polytetrafluoroethylene
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
pentafloropropylene
B
1,1,2,2,3,3-Hexafluoro-cyclopropane
C
1,2,2,3,3-pentafluoro-1-difluoromethylcyclopropane
D
silicon tetrafluoride
Conditions | Yield |
---|---|
at 150℃; for 18h; Further byproducts given; | A 5% B n/a C 74% D 100% |
at 200℃; for 10h; Further byproducts given; | A 19% B n/a C 71% D 98% |
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
pentafloropropylene
B
1,2,2,3,3-pentafluoro-1-difluoromethylcyclopropane
C
silicon tetrafluoride
D
1,1,2-trifluoroethylene
Conditions | Yield |
---|---|
With polytetrafluoroethylene at 150℃; for 18h; Further byproducts given; | A 5% B 74% C 100% D 10% |
Carbonyl fluoride
silica gel
A
carbon dioxide
B
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) slight excess over the stoich. amt. of COF2 required; reaction mixt. heated in a stainless steel or monel cylinder at 160°C for 36 h; | A n/a B 100% |
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) salt dried at 250°C in vac. or in N2 flow; thermal dissocn. at 500-620°C in vac. in stainless steel reactor; fed into metallic cylinder cooled with liq. N2; filtration, IR, atomic emission and mass spectrometry; | 100% |
With water In neat (no solvent) byproducts: Si2OF6, SiF3OH, SiF3H; predrying of Na2SiF6 at 250-300.C in vac. or N2 for several hours, heating at 500 to 620°C in stainless steel reactor; cooling with liquid N2; | |
With sulfuric acid In sulfuric acid reaction by use of concd. H2SO4;; |
(2,2-dichloro trifluoro ethyl) trifluoro silane
A
1,1'-dichloro-2,2'-difluoroethene
B
1,2-dichloro-1,2-difluoroethene
C
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) pyrolysis at 140°C, 3 hours;; | A 8% B 90% C 100% |
In neat (no solvent) pyrolysis at 140°C, 3 hours;; | A 8% B 90% C 100% |
diphenylfluorostibine
phenyltrifluorosilane
A
triphenylantimony
B
silicon tetrafluoride
Conditions | Yield |
---|---|
reflux for 3 d; | A 100% B n/a |
reflux for 3 d; | A 100% B n/a |
2,3-Dimethyl-2-butene
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
1-fluoro-1-difluoromethyl-2,2,3,3-tetramethylcyclopropane
B
silicon tetrafluoride
C
1,1,2-trifluoroethylene
Conditions | Yield |
---|---|
at 150℃; for 16h; | A 86% B 99% C 6% |
1,2,2,3,3-pentafluoro-1-difluoromethylcyclopropane
cyclohexene
A
polytetrafluoroethylene
B
pentafloropropylene
C
carbon monoxide
D
Octafluorocyclobutane
E
7,7-difluoronorcarane
F
silicon tetrafluoride
Conditions | Yield |
---|---|
With Pyrex tube at 200℃; for 320h; Product distribution; Mechanism; further periods of contact time, other temperatures; | A 14% B 99% C 11% D n/a E 47% F 13% |
polytetrafluoroethylene
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
pentafloropropylene
B
1,2,2,3,3-pentafluoro-1-difluoromethylcyclopropane
C
silicon tetrafluoride
D
1,1,2-trifluoroethylene
Conditions | Yield |
---|---|
at 200℃; for 10h; Further byproducts given; | A 19% B 71% C 98% D 8% |
phosgene
A
Carbonyl fluoride
B
fluoroformyl chloride
C
carbon dioxide
D
silicon tetrafluoride
Conditions | Yield |
---|---|
In acetonitrile condensation, 20°C in a sealed Pyrex tube, staying 24 h at 20°C; | A 97% B 0% C n/a D <1 |
Caesium-trans-bis(trifluormethyl)-tetrafluorphosphat
silicon tetrafluoride
Conditions | Yield |
---|---|
With glass; acid In not given | 97% |
2-methyl-but-2-ene
(1,1,2,2-tetrafluoroethyl)trifluorosilane
A
silicon tetrafluoride
B
1,1,2-trifluoroethylene
1-fluoro-r-1-difluoromethyl-c-2,3-t-2-trimethylcyclopropane
1-fluoro-r-1-difluoromethyl-c-2-t-2,3-trimethylcyclopropane
Conditions | Yield |
---|---|
at 150℃; for 18h; Further byproducts given; | A 96% B 16% C 34% D 47% |
diphenylfluorostibine
trichloromethyltrifluorosilane
A
diphenylantimony trichloride
B
silicon tetrafluoride
Conditions | Yield |
---|---|
at 15°C; | A n/a B 90% |
at 15°C; | A n/a B 90% |
tetramethylorthosilicate
N,N-dimethyl-n-octadecylamine
Nonafluorobutanesulfonyl fluoride
A
silicon tetrafluoride
B
N,N,N,-trimethyloctadecyl ammonium nonafluorobutanesulfonate
Conditions | Yield |
---|---|
In tetrahydrofuran 50°C , 6 h; | A n/a B 84% |
In tetrahydrofuran 50°C , 6 h; | A n/a B 84% |
antimony(III) fluoride
Dichlorosilane
A
difluorosilane
B
trifluorosilane
C
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: H2; reaction in presence of SbCl5 at room temperature;; | A 80% B n/a C 10% |
antimony(III) fluoride
Dichlorosilane
A
difluorosilane
B
hydrogen
C
trifluorosilane
D
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) fluorination of SiH2Cl2 with SbF3 at room temp. for a longer period of time;; | A 80% B n/a C n/a D n/a |
disilicon hexafluoride
trimethylstannane
A
F3SiSiH3
B
trimethyl(trifluorsilyl)stannane
C
trifluorosilane
D
silicon tetrafluoride
E
Trimethylstannylsilan
Conditions | Yield |
---|---|
In neat (no solvent) N2 atmosphere, high vac. line; condensing, warming (room temp., 1.5 h); passing through traps (-78°C and -46°C); | A n/a B 77% C n/a D n/a E 5% |
Conditions | Yield |
---|---|
In melt placing of mixt. of Si with SnF2 (molar ratio SnF2:Si=2.00) in Fluoroplast-4 ampule, closing by screwed stopper, exposition for 1.00 h at 250°C; various product ratio yields for various conditions; cooling, stirring up in water, collection, drying; | A 76.8% B n/a |
hexafluorodisilthiane
C
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: CF3SiBr; under dry N2, in a sealed tube, 60 h at room temp., molar ratio of silane and HBr was 1:1, an other non-volatile product was also formed; fractionated distn. at a low-temp. column, S-compds. were trapped at 143K, SiF4 at 77 K; | A n/a B 68% C 1% |
iodo-bis-trifluoromethyl-arsine
A
bis(trifluoromethyl)fluoroarsine
B
silicon tetrafluoride
Conditions | Yield |
---|---|
with well dried AgF; | A 60% B n/a |
with well dried AgF; | A 60% B n/a |
disilicon hexabromide
A
disilicon hexafluoride
B
silicon tetrafluoride
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane; acetonitrile Si2Cl6 dissolved in C2H4Cl2 added dropwise over 2 h to suspn. of KF in boiling MeCN, allowed to reflux for 30 min in slow stream of N2; gaseous products trapped in cooled (liq. N2) trap, anlyzed by IR; | A 60% B n/a |
iodo-trifluoro-silane
A
hexafluorodisilthiane
C
hexafluorodisiloxane
D
silicon tetrafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: HgI2; CF3SiI:HgS molar ratio was 1:2, in a sealed tube, 300 K for 7 days, under dry N2; low temp. fractionated distn., less volatile fraction was purified by passing it through a 198 K trap into a trap held at 173 K, the (F3SiS)2SiF2 was identified by NMR, its purity was 98 %;; | A 54% B n/a C 1% D n/a |
(1,2-dibromotrifluoroethyl)pentafluorosulfur(VI)
A
fluorosulfonyl fluoride
B
disulfur decafluoride
C
1,2,2-tribromo-1,1,2-trifluoroethane
D
silicon tetrafluoride
E
thionyl fluoride
Conditions | Yield |
---|---|
Irradiation (UV/VIS); irradiated (Hanovia S 500 lamp) in silica ampule, 20 h, further products; | A n/a B n/a C 49% D n/a E n/a |
lithium aluminium tetrahydride
SiF3SiHBr2
B
trifluorosilane
C
silicon tetrafluoride
Conditions | Yield |
---|---|
React. occurs at room temp. (N2 or Ar, 15 min).; IR spectrum of volatile material indicates resulting compounds and 5% unreacted SiF3SiHBr2.; | A 5% B 45% C 45% |
hexachlorodisilane
A
hydrogenchloride
B
disilicon hexafluoride
C
silicon tetrafluoride
Conditions | Yield |
---|---|
In 1,2-dichloro-ethane; acetonitrile Si2Cl6 dissolved in C2H4Cl2 added dropwise over 2 h to suspn. of KF in boiling MeCN, allowed to reflux for 30 min in slow stream of N2; gaseous products trapped in cooled (liq. N2) trap, analyzed by IR; | A n/a B 45% C n/a |
SiF3SiHBr2
i-Bu2AlH
A
trifluorosilane
B
silicon tetrafluoride
C
monosilane
Conditions | Yield |
---|---|
In carbon dioxide; isopropyl alcohol; toluene Condensing of Si-compd. at -196°C, warming to -78°C (2-propanol/CO2), addn. of i-Bu2AlH (toluene) in portions over 30 min (N2 or Ar), warming of mixt. (room temp., 15 min).; Removal of volatile compounds under vac., IR identification.; | A 40% B 20% C 40% |
SiF3SiHBr2
Na(1+)*AlH2(1+)*2OCH2CH2OCH3(1-)=NaAlH2(OCH2CH2OCH3)2
A
trifluorosilane
B
silicon tetrafluoride
C
monosilane
Conditions | Yield |
---|---|
In carbon dioxide; isopropyl alcohol; toluene Condensing of Si-compd. at -196°C, warming to -78°C (2-propanol/CO2), addn. of vitride (toluene) in portions over 30 min (N2 or Ar), warming of mixt. (room temp., 15 min).; Removal of volatile compounds under vac., IR identification.; | A 40% B 20% C 40% |
Conditions | Yield |
---|---|
excess of SiF4, heating up to 400°C in a quartz tube; | 100% |
phosgene
silicon tetrafluoride
A
Carbonyl fluoride
B
fluoroformyl chloride
Conditions | Yield |
---|---|
In gaseous matrix molar ratio of educts 1:1, 400°C in a quartz tube; | A 0% B 100% |
trimethyltin fluoride
silicon tetrafluoride
tris(trimethylstannyl)phosphane
Conditions | Yield |
---|---|
In tetrahydrofuran elem. anal., MAS; | A 100% B n/a |
Conditions | Yield |
---|---|
In diethylene glycol dimethyl ether byproducts: CH4; SiF4 was bubbled through soln. of NaAlH4 in diglyme at atmospheric pressure, heated at 0-60°C in He; chromy.; elem. anal.; | 99% |
ethanol
silicon tetrafluoride
magnesium
B
tetraethoxy orthosilicate
Conditions | Yield |
---|---|
Stage #1: ethanol; magnesium With iodine at 20℃; for 3.5h; Inert atmosphere; Reflux; Stage #2: silicon tetrafluoride for 2.5h; Inert atmosphere; Reflux; Stage #3: at 300℃; for 2h; Catalytic behavior; Reagent/catalyst; Temperature; Calcination; | A 98% B 82% |
methanol
silicon tetrafluoride
magnesium
B
tetramethylorthosilicate
Conditions | Yield |
---|---|
Stage #1: methanol; magnesium With iodine at 20℃; for 1.5h; Inert atmosphere; Reflux; Stage #2: silicon tetrafluoride Inert atmosphere; Stage #3: at 300℃; for 2h; Catalytic behavior; Reagent/catalyst; Temperature; Calcination; | A 98% B 85% |
Stage #1: methanol; magnesium at 20℃; for 3h; Stage #2: silicon tetrafluoride at 20℃; for 0.5h; Temperature; |
Conditions | Yield |
---|---|
With CH3OH; NH3 In methanol introduction of NH3 into CH3OH in absence of air; introduction of SiF4;; filtration; distn. of the filtrate;; | A n/a B 95% |
With methanol; ammonia In methanol introduction of NH3 into CH3OH in absence of air; introduction of SiF4;; filtration; distn. of the filtrate;; | A n/a B 95% |
Conditions | Yield |
---|---|
With C2H5OH SiF4 and C2H5OH in presence of NH3;; | 92% |
With ethanol SiF4 and C2H5OH in presence of NH3;; | 92% |
Conditions | Yield |
---|---|
With hydrogen In neat (no solvent) in flow reactor at 180°C; the diluent used was H2; | 90% |
In neat (no solvent) Kinetics; byproducts: CaF2; mech. activated in rotating flow-through reactor; rotation frequency 100-150 rpm, CaF2 heated at temp. of 180-190°C, SiF4+H2 (1/1 v/v) flow through; gaseous products frozen out with liq. N2; detd. by gas-chromy.; |
Reported in EPA TSCA Inventory.
OSHA PEL: TWA 2.5 mg(F)/m3
ACGIH TLV: TWA 2.5 mg(F)/m3; BEI: 3 mg/g creatinine of fluorides in urine prior to shift; 10 mg/g creatinine of fluorides in urine at end of shift.
NIOSH REL: (Inorganic Fluorides) TWA 2.5 mg(F)/m3
DOT Classification: 2.3; Label: Poison Gas, Corrosive
The CAS registry number of Silicon tetrafluoride is 7783-61-1. The IUPAC name is tetrafluorosilane. Its EINECS registry number is 232-015-5. In addition, the molecular formula is F4Si and the molecular weight is 104.08. This tetrahedral molecule is notable for having a remarkably narrow liquid range (its boiling point is only 4 °C above its melting point).
Physical properties about this chemical are: (1)ACD/LogP: 4.15; (2)ACD/LogD (pH 5.5): 4.15; (3)ACD/LogD (pH 7.4): 4.15; (4)ACD/BCF (pH 5.5): 837.56; (5)ACD/BCF (pH 7.4): 837.56; (6)#Freely Rotating Bonds: 0; (7)Polar Surface Area: 0 Å2; (8)Index of Refraction: 1.207; (9)Molar Refractivity: 11.42 cm3; (10)Molar Volume: 86 cm3; (11)Polarizability: 4.52 ×10-24cm3; (12)Surface Tension: 5.1 dyne/cm; (13)Density: 1.209 g/cm3; (14)Enthalpy of Vaporization: 17.05 kJ/mol; (15)Vapour Pressure: 26400 mmHg at 25°C.
Preparation of Silicon tetrafluoride: it is a by-product of the production of phosphate fertilizers, resulting from the attack of HF(derived from fluorapatite protonolysis) on silicates. It is prepared by heating BaSiF6(>300 °C). In addition, the required BaSiF6 is prepared by treating aqueous hexafluorosilicic acid with barium chloride.
Uses of Silicon tetrafluoride: it can be used to get fluorine silicate and fluoride lead. And it can be used as a stiffening agent of cement and artificial marble, also used for synthetic materials of organic silicon compounds.
When you are using this chemical, please be cautious about it as the following:
This chemical can react violently with water and can cause severe burns. If it contact with acids, it will liberate toxic gas. And it is very Toxic by inhalation, in contact with skin and if swallowed. During using it, wear suitable protective clothing, gloves and eye/face protection and avoid contact with skin and eyes. In case of accident or if you feel unwell, seek medical advice immediately (show label where possible). After using it, keep container tightly closed and in a well-ventilated place.
You can still convert the following datas into molecular structure:
(1)SMILES: F[Si](F)(F)F
(2)InChI: InChI=1/F4Si/c1-5(2,3)4
(3)InChIKey: ABTOQLMXBSRXSM-UHFFFAOYAU
The toxicity data is as follows:
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
rat | LC50 | inhalation | 2272ppm (2272ppm) | SENSE ORGANS AND SPECIAL SENSES: LACRIMATION: EYE LUNGS, THORAX, OR RESPIRATION: ACUTE PULMONARY EDEMA LUNGS, THORAX, OR RESPIRATION: DYSPNEA | Journal of Toxicological Sciences. Vol. 18, Pg. 394, 1993. |
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