Trifluoromethane

 Fluoroform (75-46-7) was first obtained by Maurice Meslans in the violent reaction of iodoform with dry silver fluoride in 1894.The reaction was improved by Otto Ruff by substitution of silver fluoride by a mixture of mercury fluoride and calcium fluoride.The exchange reaction works with iodoform and bromoform, and the exchange of the first two halogen atoms is vigorous by fluorine.and the first efficient synthesis method was found by Henne.According to researchers, it is the most abundant of Hydrofluorocarbons (HFCs). Its usage has been regulated since December 1997 at Kyoto climate conference. To mitigate its impact, CHF₃ can be destroyed with electric plasma arc technologies or by high temperature incineration.

EPA Genetic Toxicology Program. Reported in EPA TSCA Inventory.

DOT Classification:  2.2; Label: Nonflammable Gas

The Fluoroform, with the CAS registry number 75-46-7, is also known as Carbon trifluoride. It belongs to the product categories of Refrigerants; Organics. Its EINECS registry number is 200-872-4. This chemical's molecular formula is CHF₃ and molecular weight is 70.01. What's more, its IUPAC name is same with its product name. It is one of the "haloforms" and it is a potent greenhouse gas. And it is also generated biologically in small amounts apparently by decarboxylation of trifluoroacetic acid. In addition, it should be kept in a cool and ventilated place.

Physical properties about Fluoroform are: (1)ACD/LogP: 0.48; (2)# of Rule of 5 Violations: 0; (3)ACD/LogD (pH 5.5): 0.48; (4)ACD/LogD (pH 7.4): 0.48; (5)#H bond acceptors: 0; (6)#H bond donors: 0; (7)#Freely Rotating Bonds: 0; (8)Polar Surface Area: Å²; (9)Index of Refraction: 1.179; (10)Molar Refractivity: 7.13 cm³; (11)Molar Volume: 61.7 cm³; (12)Surface Tension: 6.2 dyne/cm; (13)Density: 1.133 g/cm³; (14)Enthalpy of Vaporization: 17.17 kJ/mol at 760 mmHg; (15)Vapour Pressure: 25200 mmHg at 25 °C.

Preparation of Fluoroform: this chemical can be prepared by Ethanol with Difluoro-fluorosulfonyl-acetic acid. This reaction needs solvent acetonitrile at temperature of 50 °C. The reaction time is 1 hour. The yield is 53 %.

Uses of Fluoroform: (1) this chemical is used in diverse niche applications and is produced as a by-product of the manufacture of Teflon. It is used in the semiconductor industry in plasma etching of silicon nitride and silicon oxide. The production is also a useful refrigerant, and is a byproduct of its manufacture; (2) this chemical is used to produce other chemicals. For example, it is used to produce Deuterio-trifluoro-methane. The reaction occurs with reagents potassium carbonate, deuterium oxide at temperature of 120 °C.

When you are dealing with this chemical, you should be very careful. This chemical may catch fire in contact with air, only need brief contact with an ignition source and have a very low flash point or evolve highly flammable gases in contact with water. In case of insufficient ventilation you should wear suitable respiratory equipment.

You can still convert the following datas into molecular structure:
(1) SMILES: FC(F)F
(2) InChI: InChI=1S/CHF3/c2-1(3)4/h1H
(3) InChIKey: XPDWGBQVDMORPB-UHFFFAOYSA-N