dithionitronium hexafluoroarsenate
A
bis(difluorothio)nitronium hexafluoroarsenate(V)
B
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
With fluorosulfonyl fluoride In not given XeF2 was condensed onto a frozen mixure of S2NAsF6 and SO2F2, mixt. wasstirred and shaken for 0.5 h at 0°C, mixt. was stirred at room temp. for 12h; volatiles were removed, product was dissolved in SO2, than SO2 was removed , product was recrystd. from SO2-SO2ClF; elem. anal.; | A 99% B <1 |
hydrogen fluoride
sulfur dioxide
A
fluorosulfonyl fluoride
B
thionyl tetrafluoride
C
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In hydrogen fluoride byproducts: OF2; Electrolysis; 16°C, 6-8 Volt,; | A 90.4% B n/a C n/a |
In hydrogen fluoride byproducts: OF2; aq. HF; Electrolysis; 16°C, 6-8 Volt,; | A 90.4% B n/a C n/a |
Conditions | Yield |
---|---|
In further solvent(s) fluorination (N2 carrier gas (ratio F/N2 1:5), 0 to -5°C, als solvent freon-11); low temp. fractional condensation; IR spectroscopy; | 90% |
pentafluoro(fluorochloroamido)sulfur
A
(fluoroamido)pentafluorosulfur
B
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
With Hg; CF3COOH In neat (no solvent) byproducts: ClHgOC(O)CF3; mixt. warmed in a reactor from -196°C to 0°C and stirred for 5 h; pumped through traps at -78, -110 and -196°C; | A 90% B n/a |
fluorine
sulfur
A
disulfur decafluoride
B
disulfur difluoride
C
sulfur tetrafluoride
D
hydrogen fluoride
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: OF2; introduction of F2 into steel chamber, sulfur in compartments; detailed description of apparatus and handling given;; first passing through Ni (or Monel) tube (400°C); second Cu column (H2O sprayed); passed into steel column (containing carbon/Fe shavings; aq. NaOH sprayed); dried in column (containing solid NaOH, BaO or P2O5);; | A n/a B n/a C n/a D n/a E 87% |
(fluoroamido)pentafluorosulfur
(fluoroimido)tetrafluorosulfur
B
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
With KF In neat (no solvent) byproducts: OSF2, CF3C(O)F, KF*HF; SF5NHF was condensed to the reactor with KF at -196°C, the reactor was held at 0°C for 7 h; pumped through traps at -110, -125 and -196°C; | A 85% B n/a |
thiazyl trifluoride
chlorine monofluoride
fluorine
A
(SF4NCl)2
B
pentafluoro(fluorochloroamido)sulfur
C
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) The reactor with SF3N and ClF was warmed from -196°C to -78°C over 14 h; addn. of F2, warming; pumped through traps at -78, -115, and -196°C; | A n/a B 75% C n/a |
sulfur dioxide
fluorine
A
fluorosulfonyl fluoride
B
oxygen
C
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) heating in cooled copper tube (water) to 650°C; description of apparatus given;; condensed (liquid O2); passed through flasks containing H2O and hot aq. KOH; dried over P2O5;; | A n/a B n/a C 70% |
tetrafluorohydrazine
pentafluoro(1,1,2,2,2-pentafluoroethyl)-λ6-sulfane
A
carbon tetrafluoride
B
Hexafluoroethane
C
Perfluoroethylamine
D
sulfur tetrafluoride
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
NF3 formed too; | A n/a B n/a C 70% D n/a E n/a |
NF3 formed too; | A n/a B n/a C 70% D n/a E n/a |
thiazyl trifluoride
fluorine
A
F5SNSF4
B
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
byproducts: N2; from -78 to 20°C; | A 50% B n/a |
bis(pentafluorosulfur) peroxide
sulfur dioxide
A
thionyl tetrafluoride
B
pentafluorosulfur fluorosulfonate
C
sulfur trioxide
D
thionyl fluoride
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, 48 h; | A n/a B 45% C n/a D n/a E n/a |
thiocyanogen
fluorine
A
thiazyl trifluoride
B
sulphur cyanide pentafluoride
C
sulfur tetrafluoride
D
thionyl fluoride
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In further solvent(s) byproducts: (FCN)3; reactn. of a soln. of dirhodane in FCl2C-CClF2 with diluted F2 (F2:N2 0 1:10); cooled down to -183°C; solvent removed by condensation; mixt. condensed to aq. KOH-soln. at room temp. to remove SF4, SOF and (FCN)3; sepn. by fractionated condensation at -127°C, -140°C, -196°C; | A 8% B 5% C 30% D 40% E 3% |
pentafluorosulfur hypofluorite
sulfur dioxide
A
fluorosulfonyl fluoride
B
pentafluorosulfur fluorosulfonate
C
sulfur trioxide
D
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
10 h, 50°C; SO3 and SF5OSO2F was separated by water; |
bis(pentafluorosulfur) peroxide
sulfur dioxide
A
fluorosulfonyl fluoride
B
thionyl tetrafluoride
C
bis(pentafluorosulfur)oxide
D
pentafluorosulfur fluorosulfonate
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
byproducts: SiF4; in a Ni-autoclave, 225°C, 5 h, further products; distn.; |
disulfur decafluoride
sulfur dioxide
A
fluorosulfonyl fluoride
B
pentafluorosulfur fluorosulfonate
C
sulfur trioxide
D
thionyl fluoride
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, in glass vessel; |
nitrogen trifluoride
sulfur trioxide
A
fluorosulfonyl fluoride
B
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
under pressure, 230-440 °C, molar ratio 1:1; |
Conditions | Yield |
---|---|
under pressure, 230-440 °C, molar ratio of NF3:SO3 = 2:1; |
Conditions | Yield |
---|---|
byproducts: O2, HF; 130 to 195 K; | |
byproducts: O2, HF; 130 to 195 K; |
Conditions | Yield |
---|---|
In neat (no solvent, gas phase) Kinetics; at 298 K; not isolated, detected by mass spectra; |
fluorine
sulfur
A
disulfur decafluoride
B
disulfur difluoride
C
sulfur tetrafluoride
D
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In neat (no solvent) F2 and burning sulfur;; | |
In neat (no solvent) F2 and burning sulfur;; |
Conditions | Yield |
---|---|
With potassium fluoride In hydrogen fluoride Electrochem. Process; 5% KF, electrofluorination; | |
With sodium fluoride In hydrogen fluoride Electrochem. Process; 5% NaF, electrofluorination; | |
With NaF In hydrogen fluoride HF (liquid); Electrochem. Process; 5% NaF, electrofluorination; | |
With KF In hydrogen fluoride HF (liquid); Electrochem. Process; 5% KF, electrofluorination; |
A
fluorosulfonyl fluoride
B
nitrogen
C
sulfur(VI) hexafluoride
D
dinitrogen monoxide
Conditions | Yield |
---|---|
In neat (no solvent) byproducts: CF4, CO2; Electrochem. Process; electrofluorination in a molten KH2F3 at 120°C ( amorphous carbon used as anode, Pt-rod as reference electrode); gas chromy., IR; |
sodium nitrate
sulfur tetrafluoride
A
fluorosulfonyl fluoride
B
thionyl tetrafluoride
D
thionyl fluoride
E
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-% SOF4, 27 vol.-% SOF2, 5.2 vol.-% SF6, 1 vol.-% SO2F2, 35 vol.-% N2, 1 vol.-% NO; | |
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-% SOF4, 27 vol.-% SOF2, 5.2 vol.-% SF6, 1 vol.-% SO2F2, 35 vol.-% N2, 1 vol.-% NO; |
Conditions | Yield |
---|---|
With FH*F0.5K0.5 byproducts: F2; Electrochem. Process; electrolyte: KF*2HF; anode: amorphous carbon; temp.: 120°C; |
hydrogen sulfide
fluorine
A
disulfur difluoride
B
sulfur tetrafluoride
C
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
Kinetics; byproducts: HF; reaction of H2S and F2 in inert gases; |
hydrogen sulfide
fluorine
A
sulfur tetrafluoride
B
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
Kinetics; byproducts: HF; reaction of gaseous H2S and F2 in inert gases (He, Ar, N2, CF4, or CO2); determined by IR spectroscopy; |
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
With chlorine; sulfur In neat (no solvent) heating for 3-5 hours at 400-500°C in presence of Cl2;; | |
With chlorine; sulfur In neat (no solvent) heating for 3-5 hours at 400-500°C in presence of Cl2;; |
bis(pentamethylcyclopentadienyl)chromium
sulfur(VI) hexafluoride
bis(pentamethylcyclopentadienyl)chromocinium (pentafluoro)bis(pentamethylcyclopentadienyl)dichromate(III)
Conditions | Yield |
---|---|
In hexane (N2); Schlenk technique; SF6 was syringed to soln. of Cr complex in hexane; flask was swirled several times; left to sit for 2 h; supernatant removed; residue washed (toluene, pentane); dried (vac.); elem. anal.; | 85% |
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In (2)H8-toluene at -196 - 20℃; under 760.051 Torr; for 96h; Inert atmosphere; | 83% |
Conditions | Yield |
---|---|
In toluene at 20℃; under 760.051 Torr; for 240h; Temperature; Time; Solvent; Inert atmosphere; | 72% |
trichlorothiophosphine
sulfur(VI) hexafluoride
A
ClS2(1+)
B
PSCl2(1+)
D
Cl3FP(1+)
Conditions | Yield |
---|---|
In gas Kinetics; byproducts: S2(1+), PFCl3, F; High Pressure; ions generated in an electron impact high-pressure ion source contg. SF6were selected using a quadrupole mass filter before being injected into a region contg. He; 298 K; S*PSCl3(1+), SF, SFCl, S2, ClF, ClP, FS2, S2 (1+), PFCl3, F were also obtained; monitoring by quadrupole mass spectrometer at the end of the flow tube; | A 4% B 14% C 69% D 6% E 3% |
trichlorothiophosphine
sulfur(VI) hexafluoride
A
FS2(1+)
D
Cl3FP(1+)
Conditions | Yield |
---|---|
In gas Kinetics; byproducts: SF2, F2, PFCl3; High Pressure; the ions were generated in an electron impact high-pressure ion source contg. SF6; the ions were selected using a quadrupole mass filter before being injected into a drift region contg. He carrier gas; 298 K; SF2, F2, PFCl3, FS2, SSF2 were also obtained; monitoring by quadrupole mass spectrometer at the end of the flow tube;; | A 8% B 66% C 13% D 8% E 5% |
dmap
bis(pentamethylcyclopentadienyl)chromium
sulfur(VI) hexafluoride
(p-dimethylaminopyridine)di(fluoro)(pentamethylcyclopentadienyl)chromium
Conditions | Yield |
---|---|
In toluene (N2); Schlenk technique; Me2NC5H4N was added to soln. of Cr complex in toluene; flask was swirled several times; SF6 was syringed; stirred overnight; solvent removed (vac.); washed (toluene, pentane); dried (vac.); elem. anal.; | 59% |
Conditions | Yield |
---|---|
In toluene (N2); Schlenk technique; SF6 was bubbled through soln. of V complex in toluene; stirred at ambient temp. overnight; filtered through Schlenk frit; concd.; kept at -60°C overnight; elem. anal.; | 58% |
bis(pentamethylcyclopentadienyl)chromium
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In toluene (N2); Schlenk technique; SF6 was syringed to soln. of Cr complex in toluene; flask was swirled several times; left to sit for 24 h; filtered through Celite; kept at -30°C for 2-3 d; supernatant syringed; dried (vac.); elem. anal.; | 50% |
[((HC(CtBuNC6H3(iPr)2)2)NiI)2(μ-η1:η1-N2)]
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In benzene for 168h; Inert atmosphere; | 40% |
Conditions | Yield |
---|---|
In (2)H8-toluene at 70℃; for 15h; Inert atmosphere; Sealed tube; | 30% |
sulfur trioxide
sulfur(VI) hexafluoride
fluorosulfonyl fluoride
Conditions | Yield |
---|---|
byproducts: SiF4; 250 °C, closed glass ampoule; | 20% |
bis(pentamethylcyclopentadienyl)chromium
toluene
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
In toluene (N2); Schlenk technique; SF6 was syringed to soln. of Cr complex in toluene; flask was swirled several times; left to sit for 5 d; supernatant syringed; dried (vac.); mechanically septd. in glovebox; | A n/a B 16% |
sulfur(VI) hexafluoride
Conditions | Yield |
---|---|
Plasma; |
Conditions | Yield |
---|---|
In neat (no solvent) SF6-stream, powdered oxide, 714°C, exothermic react.;; | >99 |
Conditions | Yield |
---|---|
In gas Electric Arc; electric discharge or sparking in SF6 at 200 - 300 kPa; not isolated, detected by IR; |
Molecular Formula: SF6
Molecular Weight: 146.05 g/mol
Canonical SMILES: S(F)(F)(F)(F)(F)F
InChI: InChI=1/F6S/c1-7(2,3,4,5)6
EINECS: 219-854-2
Classification Code: Diagnostic [ultrasound]
Product Categories: Inorganics; Inorganic Fluorides; Vitamin Ingredients; Chemical Synthesis; Compressed and Liquefied Gases; Synthetic Reagents
Stability: Stable. Non-flammable. Explodes on contact with disilane. Reacts with sodium.
XLogP3-AA: 4.2
H-Bond Acceptor: 6
Exact Mass: 145.96249
MonoIsotopic Mass: 145.96249
Heavy Atom Count: 7
Complexity: 62.7
Melting Point: -50 °C(lit.)
Density: 6.602 g/cm3
Boiling Point: -64 °C (lit.)
Vapor density: 5.11 (vs air)
Vapor pressure: 22 mm Hg ( 21.1 °C)
Water Solubility of Sulfur hexafluoride (CAS NO.2551-62-4): slightly
Sulfur hexafluoride (CAS NO.2551-62-4) is used in the electrical industry as a gaseous dielectric medium for high-voltage (35 kV and above) circuit breakers, switchgear, and other electrical equipment, often replacing oil filled circuit breakers (OCBs) that can contain harmful PCBs and used in the semiconductor industry as an etchant. Sulfur hexafluoride is also used as a reagent for creating thrust in a closed Rankine cycle propulsion system, reacting with solid lithium as used in the United States Navy's Mark 50 torpedo and used as an alternative to oil in insulating high voltage equipment such as power transformers and switchgear and used to pressurize the waveguide in radar systems. The magnesium industry uses large amounts of SF6 as inert gas to fill casting forms.
SF6 can be prepared from the elements through exposure of S8 to F2. This is also the method used by the discoverers Henri Moissan and Paul Lebeau in 1901. Some other sulfur fluorides are cogenerated, but these are removed by heating the mixture to disproportionate any S2F10 (which is highly toxic, unlike SF6) and then scrubbing the product with NaOH to destroy remaining SF4. There is virtually no reaction chemistry for SF6. It does not react with molten sodium, but reacts exothermically with lithium. Starting from SF4, one can prepare SF5Cl, which is structurally related to SF6. The monochloride is, however, a strong oxidant and readily hydrolyzed to sulfate.
Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
---|---|---|---|---|---|
rabbit | LD50 | intravenous | 5790mg/kg (5790mg/kg) | Toxicology Letters. Vol. 1000(Sp) |
Reported in EPA TSCA Inventory.
This material is chemically inert in the pure state and is considered to be physiologically inert as well. However, as it is ordinarily obtainable, it can contain variable quantities of the low-sulfur fluorides. Some of these are toxic, very reactive chemically, and corrosive in nature. These materials can hydrolyze on contact with water to yield hydrogen fluoride, which is highly toxic and very corrosive. In high concentrations and when pure it may act as a simple asphyxiant. Incompatible with disilane. Vigorous reaction with disilane. May explode. When heated to decomposition emits highly toxic fumes of F− and SOx.
Hazard Codes: Xi
Risk Statements: 37
R37: Irritating to respiratory system
Safety Statements: 38
S38: In case of insufficient ventilation, wear suitable respiratory equipment.
RIDADR: UN 1080 2.2
Hazard Note: Irritant
HazardClass of Sulfur hexafluoride (CAS NO.2551-62-4): 2.2
OSHA PEL: TWA 1000 ppm
ACGIH TLV: TWA 1000 ppm
DFG MAK: 1000 ppm (6100 mg/m3)
DOT Classification: 2.2; Label: Nonflammable Gas
Sulfur hexafluoride (CAS NO.2551-62-4), its Synonyms are Sulfur fluoride (SF6), (OC-6-11)- ; Sulfur fluoride, (OC-6-11)- ; Sulfur fluoride ; Hexafluorosulfur ; Hexafluorure de soufre ; SonoVue ; Sulphur hexafluoride . It is colourless odourless gas.
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