bis(trimethylsilyl)sulphate
A
chloro-trimethyl-silane
B
chlorosulfonate de trimethylsilyle
Conditions | Yield |
---|---|
With thionyl chloride at 120℃; | A 92% B 97% |
With thionyl chloride at 70 - 120℃; Yields of byproduct given; | A n/a B 97% |
With thionyl chloride at 80 - 120℃; | A n/a B 97% |
With thionyl chloride at 120℃; | A n/a B 97% |
Conditions | Yield |
---|---|
With sulfur trioxide at 50℃; for 0.166667h; | 87% |
With sulfur trioxide | |
With chlorosulphuric acid | |
With sulfur trioxide Ambient temperature; | 91.5 g |
Bis(trimethylsilyl)peroxodisulfat
A
chlorosulfonate de trimethylsilyle
B
bis(trimethylsilyl)sulphate
Conditions | Yield |
---|---|
In dichloromethane at -20 - 20℃; | A 6.2% B 2.5% |
chloro-trimethyl-silane
sulfur trioxide
chlorosulfonate de trimethylsilyle
Conditions | Yield |
---|---|
-30°C; | >99 |
chlorosulfonate de trimethylsilyle
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 90℃; for 5h; Cooling with ice; | 99% |
chlorosulfonate de trimethylsilyle
mercury bis(trifluoromethanethiolate)
Conditions | Yield |
---|---|
In tetrachloromethane at 20℃; | 95% |
chloro-trimethyl-silane
chlorosulfonate de trimethylsilyle
recorcinol
2-Hydroxy-4-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
at 80℃; for 12h; | 92% |
chlorosulfonate de trimethylsilyle
ethoxycarbonylketene ethyltrimethylsilyl acetal
(Trimethylsiloxysulfonyl)malonsaeure-diethylester
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 60℃; for 4h; | 91% |
chlorosulfonate de trimethylsilyle
2,4-dimethyl-3-trimethylsilyloxy-2-pentene
2,4-Dimethyl-2-(trimethylsiloxysulfonyl)-3-pentanon
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 25℃; for 2.5h; | 91% |
chlorosulfonate de trimethylsilyle
1-(Trimethylsilyl)imidazole
A
chloro-trimethyl-silane
Conditions | Yield |
---|---|
In dichloromethane for 1h; Ambient temperature; | A n/a B 90% |
chloro-trimethyl-silane
p-cresol
chlorosulfonate de trimethylsilyle
5-Methyl-2-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
at 80℃; for 12h; | 89% |
chlorosulfonate de trimethylsilyle
silver(I) benzenesulphonate
Benzolpyrosulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 0℃; for 0.5h; | 89% |
chlorosulfonate de trimethylsilyle
((CH3)3Sn)C(CH2OCOCH3)CH(Sn(CH3)3)
sodium hydrogencarbonate
Conditions | Yield |
---|---|
In tetrachloromethane byproducts: Me3SnCl; Ar-atmosphere; slow addn. of 2 equiv. Sn-compd. to chlorosulfonate, standing at 20°C for 1 h, addn. of satd. aq. NaHCO3, stirring for 30 min; washing of aq. layer (Et2O), evapn., dissoln. in hot EtOH, filtration, evapn., washing (pentane), drying (vac., 80°C); elem. anal.; | 88% |
chlorosulfonate de trimethylsilyle
3,3-dimethyl-2-(trimethylsilyl)oxy-1-butene
3,3-Dimethyl-1-(trimethylsiloxysulfonyl)-2-butanon
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 25℃; for 2.5h; | 87% |
chlorosulfonate de trimethylsilyle
trimethyl[(Z)-(1-phenyl-1-propenyl)oxy]silane
1-Phenyl-2-(trimethylsiloxysulfonyl)-1-propanon
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 25℃; for 2.5h; | 87% |
chlorosulfonate de trimethylsilyle
aniline
A
chloro-trimethyl-silane
B
anilinium phenylamidosulfate
Conditions | Yield |
---|---|
In tetrachloromethane at -15 - -10℃; for 3h; | A n/a B 87% |
chlorosulfonate de trimethylsilyle
2-(trimethylsilyl)-4-methoxy-1,3-difluorobenzene
Conditions | Yield |
---|---|
In tetrachloromethane for 18h; Inert atmosphere; Reflux; | 85.3% |
chlorosulfonate de trimethylsilyle
2-methyl-1-phenyl-1-trimethylsiloxy-1-propene
2-Methyl-1-phenyl-2-(trimethylsiloxysulfonyl)-1-propanon
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 25℃; for 2.5h; | 85% |
chlorosulfonate de trimethylsilyle
1-phenoxy-1-trimethylsilyloxyprop-1-ene
2-(Trimethylsiloxysulfonyl)propansaeure-phenylester
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 60℃; for 4h; | 85% |
chlorosulfonate de trimethylsilyle
trimethyl-(4-trimethylsilanyloxy-phenyl)-silane
4-Trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
for 15h; Ambient temperature; | 85% |
chlorosulfonate de trimethylsilyle
m-xylene
2,4-Dimethyl-1-benzolsulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 80℃; for 10h; | 85% |
Ethyl thiophene-2-carboxylate
chlorosulfonate de trimethylsilyle
5-<(Trimethylsiloxy)sulfonyl>-2-thiophencarbonsaeure-ethylester
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 80℃; for 18h; | 84% |
chlorosulfonate de trimethylsilyle
trimethyl(4-methylphenoxy)silane
5-Methyl-2-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
With chloro-trimethyl-silane In 1,2-dichloro-ethane at 80℃; for 12h; | 84% |
heptamethyldisilazane
chlorosulfonate de trimethylsilyle
methyl-trimethylsilanyl-amidosulfuric acid trimethylsilanyl ester
Conditions | Yield |
---|---|
In dichloromethane at 20℃; for 3h; | 83% |
In dichloromethane |
p-cresol
chlorosulfonate de trimethylsilyle
2-Hydroxy-5-methyl-1-benzolsulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane for 6h; Heating; | 82% |
1,2-dimethoxybenzene
chlorosulfonate de trimethylsilyle
3,4-Dimethoxy-1-benzolsulfonsaeure-trimethylester
Conditions | Yield |
---|---|
With chloro-trimethyl-silane In 1,2-dichloro-ethane at 80℃; for 10h; | 82% |
trimethylsilanyl-acetic acid ethyl ester
chlorosulfonate de trimethylsilyle
A
chloro-trimethyl-silane
B
C7H16O5SSi
Conditions | Yield |
---|---|
Ambient temperature; | A n/a B 82% |
chlorosulfonate de trimethylsilyle
o-xylene
3,4-Dimethyl-1-benzolsulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 80℃; for 10h; | 82% |
chlorosulfonate de trimethylsilyle
methoxybenzene
4-Methoxy-1-benzolsulfonsaeure-trimethylester
Conditions | Yield |
---|---|
With chloro-trimethyl-silane In 1,2-dichloro-ethane at 80℃; for 10h; | 82% |
chlorosulfonate de trimethylsilyle
toluene
A
4-Methyl-1-benzolsulfonsaeure-trimethylsilylester
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 80℃; for 12h; | A 82% B 9% |
chlorosulfonate de trimethylsilyle
2,4-Dimethyl-3-(triethylsiloxy)-2-penten
A
triethylsilyl chloride
B
2,4-Dimethyl-2-(trimethylsiloxysulfonyl)-3-pentanon
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane for 3.5h; Ambient temperature; | A n/a B 81% |
1-styrenyloxytrimethylsilane
chlorosulfonate de trimethylsilyle
1-Phenyl-2-(trimethylsiloxysulfonyl)-1-ethanon
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane at 25℃; for 2.5h; | 80% |
The Trimethylsilyl chlorosulphate, with the CAS registry number of 4353-77-9, is also known as Chloridosulfuric acid trimethylsilyl ester. It belongs to the product categories of Organic Building Blocks; Sulfonates/Sulfinates; Sulfur Compounds. Its EINECS registry number is 224-425-8. This chemical's molecular formula is C3H9ClO3SSi and molecular weight is 188.71. What's more, its IUPAC name is [Chlorosulfonyloxy(dimethyl)silyl]methane. In addition, it must be stored in airtight containers filled with inert gases and placed in a dry, cool place. Meanwhile, it should be avoided contact with light, strong oxidant, high temperature, ignition source.
Physical properties about Trimethylsilyl chlorosulphate are: (1)ACD/LogP: 2.02; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 2.02; (4)ACD/LogD (pH 7.4): 2.02; (5)ACD/BCF (pH 5.5): 20.21; (6)ACD/BCF (pH 7.4): 20.21; (7)ACD/KOC (pH 5.5): 299.27; (8)ACD/KOC (pH 7.4): 299.27; (9)#H bond acceptors: 3; (10)#H bond donors: 0; (11)#Freely Rotating Bonds: 2; (12)Polar Surface Area: 51.75 Å2; (13)Index of Refraction: 1.438; (14)Molar Refractivity: 40.07 cm3; (15)Molar Volume: 152.5 cm3; (16)Surface Tension: 28.3 dyne/cm; (17)Density: 1.236 g/cm3; (18)Flash Point: 51 °C; (19)Enthalpy of Vaporization: 38.88 kJ/mol; (20)Boiling Point: 169 °C at 760 mmHg; (21)Vapour Pressure: 2.09 mmHg at 25 °C.
Preparation: this chemical is prepared by Chloro-trimethyl-silane. The reaction needs reagent Sulfur trioxide. Other condition of this reaction is reaction time of 10 minutes at 50 °C. The yield is about 87 %.
Uses: it is used to produce other chemicals. For example, it is used to produce 4-Isopropyl-1-benzolsulfonsaeure-trimethylsilylester. The reaction needs solvent 1, 2-Dichloro-ethane. The reaction time is 10 hours with reaction temperature of 80 °C. The yield is about 75 %.
When you are using this chemical, please be cautious about it as the following:
This chemical may cause burns on contact. During using it, wear suitable protective clothing, gloves and eye/face protection. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. Besides, this chemical is flammable.
You can still convert the following datas into molecular structure:
(1) SMILES: ClS(=O)(=O)O[Si](C)(C)C
(2) InChI: InChI=1/C3H9ClO3SSi/c1-9(2,3)7-8(4,5)6/h1-3H3
(3) InChIKey: QWQONZVLXJGXHV-UHFFFAOYAE
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