitrogen trifluoride
antimony pentafluoride
dinitrogen monoxide
NF2O(1+)*Sb2F11(1-) =(NF2O)(Sb2F11)
Conditions | Yield |
---|---|
byproducts: N2; 150°C; | 99% |
100°C; | 0% |
nitrogen trifluoride
krypton difluoride
arsenic pentafluoride
NF4(1+)*AsF6(1-)
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: Kr; mixt. of KrF2, AsF5 and NF3 (molar ratio 2:1:7) was loaded in stainlesssteel cylinder at -196°C, warmed slowly to room temp. over 30 h,kept at 53°C for 4 d, cooled to -210°C on N2 slush bath; volatiles sepd. by fractional condensation through traps at -156 and -210°C; identified by IR and Raman spectra; | 96.7% |
nitrogen trifluoride
carbon monoxide
A
carbon tetrafluoride
B
Carbonyl fluoride
C
nitrogen(II) oxide
D
nitrosyl fluoride
E
Nitrogen dioxide
Conditions | Yield |
---|---|
nickel tube, equimolar amt., 825°C; | A n/a B 80% C n/a D n/a E n/a |
nitrogen trifluoride
Perfluoro-2-azapropen
tris-trifluoromethyl-carbamimidoyl fluoride
Conditions | Yield |
---|---|
550°C, in presence of CsF; | 41.7% |
550°C, in presence of CsF; | 41.7% |
nitrogen trifluoride
cyanogen chloride
A
trifluoro-[1,3,5]triazine
B
cis-hexafluoroazomethane
C
Perfluoro-2-azapropen
Conditions | Yield |
---|---|
In not given at 500°C, in Ni-tube, in excess of NF3; | A 40% B 30% C 30% |
nitrogen trifluoride
krypton difluoride
boron trifluoride
tetrafluoroammonium tetrafluoroborate
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: Kr; KrF2, BF3 and NF3 (molar ratio 2:1:7) was loaded in stainless steel cylinder at -196°C, warmed slowly to room temp. over 30 h, kept at 53°C for 4 d, cooled to -210°C on N2 slush bath; volatiles sepd. by fractional condensation through traps at -156 and -210°C; | 30.6% |
In hydrogen fluoride KrF2, BF3 and NF3 was loaded into cylinder at -196°C, warmed slowly to 25°C, kept at 25°C for 3 h; | 28.1% |
In hydrogen fluoride KrF2, BF3 and NF3 was loaded into cylinder at -196°C, warmed slowly to -78°C, kept at -78°C for 3 h; | 7.1% |
nitrogen trifluoride
sulfur trioxide
A
fluorosulfonyl fluoride
C
thionyl fluoride
D
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
byproducts: NO, NO2; 520 °C, nickel tube; | A 30% B n/a C 4% D <1 |
Conditions | Yield |
---|---|
at 500°C; | 30% |
at 500°C; | 30% |
Conditions | Yield |
---|---|
500°C, in a flow system (contact time=0.6 s); | 30% |
500°C, in a flow system (contact time=0.6 s); | 30% |
Conditions | Yield |
---|---|
>1500°C; | 16% |
nitrogen trifluoride
Perfluoro-2-azapropen
cesium fluoride
perfluoromethanimine
Conditions | Yield |
---|---|
by pyrolysis over CsF at 540 to 560°C; | 6.7% |
by pyrolysis over CsF at 540 to 560°C; | 6.7% |
nitrogen trifluoride
boron trifluoride
fluorine
tetrafluoroammonium tetrafluoroborate
Conditions | Yield |
---|---|
In neat (no solvent) Irradiation (UV/VIS); equivalent mixture of NF3, F2 and BF3, 298K, 6.5atm;; | 1% |
In neat (no solvent) Irradiation (UV/VIS); equivalent mixture of NF3, F2 and BF3, 298K, 6.5atm;; | 1% |
In neat (no solvent) 5.6mmol BF3, 6.1mmol NF3, contineous react. with F2 at 30Torr and 0.4l/h, 5kV, 30mA, 20min; heating to 60°C, removal of volatile components in vac.;; heating to 200.degreee.C in vac. for 30-40min;; | >99 |
nitrogen trifluoride
sulfur trioxide
A
fluorosulfonyl fluoride
B
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
under pressure, 230-440 °C, molar ratio 1:1; |
Conditions | Yield |
---|---|
under pressure, 230-440 °C, molar ratio of NF3:SO3 = 2:1; |
Conditions | Yield |
---|---|
byproducts: N2; at red heat (with fire); |
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: Ba3N2; heating of Ba with NF3 at approx. 200°C under formation of BaF2 with some Ba3N2;; |
Conditions | Yield |
---|---|
byproducts: Bi fluoride; thermic reaction;; | |
byproducts: Bi fluoride; thermic reaction;; |
Conditions | Yield |
---|---|
In neat (no solvent) Kinetics; etching of SiO2 film on Si wafer by NF3/Ar mixt.; detd. by FTIR; | |
In neat (no solvent) calcination of SiO2 and NF3;; | |
In neat (no solvent) calcination of SiO2 and NF3;; |
nitrogen trifluoride
zirconium(IV) oxide
zirconium(IV) fluoride
Conditions | Yield |
---|---|
sample fluorination at 250 and 300°C for 4 h; XRD; |
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